A quadrupole mass spectrometer unit was utilized to accurately detect the chemical
species present inside a SiC CVD reactor growth chamber before, during, and after epitaxial
deposition. The in-situ mass spectrometer has been able to confirm the presence of silane (SiH4)
and propane (C3H8) decomposition products (eg. Si and CH4) that were predicted from chemical
modelling, and give insight into specific reaction kinetics. Additionally, the mass spectrometer has
positively detected trace amounts of oxygen, which has helped to identify process weaknesses and
possible sources of vacuum leaks.