Design of a Silicon Carbide Chemical Vapor Deposition Reactor Cleaning Process Using Chlorine Trifluoride Gas Accounting for Exothermic Reaction Heat
2020 ◽
Vol 9
(10)
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pp. 104008
2013 ◽
Vol 3
(1)
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pp. N3006-N3009
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2017 ◽
Vol 897
◽
pp. 99-102
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2017 ◽
Vol 6
(8)
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pp. P526-P530
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2006 ◽
Vol 514-516
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pp. 475-482
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1999 ◽
Vol 61-62
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pp. 172-175
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2007 ◽
Vol 46
(4A)
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pp. 1415-1426
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1999 ◽
Vol 146
(8)
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pp. 2901-2905
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2009 ◽
Vol 48
(13)
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pp. 5969-5974
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2014 ◽
Vol 10
(1)
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pp. 135-137
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Keyword(s):
1991 ◽
Vol 38
(3)
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pp. 231-234
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Keyword(s):