Polarization-Independent Two-Layer Grating With Five-Port Splitting Output Under Normal Incidence

An ultra-wideband (UWB) frequency-selective surface (FSS) exhibiting band rejection characteristic is presented in this paper. The proposed unit cell has the size of 14 × 14 mm2 which is approximately 0.18 × 0.18 λo, where λo corresponds to free space wavelength at the lower cut-off frequency. The proposed UWB FSS consists of a single-layer substrate and provides 20 dB attenuation level for a wide bandwidth of 7.53 GHz at the normal incidence. The proposed FSS is polarization independent and also provides angular-independent operation for the EM wave incidences of 15°, 30° and 45° with 11.5 dB attenuation over a wide range from 4 to 14 GHz.

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A Wideband and Polarization-Independent Metasurface Based on Phase Optimization for Monostatic and Bistatic Radar Cross Section Reduction

International Journal of Antennas and Propagation ◽

10.1155/2016/7595921 ◽

2016 ◽

Vol 2016 ◽

pp. 1-9 ◽

Cited By ~ 1

Author(s):

Jianxun Su ◽

Yao Lu ◽

Zengrui Li ◽

Rongrong Zhang ◽

Yaoqing (Lamar) Yang

Keyword(s):

Cross Section ◽

Normal Incidence ◽

Radar Cross Section ◽

Field Pattern ◽

Bistatic Radar ◽

Em Scattering ◽

Far Field Pattern ◽

Periodic Arrangement ◽

Polarization Independent ◽

Good Agreement

A broadband and polarization-independent metasurface is analyzed and designed for both monostatic and bistatic radar cross section (RCS) reduction in this paper. Metasurfaces are composed of two types of electromagnetic band-gap (EBG) lattice, which is a subarray with “0” or “π” phase responses, arranged in periodic and aperiodic fashions. A new mechanism is proposed for manipulating electromagnetic (EM) scattering and realizing the best reduction of monostatic and bistatic RCS by redirecting EM energy to more directions through controlling the wavefront of EM wave reflected from the metasurface. Scattering characteristics of two kinds of metasurfaces, periodic arrangement and optimized phase layout, are studied in detail. Optimizing phase layout through particle swarm optimization (PSO) together with far field pattern prediction can produce a lot of scattering lobes, leading to a great reduction of bistatic RCS. For the designed metasurface based on optimal phase layout, a bandwidth of more than 80% is achieved at the normal incidence for the −9.5 dB RCS reduction for both monostatic and bistatic. Bistatic RCS reduction at frequency points with exactly 180° phase difference reaches 17.6 dB. Both TE and TM polarizations for oblique incidence are considered. The measured results are in good agreement with the corresponding simulations.

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Analysis of Contrast Reversal in SEM Images

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s042482010009525x ◽

1972 ◽

Vol 30 ◽

pp. 398-399

Author(s):

M. D. Coutts ◽

E. R. Levin

Keyword(s):

Incident Beam ◽

Normal Incidence ◽

Beam Current ◽

Secondary Emission ◽

Image Contrast ◽

Sem Images ◽

Secondary Electrons ◽

Image Position

On tilting samples in an SEM, the image contrast between two elements, x and y often decreases to zero at θε, which we call the no-contrast angle. At angles above θε the contrast is reversed, θ being the angle between the specimen normal and the incident beam. The available contrast between two elements, x and y, in the SEM can be defined as,(1)where ix and iy are the total number of reflected and secondary electrons, leaving x and y respectively. It can easily be shown that for the element x,(2)where ib is the beam current, isp the specimen absorbed current, δo the secondary emission at normal incidence, k is a constant, and m the reflected electron coefficient.

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Characterization of Rh/Si multilayer structure by HREM and HAADF

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100121016 ◽

1992 ◽

Vol 50 (1) ◽

pp. 122-123

Author(s):

Y. Cheng ◽

J. Liu ◽

M.B. Stearns ◽

D.G. Steams

Keyword(s):

Normal Incidence ◽

High Resolution Electron Microscopy ◽

X Rays ◽

Beam Direction ◽

Cross Sectional ◽

Optical Elements ◽

Resolution Electron ◽

Point To Point ◽

Better Than

The Rh/Si multilayer (ML) thin films are promising optical elements for soft x-rays since they have a calculated normal incidence reflectivity of ∼60% at a x-ray wavelength of ∼13 nm. However, a reflectivity of only 28% has been attained to date for ML fabricated by dc magnetron sputtering. In order to determine the cause of this degraded reflectivity the microstructure of this ML was examined on cross-sectional specimens with two high-resolution electron microscopy (HREM and HAADF) techniques.Cross-sectional specimens were made from an as-prepared ML sample and from the same ML annealed at 298 °C for 1 and 100 hours. The specimens were imaged using a JEM-4000EX TEM operating at 400 kV with a point-to-point resolution of better than 0.17 nm. The specimens were viewed along Si [110] projection of the substrate, with the (001) Si surface plane parallel to the beam direction.

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On resolving fine periodic microstructures in the optical microscope

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100153798 ◽

1989 ◽

Vol 47 ◽

pp. 364-365

Author(s):

W.S. Putnam ◽

C. Viney

Keyword(s):

Liquid Crystalline ◽

Numerical Aperture ◽

Polarized Light ◽

Normal Incidence ◽

Optical Microscope ◽

Angle Of Incidence ◽

Resolution Limit ◽

Crystalline Materials ◽

Periodic Microstructures ◽

Liquid Crystalline Materials

Many sheared liquid crystalline materials (fibers, films and moldings) exhibit a fine banded microstructure when observed in the polarized light microscope. In some cases, for example Kevlar® fiber, the periodicity is close to the resolution limit of even the highest numerical aperture objectives. The periodic microstructure reflects a non-uniform alignment of the constituent molecules, and consequently is an indication that the mechanical properties will be less than optimal. Thus it is necessary to obtain quality micrographs for characterization, which in turn requires that fine detail should contribute significantly to image formation.It is textbook knowledge that the resolution achievable with a given microscope objective (numerical aperture NA) and a given wavelength of light (λ) increases as the angle of incidence of light at the specimen surface is increased. Stated in terms of the Abbe resolution criterion, resolution improves from λ/NA to λ/2NA with increasing departure from normal incidence.

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Microspectroscopy Using a Solid Immersion Lens

Microscopy and Microanalysis ◽

10.1017/s1431927600026817 ◽

2001 ◽

Vol 7 (S2) ◽

pp. 148-149

Author(s):

C.D. Poweleit ◽

J Menéndez

Keyword(s):

Spatial Resolution ◽

Focal Plane ◽

Numerical Aperture ◽

Normal Incidence ◽

Spot Size ◽

Index Of Refraction ◽

Objective Lens ◽

Improvement Factor ◽

Oil Immersion ◽

Long Time

Oil immersion lenses have been used in optical microscopy for a long time. The light’s wavelength is decreased by the oil’s index of refraction n and this reduces the minimum spot size. Additionally, the oil medium allows a larger collection angle, thereby increasing the numerical aperture. The SIL is based on the same principle, but offers more flexibility because the higher index material is solid. in particular, SILs can be deployed in cryogenic environments. Using a hemispherical glass the spatial resolution is improved by a factor n with respect to the resolution obtained with the microscope’s objective lens alone. The improvement factor is equal to n2 for truncated spheres.As shown in Fig. 1, the hemisphere SIL is in contact with the sample and does not affect the position of the focal plane. The focused rays from the objective strike the lens at normal incidence, so that no refraction takes place.

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