Kaolin: A system-level AADL tool for FPGA design reuse, upgrade and migration

Abstract: Introduction: The Human Resources for Health (HRH) mobility and migration are considered as global phenomena. The European Union often faces the mobility of health professionals on a system level. Hungary is recognised among the sending countries, therefore both international and national level health workforce monitoring, planning, and forecasting are inevitable. Aim: The purpose of this research was to investigate the national demographical profiles of the medical professions affected most significantly by the Hungarian HRH mobility process. Method: Age and regional distribution analyses of the requests for degree certificate issued by the National Healthcare Services Centre were carried out between the years of 2010 and 2017. Results: In Hungary, the rate of mobility – the number of requests for degree certificate among the licensed to practice professionals – resulted in the following: the highest rate was detected in anaesthesiology and intensive therapy with 23.5%, in surgery 17.9%, then internal medicine 7.9%, paediatrics 7.4%, and in general practice 6.4%. According to the results, in the 5 above mentioned professions, the physicians most affected by mobility are mostly from the age cohort of 50+. Furthermore, the results also highlight the territorial inequalities: the region of the capital as well as the medical university towns and counties are in the most favourable situation in terms of professional care and supply. Conclusion: Therefore, it can be concluded that in the case of the 5 investigated subspecialties, not only the overall age of the physicians is higher in the disadvantaged areas, but these regions also have to face a more severe shortage of specialists. Orv Hetil. 2019; 160(31): 1223–1230.

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Tools for system level design [FPGA design]

Embedded Systems Conference ESS2005 Incorporating the IEE FPGA Developers Forum ◽

10.1049/ic:20050643 ◽

2005 ◽

Author(s):

M. Dickinson

Keyword(s):

System Level ◽

System Level Design ◽

Fpga Design ◽

Level Design

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Wiederverwendbarer Entwurf auf Systemebene (System-Level Design Reuse)

it - Information Technology ◽

10.1524/itit.2002.44.2.065 ◽

2002 ◽

Vol 44 (2) ◽

Author(s):

Ralf Seepold ◽

Natividad Martínez Madrid

Keyword(s):

Intellectual Property ◽

Design Automation ◽

Electronic Design Automation ◽

System On Chip ◽

System Level ◽

Design Reuse ◽

Wird Eine ◽

System Level Design ◽

On Chip ◽

Electronic Design

Die steigende Integrationsdichte sowie die sich verkürzenden Marktzyklen für den System-on-Chip- Entwurf machen es erforderlich, dass Wiederverwendung von Intellectual Property (IP) bereits auf Systemebene realisiert werden muss. Der plattformbasierte Entwurf ist dabei eine Möglichkeit, um die effiziente Integration von IPs durchzuführen. Im Folgenden wird eine Besprechung mehrerer Organisationen durchgeführt, die in Bereich System-Level-Standardisierung zielen. Zuletzt werden relevante Wiederverwendungsaspekte der European Electronic Design Automation Roadmap herausgestellt.

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RT Component Sets for High-Level Design Applications

VLSI Design ◽

10.1155/1997/35614 ◽

1997 ◽

Vol 5 (2) ◽

pp. 155-165 ◽

Cited By ~ 2

Author(s):

Nikil D. Dutt ◽

Pradip K. Jha

Keyword(s):

Block Diagram ◽

System Level ◽

Design Reuse ◽

Model Generation ◽

Synthesis System ◽

Design Specification ◽

Automatic Model Generation ◽

On Line ◽

Level Design ◽

High Level

The system-level design process typically involves refining a design specification down to the point where each of the system's components is described as a block diagram or netlist of abstract Register-Transfer (RT) level components. In this paper, we motivate the need for such a standard RT component set, and describe a library environment that supports automatic model generation, design reuse, and synthesis with technology-specific estimators. We demonstrate the efficacy of the standard RT-component set approach with experiments performed on the HLSW92 benchmarks. Our preliminary results indicate only a small overhead of about 10% in using these standard, generic components. We then describe an automatic model generation and technology projection scheme that uses fast (on-line) estimators for predicting the area and delay of generic RT components tuned to a particular technology library with an accuracy of 10%. These model generators and estimators have been integrated with a high-level synthesis system at U.C. Irvine.

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Demonstration of Retinal Glycogen with Silver Methenamine

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100066875 ◽

1971 ◽

Vol 29 ◽

pp. 564-565

Author(s):

A. W. Sedar ◽

G. H. Bresnick

Keyword(s):

Lactic Acid ◽

Chromic Acid ◽

Periodic Acid ◽

Müller Cell ◽

External Limiting Membrane ◽

Electron Microscope Level ◽

Reactive Process ◽

Inner Limiting Membrane ◽

Muller Cell ◽

And Migration

After experimetnal damage to the retina with a variety of procedures Müller cell hypertrophy and migration occurs. According to Kuwabara and others the reactive process in these injuries is evidenced by a marked increase in amount of glycogen in the Müller cells. These cells were considered originally supporting elements with fiber processes extending throughout the retina from inner limiting membrane to external limiting membrane, but are known now to have high lactic acid dehydrogenase activity and the ability to synthesize glycogen. Since the periodic acid-chromic acid-silver methenamine technique was shown to demonstrate glycogen at the electron microscope level, it was selected to react with glycogen in the fine processes of the Müller cell that ramify among the neural elements in various layers of the retina and demarcate these cells cytologically. The Rhesus monkey was chosen as an example of a well vascularized retina and the rabbit as an example of a avascular retina to explore the possibilities of the technique.

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Structure and migration of planar defects in crystals observed in atomic scale

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100108568 ◽

1978 ◽

Vol 36 (1) ◽

pp. 284-285 ◽

Cited By ~ 1

Author(s):

H. Hashimoto ◽

Y. Sugimoto ◽

Y. Takai ◽

H. Endoh

Keyword(s):

Electron Microscope ◽

Rotation Angle ◽

Crystal Surface ◽

Electron Gun ◽

Atomic Scale ◽

Present Observation ◽

Twist Boundary ◽

Optical Magnification ◽

Zinc Crystal ◽

And Migration

As was demonstrated by the present authors that atomic structure of simple crystal can be photographed by the conventional 100 kV electron microscope adjusted at “aberration free focus (AFF)” condition. In order to operate the microscope at AFF condition effectively, highly stabilized electron beams with small energy spread and small beam divergence are necessary. In the present observation, a 120 kV electron microscope with LaB6 electron gun was used. The most of the images were taken with the direct electron optical magnification of 1.3 million times and then magnified photographically.1. Twist boundary of ZnSFig. 1 is the image of wurtzite single crystal with twist boundary grown on the surface of zinc crystal by the reaction of sulphur vapour of 1540 Torr at 500°C. Crystal surface is parallel to (00.1) plane and electron beam is incident along the axis normal to the crystal surface. In the twist boundary there is a dislocation net work between two perfect crystals with a certain rotation angle.

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