A Fabrication of Very Low Contact Resistance AlGaN/GaN Heterojunction Field-Effect Transistor Using Selective Area Growth Technique by Gas-Source Molecular Beam Epitaxy
2002 ◽
Vol 41
(Part 2, No. 7B)
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pp. L820-L822
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2002 ◽
Vol 243
(1)
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pp. 129-133
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2000 ◽
Vol 29
(3)
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pp. 322-324
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Keyword(s):
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1997 ◽
Vol 12
(11)
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pp. 1472-1478
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2013 ◽
Vol 378
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pp. 47-49
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2019 ◽
Vol 511
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pp. 73-78
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1999 ◽
Vol 17
(3)
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pp. 1139
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