Determination of Interstitial Oxygen Concentration in Low‐Resistivity n‐type Silicon Wafers by Infrared Absorption Measurements
1990 ◽
Vol 137
(12)
◽
pp. 3926-3928
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1995 ◽
Vol 34
(Part 2, No. 9A)
◽
pp. L1097-L1099
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Keyword(s):
2005 ◽
Vol 108-109
◽
pp. 735-740
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2019 ◽
Vol 136
(7)
◽
pp. 2015-2024
◽
2002 ◽