Technologies such as compact disc (CD) manufacturing, hologram embossing, and security printing
rely on the reproduction of micro-patterns generated on surfaces by optical or electron-beam lithographic
writing onto electron-beam or photoresists. The periodicity of such patterns varies from sub-micron to several
microns, with depths up to 0.5 μm. The scanning probe microscope (SPM) is becoming a routine tool for
analysis of these micro-patterns, to check on depths and lateral dimensions of features. Direct scanning of
resist-covered plates is now possible, without damage, using resonant low-contact force SPM with etched silicon
cantilevers. Metal shims produced from the master resist plates can also be scanned and checked for defects
prior to production of embossed foils. The present article discusses examples of the use of a Digital Instruments
3100 microscope in analysis of production electron-beam lithography plates with a 0.5 μm resist thickness. We
also examine features of nickel replicas (father and mother shims) produced by electroforming from the
original plate. With SPM measurements of the development profile of a particular plate, corrections can be
made to exposures and development times during production to correct errors. An example is given of such
a feedback process.