Numerical Investigation for Scale-Up of an Electron Cyclotron Resonance Plasma for Fluorine-Doped Tin Oxide Thin Film Production

2019 ◽  
Vol 19 (3) ◽  
pp. 1382-1387 ◽  
Author(s):  
Bup Ju Jeon
Keyword(s):  
Thin Film ◽  
Numerical Investigation ◽  
Tin Oxide ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Scale Up ◽  
Oxide Thin Film ◽  
Film Production ◽  
Resonance Plasma ◽  
Thin Film Production

Highly Soluble Ligand Stabilized Tin Oxide Nanocrystals: Gel Formation and Thin Film Production

2014 ◽  
Vol 14 (9) ◽  
pp. 4819-4826 ◽  
Author(s):  
James S. McManus ◽  
Patrick D. Cunningham ◽  
Laura B. Regan ◽  
Alison Smith ◽  
Dermot W. McGrath ◽  
...  
Keyword(s):  
Thin Film ◽  
Tin Oxide ◽  
Film Production ◽  
Gel Formation ◽  
Soluble Ligand ◽  
Thin Film Production

Hydrogen Passivation of Polysilicon Thin-Film Transistors by Electron Cyclotron Resonance Plasma

1993 ◽  
Vol 32 (Part 1, No. 6A) ◽  
pp. 2601-2606 ◽  
Author(s):  
Kris Baert ◽  
Hiroyuki Murai ◽  
Kazuhiro Kobayashi ◽  
Hirofumi Namizaki ◽  
Masahiro Nunoshita
Keyword(s):  
Thin Film ◽  
Cyclotron Resonance ◽  
Thin Film Transistors ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Hydrogen Passivation ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
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