Electrical characterization of high-k based metal-insulator-semiconductor structures with negative resistance effect when using Al2O3 and nanolaminated films deposited on p-Si

2011 ◽  
Vol 29 (1) ◽  
pp. 01A901 ◽  
Author(s):  
A. Gómez ◽  
H. Castán ◽  
H. García ◽  
S. Dueñas ◽  
L. Bailón ◽  
...  
Keyword(s):  
Electrical Characterization ◽  
Negative Resistance ◽  
Metal Insulator ◽  
Metal Insulator Semiconductor ◽  
Semiconductor Structures ◽  
High K

scholarly journals Electrical Characterization of Low Nitrogen Content Plasma Deposited and Rapid Thermal Annealed Al/SiNx:H/InP Metal-Insulator-Semiconductor Structures

2000 ◽  
Vol 39 (Part 1, No. 11) ◽  
pp. 6212-6215 ◽  
Author(s):  
Helena Castán ◽  
Salvador Dueñas ◽  
Juan Barbolla ◽  
Estefanía Redondo ◽  
Ignacio Mártil ◽  
...  
Keyword(s):  
Nitrogen Content ◽  
Electrical Characterization ◽  
Metal Insulator ◽  
Metal Insulator Semiconductor ◽  
Semiconductor Structures ◽  
Low Nitrogen

Electrical Characterization of Deposited and Oxidized Ta2Si as Dielectric Film for SiC Metal-Insulator-Semiconductor Structures

2004 ◽  
Vol 457-460 ◽  
pp. 845-848 ◽  
Author(s):  
Amador Pérez-Tomás ◽  
Dominique Tournier ◽  
Josep Montserrat ◽  
Narcis Mestres ◽  
F. Sandiumenge ◽  
...  
Keyword(s):  
Dielectric Film ◽  
Electrical Characterization ◽  
Metal Insulator ◽  
Metal Insulator Semiconductor ◽  
Semiconductor Structures
Sign in / Sign up

Export Citation Format

Share Document