Selective chemical etching of hexagonal boron nitride compared to cubic boron nitride

1997 ◽  
Vol 12 (2) ◽  
pp. 412-415 ◽  
Author(s):  
Stephen J. Harris ◽  
Anita M. Weiner ◽  
Gary L. Doll ◽  
Wen-Jin Meng
Keyword(s):  
Boron Nitride ◽  
Gas Phase ◽  
Chemical Etching ◽  
Hexagonal Boron Nitride ◽  
Cubic Boron Nitride ◽  
Chemical Etch ◽  
Selective Chemical ◽  
Hot Filament ◽  
Selective Chemical Etching ◽  
Phase Chemical

A BN film containing comparable amounts of sp2 and sp3 phases was subjected to a gas-phase chemical etch in a hot-filament environment containing 1% CH4 in H2. After a partial etch, examination by FTIR shows that the sp2 was preferentially etched, leaving a larger sp3 fraction than in the unetched film. The possibility that preferential etching could be used to increase the purity of cBN films is discussed.

Effects of Excimer Laser Ablation on the Surface of Hexagonal Boron Nitride

1990 ◽  
Vol 201 ◽  
Author(s):  
G. L. Doll ◽  
T. A. Perry ◽  
J. A. Sell
Keyword(s):  
Laser Ablation ◽  
Boron Nitride ◽  
Gas Phase ◽  
Hexagonal Boron Nitride ◽  
Cubic Boron Nitride ◽  
Pulsed Laser ◽  
Excimer Laser Ablation ◽  
Induced Changes ◽  
Boron Nitride Films ◽  
Morphology Changes

AbstractThe laser-induced changes in the hexagonal boron nitride targets that are used in the deposition of pulsed laser-deposited cubic boron nitride films are examined. Although the structure of the hexagonal boron nitride in the irradiated areas is unaltered, the surface morphology changes considerably. Boron-rich spheroids were found to cover the irradiated area. Their origin is consistent with the hydrodynamic sputtering of the hexagonal boron nitride targets, and a liberation of nitrogen atoms to the gas phase.

Scaling properties of a Si surface patterned by selective chemical etching

2004 ◽  
Vol 36 (1-3) ◽  
pp. 353-358 ◽  
Author(s):  
G. Wisz ◽  
T.Ya. Gorbach ◽  
P.S. Smertenko ◽  
A. Blahut ◽  
K. Zembrowska ◽  
...  
Keyword(s):  
Chemical Etching ◽  
Scaling Properties ◽  
Selective Chemical ◽  
Selective Chemical Etching

Fabrication of InP/SiO2/Si Substrate using Ion-Cutting Process and Selective Chemical Etching

2019 ◽  
Vol 6 (1) ◽  
pp. 99-103
Author(s):  
Peng Chen ◽  
Dapeng Xu ◽  
Luke Mawst ◽  
Kimmo Henttinen ◽  
Tommi Suni ◽  
...  
Keyword(s):  
Chemical Etching ◽  
Cutting Process ◽  
Si Substrate ◽  
Selective Chemical ◽  
Selective Chemical Etching

Gas‐Phase Fluorination of Hexagonal Boron Nitride

2021 ◽  
pp. 2106084
Author(s):  
AshokKumar Meiyazhagan ◽  
Peter Serles ◽  
Devashish Salpekar ◽  
Eliezer Fernando Oliveira ◽  
Lawrence B. Alemany ◽  
...  
Keyword(s):  
Boron Nitride ◽  
Gas Phase ◽  
Hexagonal Boron Nitride

Corrosion and Tribological Behaviour of BN Thin Films Deposited Using Magnetron Sputtering

2021 ◽  
Vol 9 (2) ◽  
pp. 24-39
Author(s):  
Mukhtiar Singh ◽  
Hitesh Vasudev ◽  
Ravinder Kumar
Keyword(s):  
Thin Films ◽  
Boron Nitride ◽  
Magnetron Sputtering ◽  
Hexagonal Boron Nitride ◽  
Cubic Boron Nitride ◽  
Base Material ◽  
Electrochemical Corrosion ◽  
Mechanical Analysis ◽  
Tribological Behaviour ◽  
Structural Morphology

Boron nitride coatings were synthesised on 316L stainless steel substrates through the radio frequency magnetron sputtering from a target made of hexagonal boron nitride. The process of deposition was conducted in three separate N2 and Ar system mixing regimes. Scanning electron microscopy (SEM) and x-ray diffraction (XRD) techniques investigated the microstructure morphology and composition of the BN films at varying ratio of N2 and Ar plasma. This research aimed to examine the effects of changing the N2 gas ratio on the structure and structural morphology of c-BN coatings. Using QAr / QN2-5/1 ratios, an increased consistency of the microstructure and further c-BN step formation suggest a fundamental technique for producing superior quality cubic boron nitride films. The electrochemical corrosion test and mechanical analysis was performed to study corrosion and tribological behaviour of the BN coating, and the results showed more improvement in corrosion and tribilogical behaviour in case of BN2 regime. The BN2 regime showed a maximum corrosion resistance of around 1.114 mpy (miles per year). The young's modulus of 346Gpa in magnitude in case of BN2 thin film was found to be higher as compared to base material and other two thin films.

scholarly journals Understanding the Interdependence of Penetration Depth and Deformation on Nanoindentation of Nanoporous Silver

Metals ◽  
2019 ◽  
Vol 9 (12) ◽  
pp. 1346
Author(s):  
Yannick Champion ◽  
Mathilde Laurent-Brocq ◽  
Pierre Lhuissier ◽  
Frédéric Charlot ◽  
Alberto Moreira Jorge Junior ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Chemical Etching ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Density Variation ◽  
Selective Chemical ◽  
Indent Depth ◽  
Selective Chemical Etching ◽  
Scanning Electron

A silver-based nanoporous material was produced by dealloying (selective chemical etching) of an Ag38.75Cu38.75Si22.5 crystalline alloy. Composed of connected ligaments, this material was imaged using a scanning electron microscope (SEM) and focused ion-beam (FIB) scanning electron microscope tomography. Its mechanical behavior was evaluated using nanoindentation and found to be heterogeneous, with density variation over a length scale of a few tens of nanometers, similar to the indent size. This technique proved relevant to the investigation of a material’s mechanical strength, as well as to how its behavior related to the material’s microstructure. The hardness is recorded as a function of the indent depth and a phenomenological description based on strain gradient and densification kinetic was proposed to describe the resultant depth dependence.

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