scholarly journals Roll-to-roll nanoimprint lithography of high efficiency Fresnel lenses for micro-concentrator photovoltaics

2021 ◽  
Vol 29 (21) ◽  
pp. 34135
Author(s):  
Alejandra Jacobo-Martín ◽  
Norman Jost ◽  
Jaime J. Hernández ◽  
César Domínguez ◽  
Guido Vallerotto ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
High Efficiency ◽  
Roll To Roll ◽  
Fresnel Lenses

High resolution UV roll-to-roll nanoimprinting of resin moulds and subsequent replication via thermal nanoimprint lithography

2012 ◽  
Vol 23 (48) ◽  
pp. 485310 ◽  
Author(s):  
Jarrett J Dumond ◽  
Kambiz Ansari Mahabadi ◽  
Yew Sok Yee ◽  
Christina Tan ◽  
Jerry Ying Hsi Fuh ◽  
...  
Keyword(s):  
High Resolution ◽  
Nanoimprint Lithography ◽  
Roll To Roll

scholarly journals Uniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography Process

2021 ◽  
Vol 11 (20) ◽  
pp. 9571
Author(s):  
Ga Eul Kim ◽  
Hyuntae Kim ◽  
Kyoohee Woo ◽  
Yousung Kang ◽  
Seung-Hyun Lee ◽  
...  
Keyword(s):  
Contact Pressure ◽  
Nanoimprint Lithography ◽  
Applied Pressure ◽  
Machine Learning Techniques ◽  
Conventional System ◽  
Large Area ◽  
High Productivity ◽  
Roll To Roll ◽  
Learning Techniques ◽  
Roller Machine

We aimed to increase the processing area of the roll-to-roll (R2R) nanoimprint lithography (NIL) process for high productivity, using a long roller. It is common for a long roller to have bending deformation, geometric errors and misalignment. This causes the non-uniformity of contact pressure between the rollers, which leads to defects such as non-uniform patterning. The non-uniformity of the contact pressure of the conventional R2R NIL system was investigated through finite element (FE) analysis and experiments in the conventional system. To solve the problem, a new large-area R2R NIL uniform pressing system with five multi-backup rollers was proposed and manufactured instead of the conventional system. As a preliminary experiment, the possibility of uniform contact pressure was confirmed by using only the pressure at both ends and one backup roller in the center. A more even contact pressure was achieved by using all five backup rollers and applying an appropriate pushing force to each backup roller. Machine learning techniques were applied to find the optimal combination of the pushing forces. In the conventional pressing process, it was confirmed that pressure deviation of the contact area occurred at a level of 44%; when the improved system was applied, pressure deviation dropped to 5%.

Thermal roll to roll nanoimprint lithography for micropillars fabrication on thermoplastics

2018 ◽  
Vol 193 ◽  
pp. 54-61 ◽  
Author(s):  
Aritz Retolaza ◽  
Aritz Juarros ◽  
Jorge Ramiro ◽  
Santos Merino
Keyword(s):  
Nanoimprint Lithography ◽  
Roll To Roll

scholarly journals High-throughput roll-to-roll production of polymer biochips for multiplexed DNA detection in point-of-care diagnostics

Lab on a Chip ◽  
2020 ◽  
Vol 20 (22) ◽  
pp. 4106-4117
Author(s):  
Pelin Toren ◽  
Martin Smolka ◽  
Anja Haase ◽  
Ursula Palfinger ◽  
Dieter Nees ◽  
...  
Keyword(s):  
High Throughput ◽  
Nanoimprint Lithography ◽  
Dna Detection ◽  
Point Of Care ◽  
Roll To Roll ◽  
Flexible Polymer ◽  
Nano Structures ◽  
Point Of Care Diagnostics ◽  
Polymer Foils

Roll-to-roll UV nanoimprint lithography has superior advantages for high-throughput manufacturing of micro- or nano-structures on flexible polymer foils with various geometries and configurations.

MW plasma enhanced CVD of intrinsic Si for thin film solar cells

2008 ◽  
Vol 1066 ◽  
Author(s):  
Bas B. Van Aken ◽  
Hans Leegwater ◽  
Maarten Dorenkamper ◽  
Camile Devilee ◽  
Jochen Loffler ◽  
...  
Keyword(s):  
Thin Film ◽  
High Efficiency ◽  
Chemical Vapour ◽  
High Rate ◽  
Large Area ◽  
Roll To Roll ◽  
Silicon Photovoltaics ◽  
Roll System ◽  
P Type ◽  
Continuous Deposition

ABSTRACTOur aim is the development of high-throughput production technology for high efficiency, amorphous and microcrystalline thin film silicon photovoltaics (PV) on flexible substrates. A roll-to-roll system is developed, with three deposition chambers for the continuous deposition of n-type, intrinsic and p-type Si. Novel MW sources for plasma enhanced chemical vapour deposition (PECVD) are introduced in the roll-to-roll coater as MW-PECVD combines good quality with large area, high rate deposition of intrinsic Si. A comparison is made between Raman and UV-reflection spectroscopy.

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