Surface Modification of Si Wafer by Low-Pressure High-Frequency Plasma Chemical Vapor Deposition Method
2011 ◽
Vol 39
(6)
◽
pp. 1427-1431
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2015 ◽
Vol 18
(1)
◽
1997 ◽
Vol 36
(Part 1, No. 7B)
◽
pp. 4893-4896
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Selective growth of CNT by using triode-type radio frequency plasma chemical vapor deposition method
2007 ◽
Vol 16
(4-7)
◽
pp. 1106-1109
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2003 ◽
Vol 21
(2)
◽
pp. 515-517
◽
2015 ◽
Vol 749
◽
pp. 121-125
2009 ◽
Vol 54
(1)
◽
pp. 194-199
◽
2000 ◽
Vol 9
(9-10)
◽
pp. 1604-1607
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2014 ◽
Vol 42
(10)
◽
pp. 2794-2795
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