Noninvasive sensing of thermal treatments of Japanese seafood products using imaging spectroscopy

Cooking is an important processing method, that has been used since ancient times in order to both ensure microbiological safety and give desired organoleptic properties to the cooked food. Fish and other seafood products are highly sensitive to thermal treatments and the application of severe heat can result in negative consequences on sensory and nutritional parameters, as well as other quality attributes of the thermally processed products. To avoid such undesired effects and to extend the shelf life of these perishable products, both the heat processing methods and the assessment techniques used to monitor the process should be optimized. In this review paper, the most common cooking methods and some innovative ones will first be presented with a brief discussion of their impact on seafood quality. The main methods used for monitoring heat treatments will then be reviewed with a special focus on spectroscopic techniques, which are known to be rapid and non-destructive methods compared to traditional approaches. Finally, viewpoints of the current challenges will be discussed and possible directions for future applications and research will be suggested. The literature presented in this review clearly demonstrates the potential of spectroscopic techniques, coupled with chemometric tools, for online monitoring of heat-induced changes resulting from the application of thermal treatments of seafood. The use of fluorescence hyperspectral imaging is especially promising, as the technique combines the merits of both fluorescence spectroscopy (high sensitivity and selectivity) and hyperspectral imaging (spatial dimension). With further research and investigation, the few current limitations of monitoring thermal treatments by spectroscopy can be addressed, thus enabling the use of spectroscopic techniques as a routine tool in the seafood industry.

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Tracing the Thermal History of Seafood Products through Lysophospholipid Analysis by Hydrophilic Interaction Liquid Chromatography–Electrospray Ionization Fourier Transform Mass Spectrometry

Molecules ◽

10.3390/molecules23092212 ◽

2018 ◽

Vol 23 (9) ◽

pp. 2212 ◽

Cited By ~ 1

Author(s):

Ilario Losito ◽

Laura Facchini ◽

Rosa Catucci ◽

Cosima Calvano ◽

Tommaso Cataldi ◽

...

Keyword(s):

Mass Spectrometry ◽

Fourier Transform ◽

Liquid Chromatography ◽

Electrospray Ionization ◽

Fourier Transform Mass Spectrometry ◽

Hydrophilic Interaction Liquid Chromatography ◽

Thermal Treatments ◽

Hydrophilic Interaction ◽

Seafood Products ◽

History Of

Low temperature treatments commonly applied to seafood products have been shown to influence their phospholipid (PL) profile through enzymatic hydrolysis. In the present study, the generation of lysophospholipids (LPL) resulting from this process was systematically investigated for selected, commercially relevant seafood products, namely oysters, clams, octopuses, and shrimps. These products were subjected to thermal treatments like refrigeration or freezing after being purchased as fresh, defrozen, or frozen products depending on the case. The coupling between hydrophilic interaction liquid chromatography (HILIC) and electrospray ionization with high resolution/accuracy Fourier transform mass spectrometry (ESI-FTMS) was exploited to evaluate the PL profile of the cited products, especially the incidence of LPL related to the two main PL classes of seafood products—phosphatidylcholines (PC) and phosphatidylethanolamines (PE)—in the lipid extracts. The lyso forms of PE (LPE) were found to be generally more sensitive than those of PC (LPC) to thermal treatments, usually exhibiting a significant increase upon prolonged refrigeration at 4 °C in all types of investigated products except European flat oysters. Moreover, the distinction between fresh and frozen or defrozen products could be achieved in the case of octopuses and shrimps, respectively.

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Thermomechanical Treatment of a 4340 Ni-Cr-Mo Alloy Steel

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100098083 ◽

1981 ◽

Vol 39 ◽

pp. 314-315 ◽

Cited By ~ 1

Author(s):

M.T. Jahn ◽

J.C. Yang ◽

C.M. Wan

Keyword(s):

Mechanical Property ◽

Chemical Composition ◽

Alloy Steel ◽

Thermomechanical Treatment ◽

Room Temperature ◽

Good Combination ◽

Thermal Treatments ◽

Low Carbon ◽

4340 Steel ◽

Good Improvement

4340 Ni-Cr-Mo alloy steel is widely used due to its good combination of strength and toughness. The mechanical property of 4340 steel can be improved by various thermal treatments. The influence of thermomechanical treatment (TMT) has been studied in a low carbon Ni-Cr-Mo steel having chemical composition closed to 4340 steel. TMT of 4340 steel is rarely examined up to now. In this study we obtain good improvement on the mechanical property of 4340 steel by TMT. The mechanism is explained in terms of TEM microstructures4340 (0.39C-1.81Ni-0.93Cr-0.26Mo) steel was austenitized at 950°C for 30 minutes. The TMTed specimen (T) was obtained by forging the specimen continuously as the temperature of the specimen was decreasing from 950°C to 600°C followed by oil quenching to room temperature. The thickness reduction ratio by forging is 40%. The conventional specimen (C) was obtained by quenching the specimen directly into room temperature oil after austenitized at 950°C for 30 minutes. All quenched specimens (T and C) were then tempered at 450, 500, 550, 600 or 650°C for four hours respectively.

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TEM characterization of WSix films

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100171973 ◽

1994 ◽

Vol 52 ◽

pp. 848-849

Author(s):

V. C. Kannan ◽

S. M. Merchant ◽

R. B. Irwin ◽

A. K. Nanda ◽

M. Sundahl ◽

...

Keyword(s):

Integrated Circuits ◽

Vapor Deposition ◽

High Purity ◽

Physical Vapor Deposition ◽

Thermal Treatments ◽

Rapid Thermal Anneal ◽

Tungsten Silicide ◽

Tem Characterization ◽

Metal Silicides

Metal silicides such as WSi2, MoSi2, TiSi2, TaSi2 and CoSi2 have received wide attention in recent years for semiconductor applications in integrated circuits. In this study, we describe the microstructures of WSix films deposited on SiO2 (oxide) and polysilicon (poly) surfaces on Si wafers afterdeposition and rapid thermal anneal (RTA) at several temperatures. The stoichiometry of WSix films was confirmed by Rutherford Backscattering Spectroscopy (RBS). A correlation between the observed microstructure and measured sheet resistance of the films was also obtained.WSix films were deposited by physical vapor deposition (PVD) using magnetron sputteringin a Varian 3180. A high purity tungsten silicide target with a Si:W ratio of 2.85 was used. Films deposited on oxide or poly substrates gave rise to a Si:W ratio of 2.65 as observed by RBS. To simulatethe thermal treatments of subsequent processing procedures, wafers with tungsten silicide films were subjected to RTA (AG Associates Heatpulse 4108) in a N2 ambient for 60 seconds at temperatures ranging from 700° to 1000°C.

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