Transparent conductive titanium-doped indium oxide films prepared by direct current magnetron sputtering

2009 ◽  
Author(s):  
Limei Lin ◽  
Fachun Lai ◽  
Yan Qu ◽  
Rongquan Gai
Keyword(s):  
Magnetron Sputtering ◽  
Indium Oxide ◽  
Direct Current ◽  
Oxide Films ◽  
Direct Current Magnetron Sputtering ◽  
Indium Oxide Films

Structural and optical properties of thin zirconium oxide films prepared by reactive direct current magnetron sputtering

2002 ◽  
Vol 92 (7) ◽  
pp. 3599-3607 ◽  
Author(s):  
S. Venkataraj ◽  
Oliver Kappertz ◽  
Hansjörg Weis ◽  
Robert Drese ◽  
R. Jayavel ◽  
...  
Keyword(s):  
Optical Properties ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Zirconium Oxide ◽  
Oxide Films ◽  
Structural And Optical Properties ◽  
Direct Current Magnetron Sputtering

Hafnium Oxide and Hydrogen Co-Doped Indium Oxide Films Deposited by Magnetron Sputtering Technology

2021 ◽  
Vol 1160 ◽  
pp. 51-55
Author(s):  
Cheng Ying Shi ◽  
Guang Hong Wang
Keyword(s):  
Magnetron Sputtering ◽  
Indium Oxide ◽  
Hafnium Oxide ◽  
Oxide Films ◽  
Optical And Electrical Properties ◽  
Radio Frequency Magnetron Sputtering ◽  
Donor Dopant ◽  
Indium Oxide Film ◽  
Co Doped ◽  
Indium Oxide Films

Hafnium and Hydrogen co-doped indium oxide films (IHFO:H) were prepared by radio frequency magnetron sputtering technology. The effect of hydrogen-donor dopant on the structural, optical and electrical properties of the films was investigated systematically. The resistivity of the IHFO:H film decreased by 2.4×10-4 Ω cm and the mobility improved by 8.2 cm2/Vs compared with Hafnium oxide doped indium oxide film. Employing the IHFO:H film as an electrode for a solar cell can improve efficiency.

Sign in / Sign up

Export Citation Format

Share Document