A Difference in Using Atomic Layer Deposition or Physical Vapour Deposition TiN as Electrode Material in Metal-Insulator-Metal and Metal-Insulator-Silicon Capacitors
2011 ◽
Vol 11
(9)
◽
pp. 8368-8373
◽
Keyword(s):
2011 ◽
Vol 29
(1)
◽
pp. 01AC04
◽
2019 ◽
Vol 37
(5)
◽
pp. 050903
2019 ◽
Vol 37
(1)
◽
pp. 011209
◽
Keyword(s):
Keyword(s):
2015 ◽
Vol 55
(1)
◽
pp. 016502
◽
2011 ◽
Vol 29
(1)
◽
pp. 01AC09
◽
Keyword(s):
2007 ◽
Vol 50
(6)
◽
pp. 1865
◽
Keyword(s):