Threshold Voltage Fluctuation in 16-nm-Gate FinFETs Induced by Random Work Function of Nanosized Metal Grain

2012 ◽  
Vol 12 (6) ◽  
pp. 4485-4488 ◽  
Author(s):  
Yiming Li ◽  
Hui-Wen Cheng ◽  
Chi-Hong Hwang
2012 ◽  
Vol 101 (1) ◽  
pp. 013503 ◽  
Author(s):  
Masahiro Hori ◽  
Keigo Taira ◽  
Akira Komatsubara ◽  
Kuninori Kumagai ◽  
Yukinori Ono ◽  
...  

2009 ◽  
Vol 30 (3) ◽  
pp. 243-245 ◽  
Author(s):  
Hsing-Hui Hsu ◽  
Horng-Chih Lin ◽  
Leng Chan ◽  
Tiao-Yuan Huang

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