Atomic Layer Deposition of Hafnium Silicate Thin Films Using Tetrakis(diethylamido)hafnium and Tris(2-methyl-2-butoxy)silanol
2009 ◽
Vol 156
(8)
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pp. G89
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Keyword(s):
2005 ◽
Vol 23
(3)
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pp. L1-L3
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Keyword(s):
2004 ◽
Vol 22
(6)
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pp. 2392-2397
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Keyword(s):
2004 ◽
Vol 22
(4)
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pp. 1175-1181
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Keyword(s):
2004 ◽
Vol 7
(4)
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pp. C55
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Keyword(s):
Keyword(s):
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2015 ◽
Vol 764-765
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pp. 138-142
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