Line edge roughness reduction for EUV self-aligned double patterning by surface modification on spin-on-carbon and tone inversion technique

2021 ◽  
Vol 20 (02) ◽  
Author(s):  
Eric Liu ◽  
Katie Lutker-Lee ◽  
Qiaowei Lou ◽  
Ya-Ming Chen ◽  
Angélique Raley ◽  
...  
Keyword(s):  
Surface Modification ◽  
Line Edge Roughness ◽  
Inversion Technique ◽  
Edge Roughness ◽  
Double Patterning

Resistivity Impact from Modulated Line-Edge-Roughness with Self-aligned Double Patterning

2020 ◽  
Author(s):  
Dewei Xu ◽  
KuangChung Chuang ◽  
Wayne Zhao ◽  
Keith Donegan ◽  
Seung-Yeop Kook ◽  
...  
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness ◽  
Double Patterning

Characterization of Line-Edge Roughness in Cu/Low-kInterconnect Pattern

2008 ◽  
Vol 47 (4) ◽  
pp. 2501-2505 ◽  
Author(s):  
Atsuko Yamaguchi ◽  
Daisuke Ryuzaki ◽  
Ken-ichi Takeda ◽  
Jiro Yamamoto ◽  
Hiroki Kawada ◽  
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Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness
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