High-flux and high-resolution spectroscopic facility in the VUV region at Super-ACO

1998 ◽  
Vol 5 (3) ◽  
pp. 839-841 ◽  
Author(s):  
K. Ito ◽  
B. Lagarde ◽  
F. Polack ◽  
C. Alcaraz ◽  
L. Nahon
Keyword(s):  
High Resolution ◽  
Energy Range ◽  
Incident Radiation ◽  
Resolving Power ◽  
High Flux ◽  
Exit Beam

A new spectroscopic facility, consisting of a planar/helical undulator and a 6.65 m off-plane Eagle monochromator, has been designed. It can supply high-flux and high-resolution photons with `exotic' polarization in the 5–40 eV energy range. The astigmatism can be compromised by horizontally focusing the incident radiation on the grating. The rotation of a post-focusing toroidal mirror compensates for the deviation of the exit beam caused by the grating translation. The whole system will be installed at beamline SU5 of SUPER-ACO (0.8 GeV) at the beginning of 1998. With a 4300 grooves mm−1 grating, a resolving power of around 105 is expected at 20 eV.

A NEW XUV BEAMLINE ON A MULTI-POLE WIGGLER IN THE SRS

2002 ◽  
Vol 09 (01) ◽  
pp. 577-581 ◽  
Author(s):  
M. BOWLER ◽  
J. B. WEST ◽  
F. M. QUINN ◽  
D. M. P. HOLLAND ◽  
B. FELL ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Energy Range ◽  
Radiation Source ◽  
High Field ◽  
Ring Current ◽  
Scientific Research ◽  
Research Programme ◽  
Resolving Power ◽  
High Flux ◽  
Mirror Pair

An XUV beamline has been constructed on the SRS synchrotron radiation source at Daresbury Laboratory, exploiting the output from a 2 T multi-pole wiggler. The beamline is based on an SGM design and produces photons in the energy range 40–350 eV. By taking a 7.5 mrad fan, a high flux of between 1 × 1013 and 1 × 1014 photons/s/300 mA ring current can be delivered, with a resolving power of around 1000. A Kirkpatrick–Baez mirror pair focuses the light onto the entrance slit of the monochromator. Using 10 · m entrance and exit slits, a resolving power of up to 10,000 can be achieved, with a flux of 0.5–2 × 1011 photons/s/300 mA. The calculated and measured performance is presented, with emphasis on the challenges associated with utilizing the XUV output of a high field MPW source. In addition, the scientific research programme is outlined.

Design of a high-flux and high-resolution VUV bending-magnet beamline

1998 ◽  
Vol 5 (3) ◽  
pp. 562-564 ◽  
Author(s):  
T.-F. Hsieh ◽  
L.-R. Huang ◽  
S.-C. Chung ◽  
T.-E. Dann ◽  
P.-C. Tseng ◽  
...  
Keyword(s):  
High Resolution ◽  
Incident Angle ◽  
Normal Incidence ◽  
Resolving Power ◽  
High Flux ◽  
Image Size ◽  
Exit Slit ◽  
Sample Position ◽  
Grating Monochromator ◽  
Under Construction

A high-flux and high-resolution VUV beamline (4–40 eV) has been designed and is under construction at SRRC. This beamline, which collects 50 mrad of horizontal radiation, uses a 6 m cylindrical-grating monochromator with an incident angle of 70° instead of the conventional normal-incidence-monochromator (NIM) design. Special features, such as movable entrance slit, bendable vertical focusing mirror and movable curved exit slit, are employed to enhance greatly the beamline performance. With both slit openings set at 10 µm, the energy-resolving power can reach as high as 70000. Photon fluxes of 1 × 1013 and 1 × 1010 photons s−1 are calculated for energy-resolving powers of 1000 and 40000, respectively. The best image size at the sample position is smaller than 0.45 × 0.2 mm.

