scholarly journals Formation and propagation of solitonlike defect clusters in confined active nematics with chiral anchoring

2021 ◽  
Vol 3 (2) ◽  
Author(s):  
Zhong-Yi Li ◽  
De-Qing Zhang ◽  
Bo Li
Keyword(s):  
Defect Clusters

Annealing Of Radiation Damage in Tungsten

1970 ◽  
Vol 28 ◽  
pp. 412-413
Author(s):  
Robert C. Rau ◽  
John Moteff
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Radiation Damage ◽  
Thermal Annealing ◽  
Neutron Fluence ◽  
Dislocation Loops ◽  
Defect Clusters ◽  
Polycrystalline Tungsten ◽  
Transmission Electron ◽  
Radiation Induced

Transmission electron microscopy has been used to study the thermal annealing of radiation induced defect clusters in polycrystalline tungsten. Specimens were taken from cylindrical tensile bars which had been irradiated to a fast (E > 1 MeV) neutron fluence of 4.2 × 1019 n/cm2 at 70°C, annealed for one hour at various temperatures in argon, and tensile tested at 240°C in helium. Foils from both the unstressed button heads and the reduced areas near the fracture were examined.Figure 1 shows typical microstructures in button head foils. In the unannealed condition, Fig. 1(a), a dispersion of fine dot clusters was present. Annealing at 435°C, Fig. 1(b), produced an apparent slight decrease in cluster concentration, but annealing at 740°C, Fig. 1(C), resulted in a noticeable densification of the clusters. Finally, annealing at 900°C and 1040°C, Figs. 1(d) and (e), caused a definite decrease in cluster concentration and led to the formation of resolvable dislocation loops.

Examination of Extra Electron Diffraction Spots Observed in Deuterium-Irradiated Silicon by Using Parallel Electron Beam Illumination

1990 ◽  
Vol 48 (2) ◽  
pp. 490-491
Author(s):  
Ryuichiro Oshima ◽  
Shoichiro Honda ◽  
Tetsuo Tanabe
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Silicon Single Crystal ◽  
Mixed Solution ◽  
Parallel Beam ◽  
Defect Clusters ◽  
Float Zone ◽  
Transmission Electron ◽  
Extra Electron ◽  
Diffraction Patterns

In order to examine the origin of extra diffraction spots and streaks observed in selected area diffraction patterns of deuterium irradiated silicon, systematic diffraction experiments have been carried out by using parallel beam illumination.Disc specimens 3mm in diameter and 0.5mm thick were prepared from a float zone silicon single crystal(B doped, 7kΩm), and were chemically thinned in a mixed solution of nitric acid and hydrogen fluoride to make a small hole at the center for transmission electron microscopy. The pre-thinned samples were irradiated with deuterium ions at temperatures between 300-673K at 20keV to a dose of 1022ions/m2, and induced lattice defects were examined under a JEOL 200CX electron microscope operated at 160kV.No indication of formation of amorphous was obtained in the present experiments. Figure 1 shows an example of defects induced by irradiation at 300K with a dose of 2xl021ions/m2. A large number of defect clusters are seen in the micrograph.

Tem analysis of multiple-energy arsenic implanted and Rta'd silicon

1987 ◽  
Vol 45 ◽  
pp. 246-247
Author(s):  
R.A. Herring
Keyword(s):  
Device Fabrication ◽  
High Concentration ◽  
Tem Analysis ◽  
Defect Clusters ◽  
High Fluences ◽  
Small Defect ◽  
Before And After ◽  
The Matrix ◽  
The Difference ◽  
Factor Type

Rapid thermal annealing (RTA) of ion-implanted Si is important for device fabrication. The defect structures of 2.5, 4.0, and 6.0 MeV As-implanted silicon irradiated to fluences of 2E14, 4E14, and 6E14, respectively, have been analyzed by electron diffraction both before and after RTA at 1100°C for 10 seconds. At such high fluences and energies the implanted As ions change the Si from crystalline to amorphous. Three distinct amorphous regions emerge due to the three implantation energies used (Fig. 1). The amorphous regions are separated from each other by crystalline Si (marked L1, L2, and L3 in Fig. 1) which contains a high concentration of small defect clusters. The small defect clusters were similar to what had been determined earlier as being amorphous zones since their contrast was principally of the structure-factor type that arises due to the difference in extinction distance between the matrix and damage regions.

The evolution of the microstructure of 600 Mev proton irradiated materials

1990 ◽  
Vol 48 (4) ◽  
pp. 1002-1003
Author(s):  
R. Gotthardt ◽  
A. Horsewell ◽  
F. Paschoud ◽  
S. Proennecke ◽  
M. Victoria
Keyword(s):  
Nuclear Reactions ◽  
Dislocation Loops ◽  
Defect Clusters ◽  
Weak Beam ◽  
Stacking Fault Tetrahedra ◽  
Small Defect ◽  
Sufficient Intensity ◽  
Reactor Materials ◽  
Metallic Impurities ◽  
Beam Technique

Fusion reactor materials will be damaged by an intense field of energetic neutrons. There is no neutron source of sufficient intensity at these energies available at present, so the material properties are being correlated with those obtained in irradiation with other irradiation sorces. Irradiation with 600 MeV protons produces both displacement damage and impurities due to nuclear reactions. Helium and hydrogen are produced as gaseous impurities. Other metallic impurities are also created . The main elements of the microstructure observed after irradiation in the PIREX facility, are described in the following paragraphs.A. Defect clusters at low irradiation doses: In specimens irradiated to very low doses (1021-1024 protons.m-2), so that there is no superimposition of contrast, small defect clusters have been observed by the weak beam technique. Detailed analysis of the visible contrast (>0.5 nm diameter) revealed the presence of stacking fault tetrahedra, dislocation loops and a certain number of unidentified clusters . Typical results in Cu and Au are shown in Fig. 1.

