(Invited) Pattern Generation from the Irradiation Induced Crosslinking of Organic Monolayers Coupled with an Area Selective Deposition

2021 ◽  
Vol MA2021-01 (21) ◽  
pp. 841-841
Author(s):  
Rudy Wojtecki
Keyword(s):  
Pattern Generation ◽  
Organic Monolayers ◽  
Selective Deposition

Formation and characterization of crystalline iron oxide films on self-assembled organic monolayers and their in situ patterning

2001 ◽  
Vol 16 (2) ◽  
pp. 564-569 ◽  
Author(s):  
Hyunjung Shin ◽  
Jong Up Jeon ◽  
Y. Eugene Pak ◽  
Hyejin Im ◽  
Eung Soo Kim
Keyword(s):  
Iron Oxide ◽  
Microcontact Printing ◽  
Oxide Films ◽  
Thin Layers ◽  
Organic Monolayers ◽  
Selective Deposition ◽  
Si Substrates ◽  
Self Assembled ◽  
Iron Oxide Films

Crystalline and pore-free films of α–Fe2O3 were prepared on hydrophilic self-assembled organic monolayers (DTT-SAMs) at 80 °C. Subsequently, Fe3O4 and γ–Fe2O3 films were synthesized via post annealing of as-deposited α–Fe2O3. In situ patterning of crystalline iron oxide thin layers was achieved via microcontact printing (μCP) and selective deposition. μCP was used to pattern two different surface moieties of self-assembled organic monolayers (SAMs) on Au–Cr–Si substrates. An elastomeric stamp was used to transfer either hexadecanethiol (HDT) SAMs, which are to sustain deposition of iron oxide precipitates, or hydrophilic SAMs [e.g., dithiothreitol (DTT)]. Selective deposition was realized through precipitation of iron oxide phases. Iron oxide films were deposited onto hydrophilic SAMs, but not onto HDT surfaces. Line (width of <1 μm) patterns in crystalline α–Fe2O3 thin films were obtained.

Selective Depositions of Fe-Containing Oxide Films on Mixed Selfassembled Organic Monolayers using Microcontact Printing

1999 ◽  
Vol 576 ◽  
Author(s):  
Hyunjung Shin ◽  
Hyejin Im ◽  
Seungbum Hong ◽  
Kyongmi Lee ◽  
Geunbae Lim ◽  
...  
Keyword(s):  
Iron Oxide ◽  
Aqueous Solutions ◽  
Microcontact Printing ◽  
Thin Layers ◽  
Organic Monolayers ◽  
Selective Deposition ◽  
X Ray ◽  
Si Substrates ◽  
Relief Structure ◽  
Oxide Phases

ABSTRACTIn situ patterning of crystalline iron oxide thin layers has been achieved via microcontact printing (μCP) and selective deposition. μCP was used to pattern two different surface moieties of selfassembled organic monolayers (SAMs) on Au/Cr/Si substrates. An elastomeric stamp (poly(dimethylsiloxane); PDMS) having a submicron-size patterned relief structure was used to transfer either hexadecanethiol (HDT) SAMs, which are to sustain deposition of iron oxide precipitates, or hydrophilic SAMs (e.g. dithiothreitol (DTT)). Selective deposition is realized through precipitation of iron oxide phases from aqueous solutions at ambient temperature (<100°C). Aqueous solutions of 0.05 M of iron nitrate (Fe(NO3)2•9H20) containing urea under nitric acid (pH < 2) were prepared for selective depositions. X-ray photoelectron spectroscopic (XPS) results showed that iron oxide precipitates were deposited onto hydrophilic SAMs, but not onto HDT surfaces. As-deposited films onto DTT-SAM surfaces at 80°C were crystalline α-Fe2O3 (hematite). Fe3O4 and γ-Fe2O3 films were synthesized via annealing of as-deposited α-Fe2O3. Scanning electron microscopy, x-ray diffractometry, vibrating sample magnetometry, and optical microscopy were used to characterize the films' microstructures and properties.

AlCu Pattern Generation on 3D StructuredWafer Using Multi Level Exposure Method on Electrodeposited Polymer Material

2003 ◽  
Vol 766 ◽  
Author(s):  
Vineet Sharma ◽  
Arief B. Suriadi ◽  
Frank Berauer ◽  
Laurie S. Mittelstadt
Keyword(s):  
Line Width ◽  
Metal Film ◽  
Focal Depth ◽  
Cost Effective ◽  
Pattern Generation ◽  
Promising Technique ◽  
Critical Dimensions ◽  
Exposure Method ◽  
Multi Level ◽  
3D Surfaces

AbstractNormal photolithography tools have focal depth limitations and are unable to meet the expectations of high resolution photolithography on highly topographic structures. This paper shows a cost effective and promising technique of combining two different approaches to achieve critical dimensions of traces on slope pattern continuity on highly topographic structures. Electrophoretically deposited photoresist is used on 3-D structured wafers. This photoresist coating technique is fairly known in the MEMS industries to achieve uniform and conformal photoresist films on 3D surfaces. Multi step exposures are used to expose electrophoretically deposited photoresist. AlCu (Cu-0.5%), 0.47-0.53 μm thick metal film is deposited on 3D structured silicon substrate to plate photoresist. By combining these two novel methods, metal (AlCu) traces of 75 μm line width and 150 μm pitch (from top flat to down the slope) have been demonstrated on isotropically etched 350 μm deep trenches with 5-10% line width loss.

