Chemical Beam Epitaxy of GalnP on GaAs(l 00) Substrates and its Application to 0.98μm Lasers

Author(s):  
R.M. Kapre ◽  
W.T. Tsang ◽  
Y.K. Chen ◽  
M.C. Wu ◽  
M.A. Chin
1998 ◽  
Vol 188 (1-4) ◽  
pp. 377-382 ◽  
Author(s):  
Jeong-Rae Ro ◽  
Sung-Bock Kim ◽  
El-Hang Lee

1992 ◽  
Vol 28 (11) ◽  
pp. 1001-1002 ◽  
Author(s):  
F.S. Choa ◽  
W.T. Tsang ◽  
R.A. Logan ◽  
R.P. Gnall ◽  
U. Koren ◽  
...  

2001 ◽  
Vol 178 (1-4) ◽  
pp. 63-74
Author(s):  
N. Dietz ◽  
S.C. Beeler ◽  
J.W. Schmidt ◽  
H.T. Tran

2011 ◽  
Vol 158 (2) ◽  
pp. D72 ◽  
Author(s):  
Ali Dabirian ◽  
Scott Harada ◽  
Yury Kuzminykh ◽  
Silviu Cosmin Sandu ◽  
Estelle Wagner ◽  
...  

2000 ◽  
Vol 618 ◽  
Author(s):  
J. Bettini ◽  
M.M.G. de Carvalho ◽  
M. A. Hayashi ◽  
L. P. Cardoso ◽  
D. Ugarte

ABSTRACTIn this work, In0.5Ga0.5P layers were grown by Chemical Beam Epitaxy on GaAs (001) substrates. A set of samples was grown with temperatures kept in the range of 500°C to 560°C with V/III ratio 15. Another set was grown at 560°C with V/II ratio varied in the range 15 to 35. The evolution of ordering as function of growth temperature and V/III ratio was evaluated by photoluminescence measurements at 77K, Transmission Electron Diffraction (TED) and images using Transmission Electron Microscopy (TEM)-Dark Field. A 48meV reduction in the band gap energy was measured by photoluminescence measurements at 77 K when growth temperature was increased. This result is associated to the occurrence of CuPtB ordering in the InGaP layers observed by TED. The TEM-Dark field examination shows that the ordered domains are larger for samples grown at higher temperaturesA small reduction in band gap, from 1.915eV to 1.902eV, occurs when the V/III ratio is increased from 15 to 35. The TED patterns present diffuse scattering for all samples. For those grown with higher V/III ratio, spots are also observed. TEM-dark field images show that the ordered regions become larger, elongated and inclined; some of them exhibit long range ordering


1998 ◽  
Vol 510 ◽  
Author(s):  
R. Jothilingam ◽  
T. Farrell ◽  
T.B. Joyce ◽  
P.J. Goodhew

AbstractWe report the photo modified growth of GaAs by chemical beam epitaxy at substrate temperatures in the range 335 to 670°C using triethygallium (TEG) and arsine. A mercury-xenon lamp (electrical power 200 W) provided the irradiation for the photoassisted growth. The growth was monitored in real time by laser reflectometry (LR) using a 670 nm semiconductor laser, and the optically determined growth rate agreed with that obtained from the layer thickness measured by cross sectional transmission electron microscopy. The observed photo-enhancement of the growth rate at low substrate temperatures and inhibition at high substrate temperatures is thermal in origin, consistent with raising the substrate temperature by 10±3°C. Cross sectional transmission electron microscopy showed that the photoassisted layers are essentially free from dislocations


2010 ◽  
Vol 8 (2) ◽  
pp. 616-618 ◽  
Author(s):  
Boussairi Bouzazi ◽  
Hidetoshi Suzuki ◽  
Nobuaki Kojima ◽  
Yoshio Ohshita ◽  
Masafumi Yamaguchi

Author(s):  
Hidetoshi Suzuki ◽  
Kenichi Nishimura ◽  
Hae-seok Lee ◽  
Kenji Saito ◽  
Tetsuya Kawahigashi ◽  
...  

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