Atomic Layer Deposition of Hafnium Silicate Thin Films Using HfCl[sub 2][N(SiMe[sub 3])[sub 2]][sub 2] and H[sub 2]O
2004 ◽
Vol 7
(4)
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pp. C55
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2005 ◽
Vol 23
(3)
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pp. L1-L3
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2004 ◽
Vol 22
(6)
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pp. 2392-2397
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2009 ◽
Vol 156
(8)
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pp. G89
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Keyword(s):
2004 ◽
Vol 22
(4)
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pp. 1175-1181
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Keyword(s):
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2015 ◽
Vol 764-765
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pp. 138-142
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