Effects of CuIn0,5Ga0,5Se2 growth by isothermal and bithermal Cu-Poor/Rich/Poor sequence on solar cells properties

2009 ◽  
Vol 1165 ◽  
Author(s):  
Hakim Marko ◽  
Adam Hultqvist ◽  
Charlotte Platzer-Björkman ◽  
Sébastien Noël ◽  
John Kessler
Keyword(s):  
Solar Cells ◽  
Buffer Layer ◽  
Atomic Layer ◽  
Buffer Layers ◽  
X Ray Diffraction ◽  
Crystallographic Preferred Orientation ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Layer I

AbstractCo-evaporated CuIn0,5Ga0,5Se2 thin film solar cells were grown using a sequential Cu-Poor/Rich/Poor process (CUPRO). During the growth process, the substrate temperature was either kept constant at 570 °C (iso-CUPRO) or decreased during the first step to either 360 or 430 or 500 °C (bi-CUPRO). According to atomic force microscopy (AFM) measurements, the lower the temperature is in the first step the smoother the final CIGS surface becomes. By decreasing the first step temperature, cross-section scanning electron microscopy (SEM) and θ-2θ x-ray diffraction (XRD) do not reveal clearly any important changes of morphology and crystallographic preferred orientation. SLG/Mo/CIGS/Buffer layer/i-ZnO/ZnO:Al/grid(Ni/Al/Ni) solar cells with either a chemical bath deposited CdS or an atomic layer deposited Zn(O,S) buffer layer were fabricated. For both buffer layers, the bi-CUPRO processes lead to higher efficiencies. Besides, using Zn(O,S), the electronic collection was improved for the infrared spectrum as well as for the ultraviolet spectrum. This resulted in efficiencies close to 14,5% for the Zn(O,S) cells.

A Study of the Effect of Growth Rate and Annealing on GaN Buffer Layers on Sapphire

1995 ◽  
Vol 395 ◽  
Author(s):  
J.C. Ramer ◽  
K. Zheng ◽  
C.F. Kranenberg ◽  
M. Banas ◽  
S.D Hersee
Keyword(s):  
Growth Rate ◽  
Buffer Layer ◽  
Layer Growth ◽  
Buffer Layers ◽  
Degree Of Crystallinity ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Gan Buffer Layer

ABSTRACTUsing atomic force microscopy (AFM) and X-ray diffraction (XRD) we have determined that on [0001] oriented sapphire, the GaN buffer layer shows a degree of crystallinity that is dependent on growth rate. Annealing studies show evolution of the crystallinity and the emergence of a preferred orientation. Also, substrate orientation is found to influence the buffer layer crystallinity. Based on this work and previous results, we propose that the GaN buffer layer growth can be described by the Stranski-Krastanov growth process.

scholarly journals Dielectric Function of AlN Grown on Si (111) by MBE

1999 ◽  
Vol 572 ◽  
Author(s):  
Stefan Zollner ◽  
Atul Konkar ◽  
R. B. Gregory ◽  
S. R. Wilson ◽  
S. A. Nikishin ◽  
...  
Keyword(s):  
Molecular Beam ◽  
Buffer Layers ◽  
Two Dimensional ◽  
X Ray Diffraction ◽  
Growth Morphology ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Dimensional Growth ◽  
Peak Widths

ABSTRACTWe measured the ellipsometric response from 0.7–5.4 eV of c-axis oriented AlN on Si (111) grown by molecular beam epitaxy. We determine the film thicknesses and find that for our AlN the refractive index is about 5–10% lower than in bulk AlN single crystals. Most likely, this discrepancy is due to a low film density (compared to bulk AlN), based on measurements using Rutherford backscattering. The films were also characterized using atomic force microscopy and x-ray diffraction to study the growth morphology. We find that AlN can be grown on Si (111) without buffer layers resulting in truely two-dimensional growth, low surface roughness, and relatively narrow x-ray peak widths.

Electrochemical Atomic-Layer Epitaxy: Electrodeposition of III-V and II-VI Compound Semiconductors

1999 ◽  
Vol 581 ◽  
Author(s):  
Travis L. Wade ◽  
Billy H. Flowers ◽  
Raman Vaidyanathan ◽  
Kenneth Mathe ◽  
Clinton B. Maddox ◽  
...  
Keyword(s):  
Compound Semiconductors ◽  
Atomic Layer ◽  
Atomic Layer Epitaxy ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Infrared Reflection ◽  
Epitaxial Deposition ◽  
Electrochemical Atomic Layer Epitaxy

ABSTRACTElectrochemical atomic-layer epitaxy (EC-ALE) is an approach to electrodepositing thin-films of compound semiconductors. It takes advantage of underpotential deposition (UPD), deposition of a surface limited amount (a monolayer or less) of an element at a potential less negative than bulk deposition, to form a thin-film of a compound--one atomic layer at a time. Ideally, the 2-D growth mode should promote epitaxial deposition.Many II-VI and a few III-V compounds have been formed by EC-ALE. TI-VI films such as CdSe, CdS, and CdTe have been successfully formed. In addition, deposition of III-V compounds of InAs and InSb are being explored, along with initial studies of GaAs deposition. Depositions of the I-VI systems are better understood so this report will focus on the III-V's, particularly InAs and InSb.Building compounds an atomic layer at a time lends electrochemical-ALE to nanoscale technology. Deposited thickness ranged from a few nanometers to a few hundred. The films are typically characterized by atomic-force microscopy (AFM), X-ray diffraction (XRD), electron microprobe analysis (EPMA) and ellipsometry. InAs deposits are also characterized by infrared reflection absorption.

