Molecular-Sieving Silica/Tin Oxide Sensor Prepared by Chemical Vapor Deposition in the Presence of Template Molecule

Handbook of Molecular Imprinting ◽

10.1201/b13062-10 ◽

2012 ◽

pp. 253-276

Keyword(s):

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Template Molecule ◽

Molecular Sieving

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Molecular shape-selective detection by tin oxide film sensor modified with chemical vapor deposition of molecular-sieving silica overlayer using organic template

Sensors and Actuators B Chemical ◽

10.1016/j.snb.2007.01.009 ◽

2007 ◽

Vol 124 (2) ◽

pp. 398-406 ◽

Author(s):

Masahiro Sekiyama ◽

Naonobu Katada ◽

Miki Niwa

Keyword(s):

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Molecular Shape ◽

Selective Detection ◽

Organic Template ◽

Film Sensor ◽

Shape Selective ◽

Molecular Sieving

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Shape-Selective Adsorption of Substituted Benzaldehyde Isomers by a Molecular Sieving Silica Overlayer Prepared by the Chemical Vapor Deposition Method Using Organic Template on Tin Oxide

Bulletin of the Chemical Society of Japan ◽

10.1246/bcsj.78.1425 ◽

2005 ◽

Vol 78 (8) ◽

pp. 1425-1430 ◽

Author(s):

Shohei Yamakita ◽

Naonobu Katada ◽

Miki Niwa

Keyword(s):

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Selective Adsorption ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Organic Template ◽

Deposition Method ◽

Shape Selective ◽

Molecular Sieving

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Molecular-Sieving Gas Sensor Prepared by Chemical Vapor Deposition of Silica on Tin Oxide Using an Organic Template

Bulletin of the Chemical Society of Japan ◽

10.1246/bcsj.71.513 ◽

1998 ◽

Vol 71 (2) ◽

pp. 513-519 ◽

Author(s):

Nobuaki Kodakari ◽

Takeshi Sakamoto ◽

Kouji Shinkawa ◽

Hisato Funabiki ◽

Naonobu Katada ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Template ◽

Molecular Sieving

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Electrical conduction in 10–20 nm thick polycrystalline tin oxide thin films deposited by chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2008.11.047 ◽

2009 ◽

Vol 517 (9) ◽

pp. 2953-2958 ◽

Author(s):

Yuji Matsui ◽

Yuichi Yamamoto

Keyword(s):

Chemical Vapor Deposition ◽

Tin Oxide ◽

Electrical Conduction ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

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Effect of oxygen flow rate on the electrical and optical characteristics of dopantless tin oxide films fabricated by low pressure chemical vapor deposition

Korean Journal of Chemical Engineering ◽

10.1007/s11814-016-0151-1 ◽

2016 ◽

Vol 33 (9) ◽

pp. 2711-2715 ◽

Author(s):

Jun-Hyun Kim ◽

Hae-Min Lee ◽

Doo Won Kang ◽

Kyung Mi Lee ◽

Chang-Koo Kim

Keyword(s):

Chemical Vapor Deposition ◽

Flow Rate ◽

Tin Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxygen Flow Rate ◽

Optical Characteristics ◽

Pressure Chemical ◽

Effect Of Oxygen ◽

Tin Oxide Films

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LOW PRESSURE CHEMICAL VAPOR DEPOSITION OF TIN OXIDE THIN FILMS FROM AN ORGANOMETALLIC COMPOUND. APPLICATION TO GAS DETECTION

Journal de Physique IV (Proceedings) ◽

10.1051/jp4:1991237 ◽

1991 ◽

Vol 02 (C2) ◽

pp. C2-303-C2-310 ◽

Author(s):

C. PIJOLAT ◽

L. BRUNO ◽

R. LALAUZE

Keyword(s):

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Organometallic Compound ◽

Chemical Vapor ◽

Low Pressure ◽

Gas Detection ◽

Oxide Thin Films ◽

Pressure Chemical

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Chemical Vapor Deposition of Transparent, Electrically Conductive Tin Oxide Films Formed from Dibutyl Tin Diacetate

Journal of The Electrochemical Society ◽

10.1149/1.2134412 ◽

1975 ◽

Vol 122 (8) ◽

pp. 1144-1149 ◽

Author(s):

James Kane ◽

H. P. Schweizer ◽

Werner Kern

Keyword(s):

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Electrically Conductive ◽

Tin Oxide Films

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Indium‐tin oxide thin films prepared by chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.349189 ◽

1991 ◽

Vol 70 (7) ◽

pp. 3848-3851 ◽

Author(s):

Toshiro Maruyama ◽

Kunihiro Fukui

Keyword(s):

Chemical Vapor Deposition ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films

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Properties of fluorine-doped tin oxide films produced by atmospheric pressure chemical vapor deposition from tetramethyltin, bromotrifluoromethane and oxygen

Thin Solid Films ◽

10.1016/0040-6090(92)90767-6 ◽

1992 ◽

Vol 214 (2) ◽

pp. 175-187 ◽

Author(s):

James Proscia ◽

Roy G. Gordon

Keyword(s):

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Oxide Films ◽

Chemical Vapor ◽

Pressure Chemical ◽

Tin Oxide Films

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Preparation of amorphous BaTiO3 thin films on indium tin oxide‐coated soda lime glass by metalorganic chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578818 ◽

1994 ◽

Vol 12 (3) ◽

pp. 751-753 ◽

Author(s):

Y. S. Yoon ◽

D. H. Lee ◽

T. S. Kim ◽

M. H. Oh ◽

S. S. Yom

Keyword(s):

Chemical Vapor Deposition ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Soda Lime ◽

Soda Lime Glass ◽

Metalorganic Chemical

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