Thermally-Induced Dehydrogenative Coupling of Organosilanes and H-Terminated Silicon Quantum Dots onto Germanane Surfaces

2020 ◽  
Author(s):  
Haoyang Yu ◽  
Alyxandra Thiessen ◽  
Md Asjad Hossain ◽  
Marc Julian Kloberg ◽  
Bernhard Rieger ◽  
...  
Keyword(s):  
2D Materials ◽  
Future Generation ◽  
Optical Devices ◽  
Surface Reactivity ◽  
Organic Monolayers ◽  
Present Contribution ◽  
Thermally Induced ◽  
Dehydrogenative Coupling ◽  
Silicon Quantum Dot ◽  
Covalently Bonded

<div><div><div><p>Covalently bonded organic monolayers play important roles in defining the solution processability, ambient stability, and electronic properties of two-dimensional (2D) materials such as Ge nanosheets (GeNSs); they also hold promise of providing avenues for the fabrication of future generation electronic and optical devices. Functionalization of GeNS normally involves surface moieties linked through covalent Ge−C bonds. In the present contribution we extend the scope of surface linkages to include Si−Ge bonding and present the first demonstration of heteronuclear dehydrocoupling of organosilanes to hydride-terminated GeNSs obtained from the deintercalation and exfoliation of CaGe2. We further exploit this new surface reactivity and demonstrated the preparation of directly bonded silicon quantum dot-Ge nanosheet hybrids.</p></div></div></div>

Enabling Electro-Optical Failure Analysis within Extreme Compression Test Architecture

2016 ◽  
Author(s):  
Rudolf Schlangen ◽  
Jon Colburn ◽  
Joe Sarmiento ◽  
Bala Tarun Nelapatla ◽  
Puneet Gupta
Keyword(s):  
Failure Analysis ◽  
Compression Test ◽  
Test Pattern ◽  
Pattern Generation ◽  
Output Data ◽  
Test Compression ◽  
Test Loop ◽  
On Chip ◽  
Test Architecture

Abstract Driven by the need for higher test-compression, increasingly many chip-makers are adopting new DFT architectures such as “Extreme-Compression” (XTR, supported by Synopsys) with on-chip pattern generation and MISR based compression of chain output data. This paper discusses test-loop requirements in general and gives Advantest 93k specific guidelines on test-pattern release and ATE setup necessary to enable the most established EFA techniques such as LVP and SDL (aka DLS, LADA) within the XTR test architecture.

A Manual Diagnosis Approach Using Targeted Fault Injection and Fault Simulation to Extend ATPG Diagnostic Resolution in Localizing Faults

2019 ◽  
Author(s):  
Rommel Estores ◽  
Karo Vander Gucht
Keyword(s):  
Fault Injection ◽  
Fault Simulation ◽  
Fault Localization ◽  
Pattern Generation ◽  
Test Coverage ◽  
Actual Case ◽  
Electrical Failure ◽  
Starting Point ◽  
Diagnostic Resolution ◽  
Diagnosis Approach

Abstract This paper discusses a creative manual diagnosis approach, a complementary technique that provides the possibility to extend Automatic Test Pattern Generation (ATPG) beyond its own limits. The authors will discuss this approach in detail using an actual case – a test coverage issue where user-generated ATPG patterns and the resulting ATPG diagnosis isolated the fault to a small part of the digital core. However, traditional fault localization techniques was unable to isolate the fault further. Using the defect candidates from ATPG diagnosis as a starting point, manual diagnosis through fault Injection and fault simulation was performed. Further fault localization was performed using the ‘not detected’ (ND) and/or ‘detected’ (DT) fault classes for each of the available patterns. The result has successfully deduced the defect candidates until the exact faulty net causing the electrical failure was identified. The ability of the FA lab to maximize the use of ATPG in combination with other tools/techniques to investigate failures in detail; is crucial in the fast root cause determination and, in case of a test coverage, aid in having effective test screen method implemented.

Rhythmic Pattern Generation in Invertebrates

2018 ◽  
pp. 390-400
Author(s):  
Astrid A. Prinz
Keyword(s):  
Central Pattern Generators ◽  
Pattern Generation ◽  
Rhythmic Pattern ◽  
Neuronal Circuit ◽  
Neuronal Circuits ◽  
Timing Circuit ◽  
Core Components ◽  
Pattern Generators

This chapter begins by defining central pattern generators (CPGs) and proceeds to focus on one of their core components, the timing circuit. After arguing why invertebrate CPGs are particularly useful for the study of neuronal circuit operation in general, the bulk of the chapter then describes basic mechanisms of CPG operation at the cellular, synaptic, and network levels, and how different CPGs combine these mechanisms in various ways. Finally, the chapter takes a semihistorical perspective to discuss whether or not the study of invertebrate CPGs has seen its prime and what it has contributed—and may continue to offer—to a wider understanding of neuronal circuits in general.

scholarly journals Multiple electrochemically accessible colour states in surface-confined metal-organic monolayers: Stepwise embedding individual metal centres

2021 ◽  
Author(s):  
Nadia O. Laschuk ◽  
Rana Ahmad ◽  
Iraklii I. Ebralidze ◽  
Jade Poisson ◽  
Franco Gaspari ◽  
...  
Keyword(s):  
Iron Complexes ◽  
Organic Monolayers ◽  
Individual Metal ◽  
Surface Enhanced ◽  
Metal Organic

Sequential covalent embedding of cobalt, osmium, and iron complexes of 4'-(pyridin-4-yl)-2,2':6',2''-terpyridine to surface-enhanced support pre-functionalized with a templating layer results in hetero-bimetallic (Os-Fe and Co-Fe) and hetero-trimetallic (Co-Os-Fe) monolayer materials....

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