Adjustment of Electrical Properties of Phosphorus Doped ZnO-Based Thin Film Transistor Deposited by DC Magnetron Sputtering

ABSTRACTThin film Ti doped ZnO (Ti-ZnO) film were grown on sapphire (0001) substrate by RF and DC magnetron sputtering. Films were grown at a substrate temperature of 250 °C with different Ti/Zn concentration. Surface chemical study of the samples was performed by X-ray photoelectron spectroscopy to determine the stoichiometry and Ti/Zn ratio for all samples. Surface morphology of the samples were studied by atomic force microscopy. X-ray diffraction was carried out to determine the crystallinity of the film. No secondary phases of TixOy was observed. We observed a slight increase in the lattice constant with the increase in Ti concentration in ZnO. No ferromagnetic signal was observed for any of the samples. However, some samples showed super-paramagnetic phase.

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Effects of substrate heating and vacuum annealing on optical and electrical properties of alumina-doped ZnO films deposited by DC magnetron sputtering

10.1117/12.892270 ◽

2011 ◽

Author(s):

Chien-Jen Tang ◽

Chun-Yuan Wang ◽

Cheng-Chung Jaing

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Vacuum Annealing ◽

Zno Films ◽

Optical And Electrical Properties ◽

Dc Magnetron Sputtering ◽

Substrate Heating ◽

Doped Zno

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Enhancement of Photoluminescence and Electrical Properties of Ga-Doped ZnO Thin Film Grown on α-Al2O3(0001) Single-Crystal Substrate by rf Magnetron Sputtering through Rapid Thermal Annealing

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.l1040 ◽

2001 ◽

Vol 40 (Part 2, No. 10A) ◽

pp. L1040-L1043 ◽

Cited By ~ 28

Author(s):

Jung Cho ◽

Jongbum Nah ◽

Min-Seok Oh ◽

Jae-Hoon Song ◽

Ki-Hyun Yoon ◽

...

Keyword(s):

Thin Film ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Single Crystal ◽

Rf Magnetron Sputtering ◽

Single Crystal Substrate ◽

Zno Thin Film ◽

Crystal Substrate ◽

Doped Zno ◽

Α Al2o3

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STUDYING THE TRANSPARENT AND ELECTRICAL PROPERTIES OF ZnO:Ti THIN FILM WHICH IS PREPARED BY DC MAGNETRON SPUTTERINGSPUTTERING

Science and Technology Development Journal ◽

10.32508/stdj.v12i12.2320 ◽

2009 ◽

Vol 12 (12) ◽

pp. 59-64

Author(s):

Binh Van Ho ◽

Hung Vu Tuan Le ◽

Nhien Thi Ngoc Nguyen ◽

Dat Thanh Huynh ◽

Phuong Ai Duong ◽

...

Keyword(s):

Thin Film ◽

Thin Films ◽

Electrical Resistivity ◽

Electrical Properties ◽

Zno Films ◽

Dc Magnetron Sputtering ◽

Glass Substrates ◽

Conductive Oxide ◽

Doped Zno ◽

Ceramic Targets

The Ti-doped Zno films were deposited onto glass substrates from ceramic targets ZnO with various Ti concentrations using a DC magnetron sputtering. The experimental results show that all thin films are transparent and conductive oxide films, with the appropriate Ti concentration (⁓1.5% Ti), the conductance of films can be improved. Optical characteristics of thin films was determined by UV-V is spectroscopy. The thickness of thin films was measured by Stylus method. The electrical resistivity was measured by four-point probe, and the roughness of films was determined by AFM.

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