Reactions of Thiyl Radicals. VII. Photolysis of Methyl Sulfide Vapor
The photolysis of methyl sulfide vapor has been investigated as a function of substrate pressure, exposure time, and temperature in the wavelength range 2000 to 2300 Å. The effects of added propane, sulfur hexafluoride, and 2-methylpentane have been studied. The principal products of the decomposition are CH4, C2H6, CH3SSCH3, and CH3SH. The data indicate direct C—S bond scission in the primary process giving rise to "hot" CH3 and CH3S radicals. A mechanism in which disproportionation of methylthiyl radicals is a very minor process is proposed.The reactions of CH3 and CH3S radicals with methyl sulfide have been examined also by photolyzing CH3SSCH3 and CH3COCH3 in the presence of CH3SCH3. Quantum yields at 2288 Å have been determined as a function of several variables. A number of rate parameters for the reactions of methyl radicals and methylthiyl radicals have been calculated.