Comparative study of Cl[sub 2], Cl[sub 2]∕O[sub 2], and Cl[sub 2]∕N[sub 2] inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP
2008 ◽
Vol 26
(5)
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pp. 1675
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2015 ◽
Keyword(s):
2007 ◽
Vol 22
(9)
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pp. 1010-1015
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2000 ◽
Vol 18
(4)
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pp. 1890
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2012 ◽
Vol 30
(6)
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pp. 06FF02
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