Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. I. Plasma source and critical fluxes
2020 ◽
Vol 38
(2)
◽
pp. 023007
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Vladimir Volynets
◽
Yuri Barsukov
◽
Gonjun Kim
◽
Ji-Eun Jung
◽
Sang Ki Nam
◽
...
T.-F. Wu
◽
L.-C. Yu
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A. Kumari
2006 ◽
Vol 100
(9)
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pp. 093304
◽
Masahiro Iwasaki
◽
Masafumi Ito
◽
Tsuyoshi Uehara
◽
Megumi Nakamura
◽
Masaru Hori
2019 ◽
Vol 21
(6)
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pp. 064007
H J YEOM
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D H CHOI
◽
Y S LEE
◽
J H KIM
◽
D J SEONG
◽
...
2020 ◽
Vol 38
(2)
◽
pp. 023008
◽
Ji-Eun Jung
◽
Yuri Barsukov
◽
Vladimir Volynets
◽
Gonjun Kim
◽
Sang Ki Nam
◽
...
2019 ◽
Vol 37
(4)
◽
pp. 040601
◽
Erwine Pargon
◽
Camille Petit-Etienne
◽
Laurène Youssef
◽
Gaspard Thomachot
◽
Sylvain David
2007 ◽
Vol 40
(17)
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pp. 5140-5154
◽
S P Gangoli
◽
A D Johnson
◽
A A Fridman
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R V Pearce
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A F Gutsol
◽
...
2010 ◽
Vol 28
(4)
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pp. 856-860
◽
Wonkyun Yang
◽
Junghoon Joo
A. Srivastava
◽
A. Wilson
◽
I. Koo
2021 ◽
Vol 39
(6)
◽
pp. 062403
Harm C. M. Knoops
◽
Karsten Arts
◽
Jan W. Buiter
◽
Luca Matteo Martini
◽
Richard Engeln
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...