scholarly journals The effect of precursor concentration and post-deposition annealing on the optical and micro-structural properties of SILAR deposited SnO2 films

2020 ◽  
Vol 7 (1) ◽  
pp. 016428
Author(s):  
Pawan Kumar ◽  
Gowrish K Rao
Keyword(s):  
Structural Properties ◽  
Precursor Concentration ◽  
Post Deposition Annealing ◽  
Post Deposition

Changes in electrical and structural properties of indium oxide thin films through post-deposition annealing

2011 ◽  
Vol 520 (1) ◽  
pp. 110-116 ◽  
Author(s):  
Kazuhiro Kato ◽  
Hideo Omoto ◽  
Takao Tomioka ◽  
Atsushi Takamatsu
Keyword(s):  
Thin Films ◽  
Structural Properties ◽  
Indium Oxide ◽  
Oxide Thin Films ◽  
Post Deposition Annealing ◽  
Post Deposition

scholarly journals Impact of Surface Treatments and Post-Deposition Annealing Upon Interfacial Property of ALD-Al₂O₃ on a-Plane GaN

2020 ◽  
Vol 8 ◽  
pp. 970-975 ◽  
Author(s):  
Yanni Zhang ◽  
Jincheng Zhang ◽  
Zhuangzhuang Hu ◽  
Zhaoqing Feng ◽  
Hepeng Zhang ◽  
...  
Keyword(s):  
Surface Treatments ◽  
Interfacial Property ◽  
Post Deposition Annealing ◽  
Post Deposition

scholarly journals Control of Structural and Magnetic Properties of Polycrystalline Co2FeGe Films via Deposition and Annealing Temperatures

Nanomaterials ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 1229
Author(s):  
Andrii Vovk ◽  
Sergey A. Bunyaev ◽  
Pavel Štrichovanec ◽  
Nikolay R. Vovk ◽  
Bogdan Postolnyi ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
Spin Transfer Torque ◽  
Spin Transfer ◽  
Post Deposition Annealing ◽  
Structure Variation ◽  
Annealing Temperatures ◽  
Damping Parameter ◽  
Soft Ferromagnetic ◽  
Thin Polycrystalline ◽  
Post Deposition

Thin polycrystalline Co2FeGe films with composition close to stoichiometry have been fabricated using magnetron co-sputtering technique. Effects of substrate temperature (TS) and post-deposition annealing (Ta) on structure, static and dynamic magnetic properties were systematically studied. It is shown that elevated TS (Ta) promote formation of ordered L21 crystal structure. Variation of TS (Ta) allow modification of magnetic properties in a broad range. Saturation magnetization ~920 emu/cm3 and low magnetization damping parameter α ~ 0.004 were achieved for TS = 573 K. This in combination with soft ferromagnetic properties (coercivity below 6 Oe) makes the films attractive candidates for spin-transfer torque and magnonic devices.

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