Extra Bonus on Transistor Optimization with Stress Enhanced Notched-Gate Technology for Sub-90 nm Complementary Metal Oxide Semiconductor Field Effect Transistor
2020 ◽
Vol 92
(7)
◽
pp. 5276-5285
◽
2012 ◽
Vol 51
(4S)
◽
pp. 04DA04
◽
2021 ◽
1998 ◽
Vol 37
(Part 1, No. 11)
◽
pp. 5926-5931
2021 ◽