The gas-phase photoemission beamline at Elettra

1998 ◽  
Vol 5 (3) ◽  
pp. 565-568 ◽  
Author(s):  
K. C. Prince ◽  
R. R. Blyth ◽  
R. Delaunay ◽  
M. Zitnik ◽  
J. Krempasky ◽  
...  
Keyword(s):  
High Resolution ◽  
Synchrotron Radiation ◽  
Gas Phase ◽  
Resolving Power ◽  
High Flux ◽  
Present Stage ◽  
Natural Line Width ◽  
Measured Absorption ◽  
Grating Monochromator ◽  
Design Value

This paper reports the present stage of commissioning of the gas-phase photoemission beamline at Elettra, Trieste. The beamline is designed for atomic and molecular science experiments with high-resolution and high-flux synchrotron radiation. It consists of an undulator source, variable-angle spherical-grating monochromator and two experimental stations. The design value of the energy range is 20 to 800 eV with a specified resolving power of over 10000. The procedure adopted for calibration of this type of monochromator is discussed. At present a resolving power up to 20000 and a range up to 900 eV have been measured. Absorption spectra taken at the argon L II,III-edge and at the nitrogen, oxygen and neon K-edges are as sharp as, or sharper than, any reported in the literature. The instrumental broadening is well below the natural line-width making it difficult to quantify the resolution; this problem is discussed.

High-resolution spherical grating monochromator for the undulator beamline (BL-16B) at the Photon Factory

1998 ◽  
Vol 5 (3) ◽  
pp. 777-779 ◽  
Author(s):  
Eiji Shigemasa ◽  
Akio Toyoshima ◽  
Yonglian Yan ◽  
Tatsuji Hayaishi ◽  
Koichi Soejima ◽  
...  
Keyword(s):  
High Resolution ◽  
Energy Range ◽  
Photon Energy ◽  
Resolving Power ◽  
Photon Energy Range ◽  
Photon Flux ◽  
Photon Factory ◽  
Grating Monochromator ◽  
And Performance

The design and performance of a 24 m high-resolution spherical grating monochromator (H-SGM) for the undulator beamline (BL-16B) at the Photon Factory are described. With three interchangeable gratings of 400, 900 and 2000 lines mm−1, the H-SGM is designed to cover the photon energy range 40–600 eV. With a resolving power of approximately 2000 in the photon energy range 40–530 eV, more than 1011 photons s−1 have been measured. The best resolutions obtained so far, at a substantially lower photon flux, are greater than 10 000 at 250 eV and 8000 at 400 eV

Design of an 18 m spherical-grating monochromator at UVSOR

1998 ◽  
Vol 5 (3) ◽  
pp. 774-776 ◽  
Author(s):  
Hiroaki Yoshida ◽  
Koichiro Mitsuke
Keyword(s):  
High Resolution ◽  
Energy Range ◽  
Ring Current ◽  
Optical Filters ◽  
High Order ◽  
Resolving Power ◽  
Photon Flux ◽  
Exit Slit ◽  
High Photon Flux ◽  
Grating Monochromator

An 18 m spherical-grating monochromator with high resolution and high photon flux has been developed at the bending-magnet beamline BL2B2 of the UVSOR facility in the Institute for Molecular Science. The monochromator is designed to cover the energy range 20–200 eV by using three gratings: G1 (2400 lines mm−1, R = 18 m) at 80–200 eV; G2 (1200 lines mm−1, R = 18 m) at 40–100 eV; G3 (2400 lines mm−1, R = 9.25 m) at 20–50 eV. A resolving power of 5000 and a photon flux of more than 1010 photons s−1 are expected at a 100 mA ring current. A small including angle of 140° is adopted for G3 and two plane mirrors coated with aluminium are located between G3 and the exit slit as optical filters. These geometrical devices may contribute significantly to the reduction of the high-order lights.

The High Resolution Scanning Transmission Electron Microscope

1974 ◽  
Vol 32 ◽  
pp. 316-317
Author(s):  
A. V. Crewe
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
High Vacuum ◽  
Scanning Transmission Electron Microscope ◽  
Ultra High Vacuum ◽  
Resolving Power ◽  
Imaging Characteristics ◽  
Transmission Electron ◽  
Scanning Transmission ◽  
The Moment

The high resolution STEM is now a fact of life. I think that we have, in the last few years, demonstrated that this instrument is capable of the same resolving power as a CEM but is sufficiently different in its imaging characteristics to offer some real advantages.It seems possible to prove in a quite general way that only a field emission source can give adequate intensity for the highest resolution^ and at the moment this means operating at ultra high vacuum levels. Our experience, however, is that neither the source nor the vacuum are difficult to manage and indeed are simpler than many other systems and substantially trouble-free.

