Optical Head Alignment Method Using Serial Manipulators for Maskless Lithography System

As the cost of photo masks for display panel is very high, researchers have been developing maskless lithography using electron beam in this system. However the maskless lithography system has typical drawback in some respects. These issues include productivity, size of the system and cost efficiency. To cope with these problems, take reflectance rate and position of spot array into consideration is required. The lithography technology has been focused on studying both reflectance of light from DMDs (digital micromirror devices) and the position of generated spot array. As the lithography technology has been developed steadily, there exists plenty type of maskless lithography nowadays. DMD-based optical maskless lithography system is gaining substantial attention from researchers and engineers for its outstanding performance concerning cost efficiency and high throughput. Also, accurate alignment of spot array is on requisition under the condition of micro-unit scale. As a result, the maskless lithography system is faced with the problem relevant to accurate alignment. For instance, the actual alignment of spot array has been done by hand although it has a chance to show deleterious effects on productivity. In this paper, an alignment algorithm was suggested for the purpose of satisfying generation of accurate alignment of spot array. The algorithm is based on concerning kinematics of maskless lithography system. Thus, the suggested algorithm enable to reducing the error that has been measured from the spot array. Defining spot array error that is fitness function of genetic algorithm is introduced at first. An alignment algorithm that has correlation with kinematics of the optical system and spot array error will be represented in sequence. After that, designing 4 DOF align unit will be covered in kinematics analysis chapter. Finally, designing test bed of optical system using vision sensor and align unit is considered in order to validate the suggested alignment algorithm with experiment.

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Parallel Micro Manipulator for Effective Optical Spot Array Alignment

2014 Conference on Information Storage and Processing Systems ◽

10.1115/isps2014-6929 ◽

2014 ◽

Author(s):

Zheng Yuan Li ◽

Sae Whan Park ◽

Yong Seok Inh ◽

Jong Yoon Choi ◽

Ja Choon Koo

Keyword(s):

Genetic Algorithm ◽

Parallel Manipulator ◽

Experimental Result ◽

Kinematic Characteristic ◽

Maskless Lithography ◽

Nano Fabrication ◽

Micro Manipulator ◽

Spot Array ◽

Exposure Process ◽

Lithography Technology

Photolithography is one of the core technologies of micro-nano fabrication. Recently, lithography technology is applied to diverse field of technologies. These technologies include MEMS (micro electro mechanical system) devices, FPD (flat panel display), and semiconductor industry. When it comes to the typical exposure process of lithography technology, photomask costs is occupying large portion of the optical system. So, how to reduce the cost of the mask and employing maskless lithography technology has become an important issue to engineers. Although there being both advantages and disadvantages, maskless lithography is a receiving substantial attention from engineers in the fileds of micro-nano fabrication. With the development of technology, low cost, flexibility, efficiency in the fabrication of device are in high demand in maskless lithography technology. How to generate line/space patterns is gaining considerable attention in terms of maskless lithography exposure process. In order to achieve the accurate alignments of numerous optical heads within a reasonable amount of tack time, installing autonomous position align micro parallel manipulator system in each optical heads required. Applied parallel manipulator that consists of four 2-DOF (degree of freedom) decoupled actuator gives chances to provide 6-DOF independence motion, and has strength in high accuracy. It is thus, this parallel manipulator is suitable for the experiment. This paper covers the follows: First, we reported the DMD (Digital Micro mirror Device)-based makless lithography system to introduce spot array method in maskless digital exposure process. Second, applying a redundant parallel micro manipulator and analyzing kinematic characteristic of the 4-[PP]PS parallel manipulator is described. After that, comparing benefits and drawbacks of 4-[PP]PS parallel and 4-DOF serial manipulator is covered. Third, proposing a suitable error model of the system and applying the genetic algorithm to alignment spot array concerning position correction. Finally, we designed experiment which has vision sensor and align unit to verify positioning algorithm. Simulation and experimental result will be shown with the regard to parallel manipulator can find the optimal solution based on genetic algorithm and carry out the problem of spot array alignment by reducing the position error of the system.

