A Low Temperature CVD Process for Aluminum and Aluminide Coatings
A novel, low temperature Organometallic Chemical Vapour process (LOM), developed by Liburdi Engineering is presented in this paper. The process, which is widely used in the electronics industry to apply thin layers of pure aluminum, has been successfully scaled from a 3″ (75 mm) diameter quartz reactor to a production hot wall metal retort with an internal diameter of 18″ (0.45m) and a height of 60″ (1.5m). The capability for simultaneously coating external and internal surfaces is discussed. The aluminum layer can be used directly for low temperature atmospheric corrosion protection in place of IVADIZING or diffusion heat treated to produce an oxidation resistant aluminide coating for superalloys. Results of cyclic oxidation and salt fog corrosion testing are presented. The potential for alloying with modifying elements such as platinum to further enhance its high temperature oxidation resistance and to use the process in conjunction with thermal barrier coatings are presented. Potential applications ranging from coating of heat exchangers and automotive catalytic converters to the coating of industrial and aero turbine blades with complex cooling passages are presented.