Cross-Sectional Analysis on Hardness and Sp3Bond Fraction of Diamond-Like Carbon Film Prepared by Mass-Separated Ion Beam Deposition

2004 ◽  
Vol 43 (No. 7B) ◽  
pp. L978-L980
Author(s):  
Kazuhiro Yamamoto
Author(s):  
J. Kulik ◽  
Y. Lifshitz ◽  
G.D. Lempert ◽  
S. Rotter ◽  
J.W. Rabalais ◽  
...  

Carbon thin films with diamond-like properties have generated significant interest in condensed matter science in recent years. Their extreme hardness combined with insulating electronic characteristics and high thermal conductivity make them attractive for a variety of uses including abrasion resistant coatings and applications in electronic devices. Understanding the growth and structure of such films is therefore of technological interest as well as a goal of basic physics and chemistry research. Recent investigations have demonstrated the usefulness of energetic ion beam deposition in the preparation of such films. We have begun an electron microscopy investigation into the microstructure and electron energy loss spectra of diamond like carbon thin films prepared by energetic ion beam deposition.The carbon films were deposited using the MEIRA ion beam facility at the Soreq Nuclear Research Center in Yavne, Israel. Mass selected C+ beams in the range 50 to 300 eV were directed onto Si {100} which had been etched with HF prior to deposition.


Author(s):  
B. Domengès ◽  
P. Poirier

Abstract In this study, the resistance of FIB prepared vias was characterized by the Kelvin probe technique and their physical characteristics studied using cross-sectional analysis. Two domains of resistivity were isolated in relation to the ion beam current used for the deposition of the via metal (Pt). Also submicrometer vias were investigated on 4.2 µm deep metal lines of a BiCMOS aluminum based design and a CMOS 090 copper based one. It is shown that the controlling parameter is the shape and volume of the contact, and that the contact formation is favored by the amount of over-mill of the via into the metal line it will contact.


2001 ◽  
Vol 697 ◽  
Author(s):  
Kie Moon Song ◽  
Namwoong Paik ◽  
Steven Kim ◽  
Daeil Kim ◽  
Seongjin Kim ◽  
...  

AbstractNitrogen-doped diamond-like carbon (DLC) films were deposited on a silicon substrate by direct metal ion beam deposition (DMIBD). Partial pressures of nitrogen gas were changed to get different compositions of nitrogen in the DLC films. The composition and surface morphology of the films were examined using X-ray photoelectron spectroscopy (XPS) and atomic force microscope (AFM). Effect of nitrogen doping on field emission property was studied. The field emission data indicated that the nitrogen doping lowered the turn-on field and increase the current density. It was believed that doping of nitrogen into the DLC film plays an important role in enhancement of the field emission. This enhancement of field emission could be explained by the improvement of electron transport through nitrogen-dope DLC layer.


1986 ◽  
Vol 74 ◽  
Author(s):  
B. R. Appleton ◽  
R. A. Zuhr ◽  
T. S. Noggle ◽  
N. Herbots ◽  
S. J. Pennycook

AbstractThe technique of ion beam deposition (IBD) is utilized to investigate low-energy, ion-induced damage on Si and Ge; to study reactive ion cleaning of Si and Ge; to fabricate amorphous isotopic heterostructures; and to fabricate and study the low-temperature epitaxial deposition of 74Ge on Ge(100), 30Si on Si(100), and 74Ge on Si(100). The techniques of ion scattering/channeling and cross-sectional TEM are combined to characterize the deposits.


2011 ◽  
Vol 20 (4) ◽  
pp. 538-541 ◽  
Author(s):  
Y. Tang ◽  
Y.S. Li ◽  
C.Z. Zhang ◽  
J. Wang ◽  
Q. Yang ◽  
...  

2002 ◽  
Vol 11 (3-6) ◽  
pp. 1130-1134 ◽  
Author(s):  
Kazuhiro Yamamoto ◽  
Koichiro Wazumi ◽  
Toshiya Watanabe ◽  
Yoshinori Koga ◽  
Sumio Iijima

1991 ◽  
Vol 47 (1-3) ◽  
pp. 445-454 ◽  
Author(s):  
V.M. Puzikov ◽  
A.V. Semenov

2010 ◽  
Vol 434-435 ◽  
pp. 739-742 ◽  
Author(s):  
Cheng Biao Wang ◽  
Zhi Jian Peng ◽  
Su Dong Wu ◽  
Zhi Qiang Fu ◽  
Xin Chun Chen

W gradedly-doped diamond-like carbon films were deposited on silicon and stainless steel by a hybrid technique combining ion beam deposition with magnetron sputtering. The structure, mechanical performance, friction coefficient, and wear loss were investigated. With increasing W target current applied, the structure of the as-prepared films changed from amorphous DLC to a composite of metal-containing DLC and metal carbides; the content of sp3 structure decreased from 31.26% to 22.3%; the nanohardness increased from 12 GPa to 28 GPa; the elastic modulus increased from 170 GPa to 310 GPa; and the critical loads were in the range of 80~100 N. The comprehensive tribological property of the as-prepared samples was improved after W doping.


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