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Measuring two-dimensional profiles of beam spots in a high-density spot array for a maskless lithography system

Applied Optics ◽

10.1364/ao.53.008507 ◽

2014 ◽

Vol 53 (36) ◽

pp. 8507 ◽

Cited By ~ 1

Author(s):

Dong Won Kang ◽

Minwook Kang ◽

Jae W. Hahn

Keyword(s):

High Density ◽

Maskless Lithography ◽

Two Dimensional ◽

Lithography System ◽

Spot Array

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Parallel micro manipulator for optical spot array alignment of maskless lithography

Microsystem Technologies ◽

10.1007/s00542-015-2520-9 ◽

2015 ◽

Vol 21 (12) ◽

pp. 2663-2668

Author(s):

Zheng Yuan Li ◽

Jong Yoon Choi ◽

Yong Seok Ihn ◽

Sang-Hoon Ji ◽

Ja Choon Koo

Keyword(s):

Maskless Lithography ◽

Micro Manipulator ◽

Spot Array

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Scanned-spot-array extreme ultraviolet imaging for high-volume maskless lithography

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4752112 ◽

2012 ◽

Vol 30 (5) ◽

pp. 051606 ◽

Cited By ~ 4

Author(s):

Kenneth C. Johnson

Keyword(s):

Extreme Ultraviolet ◽

High Volume ◽

Maskless Lithography ◽

Spot Array

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Design and investigation of a maskless lithography system for printing patterns on the inside surface of a long pipe

Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology ◽

10.1117/12.2532442 ◽

2019 ◽

Author(s):

Toshiyuki Horiuchi ◽

Kousuke Akitani ◽

Kazumi Imahashi ◽

Yuta Suzuki ◽

Jun-ya Iwasaki ◽

...

Keyword(s):

Inside Surface ◽

Maskless Lithography ◽

Lithography System

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A high-speed exposure method for digital micromirror device based scanning maskless lithography system

Optik ◽

10.1016/j.ijleo.2019.04.009 ◽

2019 ◽

Vol 185 ◽

pp. 1036-1044 ◽

Cited By ~ 4

Author(s):

Chao Peng ◽

Zezhou Zhang ◽

Jianxiao Zou ◽

Wenming Chi

Keyword(s):

High Speed ◽

Maskless Lithography ◽

Digital Micromirror Device ◽

Exposure Method ◽

Lithography System

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Industrial biomanufacturing: The future of chemical production

Science ◽

10.1126/science.aag0804 ◽

2017 ◽

Vol 355 (6320) ◽

pp. aag0804 ◽

Cited By ~ 167

Author(s):

James M. Clomburg ◽

Anna M. Crumbley ◽

Ramon Gonzalez

Keyword(s):

Large Scale ◽

Current Model ◽

Small Scale ◽

Process Conditions ◽

Test Bed ◽

Chemical Production ◽

Distributed Resources ◽

Chemical Manufacturing ◽

Unit Scale ◽

Capital Efficiency

The current model for industrial chemical manufacturing employs large-scale megafacilities that benefit from economies of unit scale. However, this strategy faces environmental, geographical, political, and economic challenges associated with energy and manufacturing demands. We review how exploiting biological processes for manufacturing (i.e., industrial biomanufacturing) addresses these concerns while also supporting and benefiting from economies of unit number. Key to this approach is the inherent small scale and capital efficiency of bioprocesses and the ability of engineered biocatalysts to produce designer products at high carbon and energy efficiency with adjustable output, at high selectivity, and under mild process conditions. The biological conversion of single-carbon compounds represents a test bed to establish this paradigm, enabling rapid, mobile, and widespread deployment, access to remote and distributed resources, and adaptation to new and changing markets.

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Automated Microassembly Sequence Planning With Sub-Assemblies

Volume 4: 21st Design for Manufacturing and the Life Cycle Conference; 10th International Conference on Micro- and Nanosystems ◽

10.1115/detc2016-59736 ◽

2016 ◽

Cited By ~ 2

Author(s):

Joseph Seymour ◽

David J. Cappelleri

Keyword(s):

Fitness Function ◽

Engineering Problem ◽

Assembly Sequence Planning ◽

Human Beings ◽

Assembly Sequence ◽

Test Bed ◽

Sequence Planning ◽

Macro Scale ◽

Limited Degree ◽

Feasible Solutions

Assembly sequence planning is an engineering problem that has been of great interest in the manufacturing field at the macro-scale. As more complex assemblies are desired at the micro and nano scales it is no longer feasible for human beings to plan and execute the production of these systems. A promising algorithm that allows optimization of assembly sequence plans that has been developed is called the Breakout Local Search. One drawback of this algorithm is its inability to consider the need for intermediate sub-assemblies to generate feasible solutions. Here an expansion to the BLS algorithm, called the Sub Assembly Generating BLS (SABLS) algorithm, is proposed. The fitness function of this new algorithm is also tailored to the specific constraints and motion primitives for a micromanipulation test-bed allowing for its use in microassembly applications. It is shown that the proposed algorithm is capable of generating optimized solutions that can be assembled with this limited degree of freedom system.

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