Deposition of tin oxides by Ion-Beam-Sputtering

2012 ◽  
Vol 1494 ◽  
pp. 153-158 ◽  
Author(s):  
Martin Becker ◽  
Angelika Polity ◽  
Davar Feili ◽  
Bruno K. Meyer
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Tin Oxide ◽  
Film Growth ◽  
Ion Beam ◽  
Thin Film Growth ◽  
Ion Beam Sputtering ◽  
Oxide Thin Films ◽  
Beam Sputtering ◽  
P Type

ABSTRACTSynthesis of both p-type and n-type oxide semiconductors is required to develop oxide-based electronic devices. Tin monoxide (SnO) recently has received increasing attention as an alternative p-type oxide semiconductor because it is a simple binary compound consisting of abundant elements. Another phase of the tin oxygen system, SnO2, is of great technological interest as transparent electrodes and as heat-reflecting filters. The preparation of tin oxide thin films has been performed by many different procedures. Radio-frequency (RF) ion-thrusters, as designed for propulsion applications, are also qualified for thin film deposition and surface etching, because different gas mixtures, extraction voltages and RF power can be applied. Tin oxide thin films were grown by ion beam sputtering (IBS) using a 3” metallic tin target. Different aspects of the thin film growth and properties of the tin oxide phases were investigated in relation to flux of oxygen fed into the gas discharge in the ion thruster. Results on thin film growth by IBS will be presented, structural, vibrational and optical properties of the films will be discussed.

La1−xBaxMnOz thin film growth by ion beam sputtering: effects of oxygen partial pressure

2001 ◽  
Vol 229 (1-4) ◽  
pp. 415-418 ◽  
Author(s):  
M. Tada ◽  
J. Yamada ◽  
V.V. Srinivasu ◽  
V. Sreedevi ◽  
H. Kohmoto ◽  
...  
Keyword(s):  
Thin Film ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Film Growth ◽  
Ion Beam ◽  
Thin Film Growth ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Stannic oxide thin film growth via ion-beam-sputtering

2014 ◽  
Vol 553 ◽  
pp. 26-29 ◽  
Author(s):  
Martin Becker ◽  
Robert Hamann ◽  
Angelika Polity ◽  
Bruno K. Meyer
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Ion Beam ◽  
Thin Film Growth ◽  
Oxide Thin Film ◽  
Stannic Oxide ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Ion-Beam Sputtering Deposited Cu-Doped CdS Thin Film

2013 ◽  
Vol 743-744 ◽  
pp. 915-919
Author(s):  
Guang Xing Liang ◽  
Ping Fan ◽  
Peng Ju Cao ◽  
Zhuang Hao Zheng
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Ion Beam ◽  
Xrd Analysis ◽  
Ion Beam Sputtering ◽  
Structural Morphology ◽  
Wurtzite Phase ◽  
Cds Thin Film ◽  
Beam Sputtering ◽  
Cds Thin Films

Cu-doped CdS thin film has been successfully deposited by ion-beam sputtering deposition. The structural, morphology, optical and electrical properties of as-deposited and annealed Cu-doped CdS thin films were investigated. The heavily Cu-doped CdS films annealed at 400 °C was demonstrated to be improved in structural, morphology, electrical and optical properties. X-ray diffraction (XRD) analysis indicated the formation of polycrystalline CdS film with the structure of hexagonal wurtzite phase. No distinct impurity of Cu and Cu-S phase was detected in Cu-doped CdS thin films. Atomic force microscopy (AFM) revealed that the grain size was increased after annealed. Optical transmission and absorption spectroscopy measurement revealed a high absorption and energy band gap was of about 2.40 eV. The CdS thin film was of p-type conductivity and the resistivity was found to be 1.28×10-1Ωcm.

Energy Band Properties of Hafnium Oxide Thin Films Fabricated by Ion Beam Sputtering Technique

2017 ◽  
Vol 37 (2) ◽  
pp. 0231001
Author(s):  
刘华松 Liu Huasong ◽  
王利栓 Wang Lishuan ◽  
杨 霄 Yang Xiao ◽  
刘丹丹 Liu Dandan ◽  
姜承慧 Jiang Chenghui ◽  
...  
Keyword(s):  
Thin Films ◽  
Energy Band ◽  
Hafnium Oxide ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Oxide Thin Films ◽  
Beam Sputtering

Yttrium oxide thin films, Y2O3, grown by ion beam sputtering on Si

2000 ◽  
Vol 33 (22) ◽  
pp. 2884-2889 ◽  
Author(s):  
R J Gaboriaud ◽  
F Pailloux ◽  
P Guerin ◽  
F Paumier
Keyword(s):  
Thin Films ◽  
Yttrium Oxide ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Oxide Thin Films ◽  
Beam Sputtering

Aluminum doped zinc oxide thin films deposited by ion beam sputtering

1989 ◽  
Vol 96 (2) ◽  
pp. 363-368 ◽  
Author(s):  
M. Ruth ◽  
J. Tuttle ◽  
J. Goral ◽  
R. Noufi
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Oxide Thin Films ◽  
Beam Sputtering ◽  
Aluminum Doped Zinc Oxide

SrTiO3 and (Ba,Sr)TiO3 Thin Films Preparation by Ion Beam Sputtering and Their Dielectric Properties

1991 ◽  
Vol 243 ◽  
Author(s):  
Shintaro Yamamichi ◽  
Toshiyuki Sakuma ◽  
Takashi Hase ◽  
Yoichi Miyasaka
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Dielectric Constant ◽  
Dielectric Properties ◽  
Current Density ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Sapphire Substrates ◽  
Capacitance Voltage ◽  
Beam Sputtering

AbstractSrTiO3 and (Ba,Sr)TiO3 thin films have been prepared by ion beam sputtering on Pd coated sapphire substrates. Film compositions were almost the same as target compositions when powder targets were used. Capacitance-voltage characteristics depended on Sr/Ti ratio of the SrTiO3 films. Only small changes of capacitance value were observed in the range from -3V to 3V when the Sr/Ti ratio was 1.0. Compared with rf-magnetron sputtered film, ion beam sputtered SrTiO3 film indicated lower leakage current density in 50nm thickness. In (Bax,Sr1-x)TiO3 thin films, dielectric constant changed with Ba content (x) and showed a maximum at x=0.5. It also changed with the firing temperature of target powder. The highest value was obtained by using the target powder fired at 900°C. A 100nm thick (Ba0.5,Sr0.5)TiO3 thin film indicated a dielectric constant value of 320.

Microstructure of polycrystalline near epitaxial (100) and (111) pyrochlore on A (100) MgO Substrate

1990 ◽  
Vol 48 (4) ◽  
pp. 1062-1063
Author(s):  
Shang Hsien Rou
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Transmission Electron ◽  
Beam Sputtering ◽  
Physical Phenomena ◽  
Mgo Substrate

New and interesting physical phenomena are being observed via thin film depositions using a variety of processing techniques in different material systems. The present study describes Pb-Zr-Ti-O pyrochlore thin films which were deposited onto (100) MgO substrates using an ion beam sputtering technique. These films are of interest because of their unique microstructure which may provide valuable information in better understanding the epitaxial growth of thin films. Characterization were performed using conventional transmission electron microscopy (TEM) and high resolution transmission electron microscopy (HRTEM). Special TEM sample preparation procedures have been developed, which will be reported elsewhere.The as-deposited pyrochlore thin film is near epitaxial and is oriented with both (100) and (111) parallel to the (100) of the MgO substrate. Figure 1(a) shows the selected area diffraction pattern (SADP) of the pyrochlore thin film taken parallel to the [100] zone axis of the substrate.

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