Investigation of Low-Temperature Hydrogen Plasma-Etching Processes for Silicon Wafer Solar Cell Surface Passivation in an Industrial Inductively Coupled Plasma Deposition Tool

2016 ◽  
Vol 6 (1) ◽  
pp. 10-16 ◽  
Author(s):  
Muzhi Tang ◽  
Jia Ge ◽  
Johnson Wong ◽  
Zhe Liu ◽  
Torsten Dippell ◽  
...  
Keyword(s):  
Solar Cell ◽  
Low Temperature ◽  
Cell Surface ◽  
Silicon Wafer ◽  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Surface Passivation ◽  
Plasma Deposition ◽  
Hydrogen Plasma ◽  
Inductively Coupled

HIGH-QUALITY INTRINSIC ZnO FILM FOR THE APPLICATION OF SOLAR CELL GROWN BY ICP-ASSISTED REACTIVE DC MAGNETRON SPUTTERING AT LOW TEMPERATURE

2007 ◽  
Vol 14 (06) ◽  
pp. 1083-1087
Author(s):  
X. B. XU ◽  
S. M. HUANG ◽  
Y. W. CHEN ◽  
Z. SUN ◽  
S. Y. HUANG
Keyword(s):  
Solar Cell ◽  
Low Temperature ◽  
Magnetron Sputtering ◽  
Inductively Coupled Plasma ◽  
Visible Range ◽  
Zno Film ◽  
Dc Magnetron Sputtering ◽  
Working Pressure ◽  
Solar Cell Application ◽  
Inductively Coupled

Intrinsic zinc oxide (i- ZnO ) film was prepared for CuInSe 2 (CIS) solar cell application [L. Stolt and J. Hedstrom, Appl. Phys. Lett.62 (1993) 8; D. Rudmann, Ph.D. Thesis, University of Basel, Basel, (2004)] on glass substrate by inductively coupled plasma (ICP)-assisted DC magnetron sputtering and under a quite low temperature of 50°C. The sputtering was done in an Ar and O 2 gas mixture and a ceramic ZnO target was used. The microstructures of the film were investigated by X-ray diffractometer and scanning electron microscope. It was shown that all of the films had a c-axis preferred orientation perpendicular to the substrate. In our work, film with resistivity of 7 × 108Ω· cm and transmittance of about 80% in the visible range was prepared under the conditions of 4 mTorr working pressure and 50°C temperature.

Low temperature SiNx:H films deposited by inductively coupled plasma for solar cell applications

2013 ◽  
Vol 264 ◽  
pp. 21-26 ◽  
Author(s):  
H.P. Zhou ◽  
D.Y. Wei ◽  
L.X. Xu ◽  
Y.N. Guo ◽  
S.Q. Xiao ◽  
...  
Keyword(s):  
Solar Cell ◽  
Low Temperature ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled

Inductively coupled plasma etching for delineation of InAs/GaSb pixels

2012 ◽  
Author(s):  
Jean Nguyen ◽  
John Gill ◽  
Sir B. Rafol ◽  
Alexander Soibel ◽  
Arezou Khoshakhlagh ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Inductively coupled plasma etching of HgCdTe using a CH4-based mixture

2005 ◽  
Vol 34 (6) ◽  
pp. 740-745 ◽  
Author(s):  
E. Laffosse ◽  
J. Baylet ◽  
J. P. Chamonal ◽  
G. Destefanis ◽  
G. Cartry ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Fabrication of GaN nanorods by inductively coupled plasma etching via SiO2 nanosphere lithography

2009 ◽  
Vol 517 (14) ◽  
pp. 3859-3861 ◽  
Author(s):  
Byung-Jae Kim ◽  
Hyunjung Jung ◽  
Hong-Yeol Kim ◽  
Joona Bang ◽  
Jihyun Kim
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Nanosphere Lithography ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Factors Affecting the Top Stripping of GaAs Microwire Array Fabricated by Inductively Coupled Plasma Etching

2015 ◽  
Vol 32 (5) ◽  
pp. 058102 ◽  
Author(s):  
Ying Cheng ◽  
Ji-Jun Zou ◽  
Ming Wan ◽  
Wei-Lu Wang ◽  
Xin-Cun Peng ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Factors Affecting ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled
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