Deep dry etching of borosilicate glass using fluorine-based high-density plasmas for microelectromechanical system fabrication

2003 ◽  
Vol 21 (5) ◽  
pp. 2188 ◽  
Author(s):  
Takanori Ichiki ◽  
Yoshinari Sugiyama ◽  
Takekazu Ujiie ◽  
Yasuhiro Horiike
Keyword(s):  
Borosilicate Glass ◽  
Dry Etching ◽  
High Density ◽  
Microelectromechanical System

Dry etching characteristics of (Ba0.6,Sr0.4)TiO3 thin films in high density CF4/Ar plasma

2003 ◽  
Vol 171 (1-3) ◽  
pp. 273-279 ◽  
Author(s):  
Pil-Seung Kang ◽  
Kyoung-Tae Kim ◽  
Dong-Pyo Kim ◽  
Chang-Il Kim ◽  
Alexander M. Efremov
Keyword(s):  
Thin Films ◽  
Dry Etching ◽  
High Density ◽  
Ar Plasma

Dry Etching of Nanosized Ge1Sb2Te4 Patterns Using TiN Hard Mask for High Density Phase-Change Memory

2009 ◽  
Vol 9 (2) ◽  
pp. 1526-1529 ◽  
Author(s):  
Gaoming Feng ◽  
Bo Liu ◽  
Zhitang Song ◽  
Shilong Lv ◽  
Liangcai Wu ◽  
...  
Keyword(s):  
Phase Change ◽  
Phase Change Memory ◽  
Dry Etching ◽  
High Density ◽  
Hard Mask ◽  
Change Memory

Dry Etching Characteristics of ZrO2Thin Films Using High Density Cl2/Ar Plasma

2010 ◽  
Vol 407 (1) ◽  
pp. 117-124 ◽  
Author(s):  
Jong-Chang Woo ◽  
Xue-Yang ◽  
Doo-Seung Um ◽  
Chang-Il Kim
Keyword(s):  
Dry Etching ◽  
High Density ◽  
Ar Plasma

Advanced selective dry etching of GaAs/AlGaAs in high density inductively coupled plasmas

2000 ◽  
Vol 18 (4) ◽  
pp. 1220-1224 ◽  
Author(s):  
J. W. Lee ◽  
M. W. Devre ◽  
B. H. Reelfs ◽  
D. Johnson ◽  
J. N. Sasserath ◽  
...  
Keyword(s):  
Dry Etching ◽  
High Density ◽  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas

scholarly journals Why do insects have such a high density of flow-sensing hairs? Insights from the hydromechanics of biomimetic MEMS sensors

2010 ◽  
Vol 7 (51) ◽  
pp. 1487-1495 ◽  
Author(s):  
Jérôme Casas ◽  
Thomas Steinmann ◽  
Gijs Krijnen
Keyword(s):  
High Density ◽  
Physical Models ◽  
Hair Density ◽  
Microelectromechanical System ◽  
Velocity Amplitude ◽  
Natural Hair ◽  
Flow Perturbation ◽  
Flow Sensing ◽  
Hydrodynamic Coupling ◽  
Image Velocimetry

Insects and arachnids are often quite hairy. The reasons for this high density of sensory hairs are unknown. Previous studies have predicted strong hydrodynamic coupling between densely packed airflow-sensitive hairs. Flow perturbation owing to single hairs and between tandem hairs, however, has never been experimentally measured. This paper aims to quantify the extent of flow perturbation by single and tandem hairs directly, using biomimetic microelectromechanical system (MEMS) hairs as physical models and particle image velocimetry (PIV) for flow visualization. Single and tandem MEMS hairs of varying interhair distances were subjected to oscillatory flows of varying frequency. Decreasing hair-to-hair distance markedly reduced flow velocity amplitude and increased the phase shift between the far-field flow and the flow between hairs. These effects were stronger for lower flow frequencies. We predict strong hydrodynamic coupling within whole natural hair canopies exposed to natural stimuli, depending on arthropod and hair sizes, and hair density. Thus, rather than asking why arthropods have so many hairs, it may be useful to address why hairs are packed together at such high densities, particularly given the exquisite sensitivity of a single hair.

Residue-Free Dry Etching of Polymer Sacrificial Layer for Microelectromechanical-System Device Fabrication

2013 ◽  
Vol 50 (12) ◽  
pp. 435-440
Author(s):  
K. Takagahara ◽  
K. Ono ◽  
K. Kuwabara ◽  
T. Sakata ◽  
H. Ishii ◽  
...  
Keyword(s):  
Sacrificial Layer ◽  
Dry Etching ◽  
Device Fabrication ◽  
Microelectromechanical System

Selective Removal of Dry-Etching Residue Derived from Polymer Sacrificial Layer for Microelectromechanical-System Device Fabrication

2012 ◽  
Vol 51 (9R) ◽  
pp. 096502
Author(s):  
Kazuhiko Takagahara ◽  
Kei Kuwabara ◽  
Tomomi Sakata ◽  
Hiromu Ishii ◽  
Yasuhiro Sato ◽  
...  
Keyword(s):  
Sacrificial Layer ◽  
Dry Etching ◽  
Device Fabrication ◽  
Selective Removal ◽  
Microelectromechanical System

Study of plasma - surface interactions: chemical dry etching and high-density plasma etching

1996 ◽  
Vol 5 (2) ◽  
pp. 193-199 ◽  
Author(s):  
G S Oehrlein ◽  
P J Matsuo ◽  
M F Doemling ◽  
N R Rueger ◽  
B E E Kastenmeier ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Dry Etching ◽  
Surface Interactions ◽  
High Density ◽  
Plasma Surface ◽  
Plasma Surface Interactions ◽  
Density Plasma

Dry etching of porous silicon in high density plasmas

2003 ◽  
Vol 197 (1) ◽  
pp. 163-167 ◽  
Author(s):  
A. Tserepi ◽  
C. Tsamis ◽  
E. Gogolides ◽  
A. G. Nassiopoulou
Keyword(s):  
Porous Silicon ◽  
Dry Etching ◽  
High Density
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