An Analysis of Dissociation of Molecules in a High Resolution Electron Microscope

1973 ◽  
Vol 31 ◽  
pp. 486-487
Author(s):  
Mihir Parikh
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
Cross Sections ◽  
Resolving Power ◽  
Peak Intensity ◽  
Molecular Film ◽  
Resolution Electron ◽  
Dissociation Cross Section ◽  
High Resolution Electron Microscope ◽  
The Stability

It is well known that the resolution of bio-molecules in a high resolution electron microscope depends not just on the physical resolving power of the instrument, but also on the stability of these molecules under the electron beam. Experimentally, the damage to the bio-molecules is commo ly monitored by the decrease in the intensity of the diffraction pattern, or more quantitatively by the decrease in the peaks of an energy loss spectrum. In the latter case the exposure, EC, to decrease the peak intensity from IO to I’O can be related to the molecular dissociation cross-section, σD, by EC = ℓn(IO /I’O) /ℓD. Qu ntitative data on damage cross-sections are just being reported, However, the microscopist needs to know the explicit dependence of damage on: (1) the molecular properties, (2) the density and characteristics of the molecular film and that of the support film, if any, (3) the temperature of the molecular film and (4) certain characteristics of the electron microscope used

Practical High Resolution Microscopy

1968 ◽  
Vol 26 ◽  
pp. 302-303
Author(s):  
P. A. Marsh ◽  
T. Mullens ◽  
D. Price
Keyword(s):  
High Resolution ◽  
Magnetic Fields ◽  
Low Frequency ◽  
Resolving Power ◽  
Careful Attention ◽  
Electron Microscopes ◽  
The Relationship ◽  
High Resolution Microscopy ◽  
New Facilities

It is possible to exceed the guaranteed resolution on most electron microscopes by careful attention to microscope parameters essential for high resolution work. While our experience is related to a Philips EM-200, we hope that some of these comments will apply to all electron microscopes.The first considerations are vibration and magnetic fields. These are usually measured at the pre-installation survey and must be within specifications. It has been our experience, however, that these factors can be greatly influenced by the new facilities and therefore must be rechecked after the installation is completed. The relationship between the resolving power of an EM-200 and the maximum tolerable low frequency interference fields in milli-Oerstedt is 10 Å - 1.9, 8 Å - 1.4, 6 Å - 0.8.

A Super-High-Resolution HVEM (H-1500) Newly Installed in NIRIM

1990 ◽  
Vol 48 (1) ◽  
pp. 142-143
Author(s):  
S. Horiuchi ◽  
Y. Matsui
Keyword(s):  
Magnetic Field ◽  
High Resolution ◽  
Chromatic Aberration ◽  
Inorganic Materials ◽  
Electron Gun ◽  
Resolving Power ◽  
National Budget ◽  
Voltage Electron ◽  
Specimen Holder ◽  
The Magnetic Field

A new high-voltage electron microscope (H-1500) specially aiming at super-high-resolution (1.0 Å point-to-point resolution) is now installed in National Institute for Research in Inorganic Materials ( NIRIM ), in collaboration with Hitachi Ltd. The national budget of about 1 billion yen including that for a new building has been spent for the construction in the last two years (1988-1989). Here we introduce some essential characteristics of the microscope.(1) According to the analysis on the magnetic field in an electron lens, based on the finite-element-method, the spherical as well as chromatic aberration coefficients ( Cs and Cc ). which enables us to reach the resolving power of 1.0Å. have been estimated as a function of the accelerating As a result of the calculaton. it was noted that more than 1250 kV is needed even when we apply the highest level of the technology and materials available at present. On the other hand, we must consider the protection against the leakage of X-ray. We have then decided to set the conventional accelerating voltage at 1300 kV. However. the maximum accessible voltage is 1500 kV, which is practically important to realize higher voltage stabillity. At 1300 kV it is expected that Cs= 1.7 mm and Cc=3.4 mm with the attachment of the specimen holder, which tilts bi-axially in an angle of 35° ( Fig.1 ). In order to minimize the value of Cc a small tank is additionally placed inside the generator tank, which must serve to seal the magnetic field around the acceleration tube. An electron gun with LaB6 tip is used.

Performance of the vacuum ultraviolet high-resolution and high-flux beamline for chemical dynamics studies at the Advanced Light Source

1997 ◽  
Vol 68 (5) ◽  
pp. 1945-1951 ◽  
Author(s):  
P. A. Heimann ◽  
M. Koike ◽  
C. W. Hsu ◽  
D. Blank ◽  
X. M. Yang ◽  
...  
Keyword(s):  
High Resolution ◽  
Light Source ◽  
Vacuum Ultraviolet ◽  
High Flux ◽  
Chemical Dynamics ◽  
Advanced Light Source
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