Radiation-Induced Precipitation in Ti-6A1-4V

1980 ◽  
Vol 38 ◽  
pp. 154-155
Author(s):  
J. E. O'Neal ◽  
S. M. L. Sastry ◽  
J. W. Davis
Keyword(s):  
Dark Field ◽  
Dislocation Loops ◽  
Beta Titanium Alloy ◽  
Defect Clusters ◽  
Weak Beam ◽  
Beta Titanium ◽  
Small Defect ◽  
Radiation Induced ◽  
Vector Orientation ◽  
Defect Microstructures

The radiation-induced defect structure and nonequilibrium phase precipitation were studied in T1-6A1-4V (an alpha-beta titanium alloy), irradiated at 450 ± 30°C in row VII of the EBR-II to a fluence of 3.0 × 1021 neutrons/cm2 (En > 0.1 MeV). The Irradiation-induced defect microstructures were examined using bright-field, conventional dark-field, and weak-beam dark-field techniques. The nature of dislocations and dislocation loops was determined by standard-contrast experiments under two-beam conditions, and the small defect clusters were identified using the line-of-contrast criterion and black-white vector orientation criterion.

Defect Generation and Annihilation in 3C-SiC-(001) Homoepitaxial Growth by Sublimation

2013 ◽  
Vol 740-742 ◽  
pp. 283-286
Author(s):  
Philip Hens ◽  
Julian Müller ◽  
Günter Wagner ◽  
Rickard Liljedahl ◽  
Erdmann Spiecker ◽  
...  
Keyword(s):  
Chemical Vapor ◽  
Structural Defects ◽  
Silicon Substrates ◽  
Growth Step ◽  
Planar Defects ◽  
Defect Generation ◽  
Defect Clusters ◽  
Homoepitaxial Growth ◽  
Cubic Silicon Carbide ◽  
Thick Layers

In this paper we present a concept on the defect generation and annihilation during the homoepitaxial growth step of cubic silicon carbide by sublimation epitaxy on templates grown by chemical vapor deposition on silicon substrates. Several structural defects like stacking faults, twins and star defects show opposite evolution from the template layer into the sublimation grown material. While single planar defects tend to annihilate with increasing layer thickness, the defect clusters assigned to the star defects are enlarging. These issues contribute to a balance of how to achieve the best possible quality on thick layers.

scholarly journals Tight-Binding Molecular Dynamics Simulations on Point Defects Diffusion and Interactions in Crystalline Silicon

1995 ◽  
Vol 396 ◽  
Author(s):  
M. tang ◽  
L. colombo ◽  
T. Diaz De La Rubia
Keyword(s):  
Molecular Dynamics ◽  
Molecular Dynamics Simulations ◽  
Point Defects ◽  
Crystalline Silicon ◽  
Tight Binding ◽  
Diffusion Path ◽  
Binding Energies ◽  
Defect Clusters ◽  
Dynamics Simulations

AbstractTight-binding molecular dynamics (TBMD) simulations are performed (i) to evaluate the formation and binding energies of point defects and defect clusters, (ii) to compute the diffusivity of self-interstitial and vacancy in crystalline silicon, and (iii) to characterize the diffusion path and mechanism at the atomistic level. In addition, the interaction between individual defects and their clustering is investigated.

scholarly journals Ab initio investigation on oxygen defect clusters in UO2+x

2008 ◽  
Vol 93 (20) ◽  
pp. 201903 ◽  
Author(s):  
Hua Y. Geng ◽  
Ying Chen ◽  
Yasunori Kaneta ◽  
Motoyasu Kinoshita
Keyword(s):  
Ab Initio ◽  
Oxygen Defect ◽  
Defect Clusters

Reducible and non-reducible defect clusters in tin-doped indium oxide

2010 ◽  
Vol 150 (1-2) ◽  
pp. 18-21 ◽  
Author(s):  
Talgat M. Inerbaev ◽  
Ryoji Sahara ◽  
Hiroshi Mizuseki ◽  
Yoshiyuki Kawazoe ◽  
Takashi Nakamura
Keyword(s):  
Indium Oxide ◽  
Defect Clusters

Analysis of Defects in Heavily-Doped MBE-GaAs

1982 ◽  
Vol 14 ◽  
Author(s):  
C.B. Carter ◽  
D.M. Desimone ◽  
H.T. Griem ◽  
C.E.C. Wood
Keyword(s):  
Liquid Phase ◽  
Molecular Beam ◽  
Type Material ◽  
Grown Layer ◽  
Defect Clusters ◽  
Complex Defect ◽  
Heavily Doped ◽  
Rich Material ◽  
P Type ◽  
Very High

ABSTRACTGaAs Has Been Grown By Molecular-Beam Epitaxy (MBE) With Large Concentrations (∼1018CM−2) Of Sn, Si, Ge, And Mn As Dopants. The Heavily-Doped N-Type Material Has Been Found To Contain Regions Of A Very High Dislocation Density. An Analysis Of The Less Complex Defect Areas Shows That The Dislocations Originate In The MBE-Grown Layer. These Observations And Others On More Complex Defect Clusters Are Compared With Recent Studies Of Defects In Material Grown By Liquid Phase Epitaxy (LPE). The More Heavily Doped P-Type Material Contains Discs Of Mn-Rich Material At The Surface Of The MBEgrown Epilayer. Both The Structure And Composition Of These Regions Have Been Examined.

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