Silicon diffusion control in atomic-layer-deposited Al2O3/La2O3/Al2O3 gate stacks using an Al2O3 barrier layer
Electrical Characterization of Postmetal Annealed Ultrathin TiN Gate Electrodes in Si MOS Capacitors
2016 ◽
Vol 2016
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pp. 1-4
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2011 ◽
Vol 14
(5)
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pp. G27
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2009 ◽
Vol 24
(12)
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pp. 125013
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2014 ◽
Vol 32
(3)
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pp. 03D122
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