Computer simulation of boronizing kinetics for a TB2 alloy
Abstract The boron diffusion at the surface of a TB2 alloy was simulated via two mathematical models relying on the numerical resolutions of the system of differential algebraic equations (DAE) for the integral method and ordinary differential equations for the mean diffusion coefficient (MDC) method. Both approaches allowed us to compute the boron diffusion coefficients in TiB2 and TiB for a maximum boron content of 31.10 wt.-% in TiB2 at 1223, 1273, 1323 and 1373 K. The boron activation energies in TiB2 and TiB were evaluated and compared with the data published in the literature. Finally, an experimental validation of both models was made through a comparison of the thicknesses of the experimental layers with the predicted values. Consequently, the simulated thicknesses were in line with the experimental values.