REACTIVE ACCELERATED CLUSTER EROSION (RACE)
1996 ◽
Vol 03
(01)
◽
pp. 897-900
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Keyword(s):
Beams of ionized clusters of some thousand atoms are accelerated to about 100-keV kinetic energy to be used for area selective surface erosion. Mask projective cluster-impact lithography allows surface structuring in the submicron regime. Chemical reactions between the cluster and the target material may provide volatile reaction products facilitating ejecta removal. The reactive accelerated cluster erosion (RACE) process is applied to metals like copper and gold, to semiconductors such as silicon, and to insulators like glass, quartz, or sapphire, giving very smooth eroded surface and steep sidewalls.
Keyword(s):
1967 ◽
Vol 13
(5)
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pp. 587-599
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Keyword(s):
2019 ◽
Vol 25
(57)
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pp. 13208-13217
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Keyword(s):
Mixture of the Reaction Products during Hardening of the Water Glass Radiation-Protective Composites
2013 ◽
Vol 746
◽
pp. 289-292
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Keyword(s):
2004 ◽
Vol 31
(2)
◽
pp. 423-427
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2020 ◽
Vol 63
(10)
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pp. 842-847
Keyword(s):
2016 ◽
Vol 876
◽
pp. 25-35
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Keyword(s):
2015 ◽
Vol 112
(34)
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pp. E4651-E4660
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