Modification of SiC Ceramics Using Chemical Vapor Deposition Surface Treatment

1993 ◽  
Vol 76 (2) ◽  
pp. 492-496 ◽  
Author(s):  
Ting-ji Wang ◽  
Gui-xing Liu ◽  
Pu Ding ◽  
Zong-zhe Jin
Keyword(s):  
Chemical Vapor Deposition ◽  
Surface Treatment ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Surface ◽  
Sic Ceramics

Effect of Cu surface treatment in graphene growth by chemical vapor deposition

2019 ◽  
Vol 236 ◽  
pp. 403-407 ◽  
Author(s):  
Seong-Yong Cho ◽  
Minsu Kim ◽  
Min-Sik Kim ◽  
Min-Hyun Lee ◽  
Ki-Bum Kim
Keyword(s):  
Chemical Vapor Deposition ◽  
Surface Treatment ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Graphene Growth

Strain Sensing Behaviour of PPy-Coated XLA Fibers

2011 ◽  
Vol 142 ◽  
pp. 125-128
Author(s):  
Pu Xue ◽  
J.P. Wang ◽  
Xiao Ming Tao
Keyword(s):  
Chemical Vapor Deposition ◽  
Surface Treatment ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Tensile Loading ◽  
Strain Sensing ◽  
Strain Variation ◽  
Electrically Conductive ◽  
Plasma Surface ◽  
Plasma Surface Treatment

This study developed an electrically conductive XLA fiber, which can sense strain variation under extension. The conductive XLA fiber was prepared by chemical vapor deposition (CVD) after plasma surface treatment. The strain sensing behavior of the PPy-coated XLA fibers was studied under tensile loading. It is found that the sensitivity of XLA fiber bases is over 145, and its working range is from 10% to 110%, showing it excellent in strain sensing behavior.

Surface Treatment by Ar Plasma Irradiation in Electron Cyclotron Resonance Chemical Vapor Deposition

2000 ◽  
Vol 39 (Part 1, No. 5A) ◽  
pp. 2761-2766 ◽  
Author(s):  
Jun-ichi Hashimoto ◽  
Nobuyuki Ikoma ◽  
Michio Murata ◽  
Jiro Fukui ◽  
Toshio Nomaguchi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Surface Treatment ◽  
Vapor Deposition ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Chemical Vapor ◽  
Electron Cyclotron ◽  
Plasma Irradiation ◽  
Ar Plasma

Anodic Surface Treatment on Carbon Fibers - The Effect on Microstructure of Pyrocarbon Matrix during Chemical Vapor Deposition

2011 ◽  
Vol 399-401 ◽  
pp. 363-367
Author(s):  
Jie Chen ◽  
Shu Yu ◽  
Xiang Xiong
Keyword(s):  
Chemical Vapor Deposition ◽  
Surface Morphology ◽  
Surface Treatment ◽  
Functional Groups ◽  
Carbon Fibers ◽  
Vapor Deposition ◽  
Proper Time ◽  
Chemical Vapor ◽  
Ammonium Bicarbonate ◽  
Electrolyte Effects

Before chemical vapor deposition, PAN-based carbon fibers were modified by anodic surface treatment for different time, using 5% ammonium bicarbonate as electrolyte. Effects of the surface treatment on surface mophology, chemical functional groups of carbon fibers were investigated. The microstructure of pyrocarbon were analysed as well. The results show that the anodic surface treatment by 5% ammonium bicarbonate for proper time can improve the surface morphology and adjust the surface functinal groups of carbon fibers, which can promote the deposition of ordered pyrocarbon during chemical vapor deposition.

Surface Treatment and Functionalization Effects on Chemical Vapor Deposition and Atomic Layer Deposition Grown HfO2

2019 ◽  
Vol 6 (1) ◽  
pp. 167-177 ◽  
Author(s):  
Steven Consiglio ◽  
Renee Mo ◽  
Tsong-Lin Tai ◽  
Siddarth Krishnan ◽  
David O'Meara ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Atomic Layer Deposition ◽  
Surface Treatment ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Layer Deposition

Effects of Surface Treatment and Annealing on Properties of InN Layers Grown Using Metal Organic Chemical Vapor Deposition

2012 ◽  
Vol 271-272 ◽  
pp. 190-196
Author(s):  
Sheng Po Chang ◽  
Kuan Jen Chen ◽  
Po Jui Kuo ◽  
Yu Zung Chiou
Keyword(s):  
Chemical Vapor Deposition ◽  
Electrical Properties ◽  
Surface Treatment ◽  
Vapor Deposition ◽  
Annealing Temperature ◽  
Chemical Vapor ◽  
Crystalline Quality ◽  
Organic Chemical ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

We report the effects surface treatment and annealing had on the properties of InN layers grown using metal organic chemical vapor deposition (MOCVD). The number of defects due to N vacancies decreased significantly with increasing annealing temperature. However, when the annealing temperature reached 700°C, the crystalline grain became larger on the film surfaces. Annealing at an appropriate temperature improved the crystalline quality and the electrical properties of the InN films. However, when the annealing temperature was too high, InN oxidized and even dissociated.

Sign in / Sign up

Export Citation Format

Share Document