Growth and Characterization of AlN and GaN Thin Films Deposited on Si(111) Substrates Containing a Very Thin Al Layer

2003 ◽  
Vol 798 ◽  
Author(s):  
Zachary J. Reitmeier ◽  
Robert F. Davis
Keyword(s):  
Flow Time ◽  
Buffer Layers ◽  
Nucleation Density ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Aln Buffer ◽  
Peak Widths

ABSTRACTAlN films and GaN films with AlN buffer layers were deposited via metalorganic vapor phase epitaxy on Si(111) substrates previously exposed to trimethylaluminum for increasing times. Atomic force microscopy (AFM) was used to determine the influence of Al pre-flow time on the nucleation and surface morphology of the AlN and GaN films. When preceded by a 10 second Al pre-flow, AlN films feature an increased and more uniform nucleation density as compared to films deposited without Al pre-flows. Ten second Al pre-flows were also found to result in a reduction of the RMS roughness for 100 nm thick AlN films from 3.6 nm to 1.0 nm. AFM of 0.5 μm thick GaN films deposited on AlN buffers with varying pre-flow times showed reduced roughness and decreased pit density when using Al pre-flows of 10 or 20 seconds. High resolution x-ray diffraction of the GaN films showed a reduction in the average full-width halfmaximum (FWHM) of the GaN (00.2) reflection from 1076 arcsec to 914 arcsec when the AlN buffer layer was initiated with a 10 second Al pre-flow. Increasing the pre-flow time to 20 seconds and 30 seconds resulted in average (00.2) FWHM values of 925 arcsec and 928 arcsec, respectively. Similar behavior of the peak widths was observed for the (30.2) and (10.3) reflections when the pre-flow times were varied from 0 to 30 seconds.

scholarly journals High-temperature X-ray scattering studies of atomic layer deposited IrO2

2020 ◽  
Vol 53 (2) ◽  
pp. 369-380
Author(s):  
Mikko J. Heikkilä ◽  
Jani Hämäläinen ◽  
Esa Puukilainen ◽  
Markku Leskelä ◽  
Mikko Ritala
Keyword(s):  
High Temperature ◽  
Phase Change ◽  
High Sensitivity ◽  
Atomic Layer ◽  
Ex Situ ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Change Temperature

IrO2 is an important material in numerous applications ranging from catalysis to the microelectronics industry, but despite this its behaviour upon annealing under different conditions has not yet been thoroughly studied. This work provides a detailed investigation of the annealing of IrO2 thin films using in situ high-temperature X-ray diffraction and X-ray reflectivity (HTXRR) measurements from room temperature up to 1000°C in oxygen, nitrogen, forming gas and vacuum. Complementary ex situ scanning electron microscopy and atomic force microscopy measurements were conducted. The combined data show the dependencies of crystalline properties and surface morphology on the annealing temperature and atmosphere. The reduction of IrO2 to Ir takes place at a temperature as low as 150°C in forming gas, but in oxygen IrO2 is stable up to 800°C and evaporates as a volatile oxide at higher temperatures. The IrO2 crystallite size remains constant in oxygen up to 400°C and increases above that, while in the more reducing atmospheres the Ir crystallites grow continuously above the phase-change temperature. The role of HTXRR in the analysis is shown to be important since its high sensitivity allows one to observe changes taking place in the film at temperatures much below the phase change.

High Quality Epitaxial Pt Films Grown on γ-Al2O3/Si (111) Substrates

2007 ◽  
Vol 124-126 ◽  
pp. 181-184
Author(s):  
Mikinori Ito ◽  
Kazuaki Sawada ◽  
Makoto Ishida
Keyword(s):  
Molecular Beam ◽  
Rf Magnetron Sputtering ◽  
High Energy ◽  
Buffer Layers ◽  
X Ray Diffraction ◽  
High Quality ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Pt Films

Epitaxial Pt films were grown on γ-Al2O3/Si (111) substrate by RF-magnetron sputtering. The γ-Al2O3 buffer layers were grown epitaxially using molecular beam epitaxy. The films were characterized by reflection high-energy electron diffraction (RHEED), X-ray diffraction (XRD) and atomic force microscopy (AFM). The results of XRD showed that high-quality Pt films were obtained at around 560°C. In addition, the Pt films exhibited a very smooth surface with the root-mean-square (rms) surface roughness is about 0.4 nm.

scholarly journals Synthesis and optimization of properties of thin films of FAx(MA1-X)PbI3grown by spin coating with perovskite structure to be used as active layer in hybrid solar cells

2020 ◽  
Vol 19 (1) ◽  
pp. 87-93
Author(s):  
Gerardo Gordillo-Guzmán ◽  
Ophyr Virgüez-Amaya ◽  
Camilo Otálora-Bastidas ◽  
Clara Calderón-Triana ◽  
César Quiñones-Segura
Keyword(s):  
Solar Cells ◽  
Active Layer ◽  
Spin Coating ◽  
Morphological Properties ◽  
Hybrid Solar Cells ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
One Step

This work report results concerning the effect that the substitution of the methylammonium cation by the formamidinium cation causes on the properties of FAx(MA1-x)PbI3films synthesized by spin coating in one step. For that, it was conducted a study to establish the influence of the composition of the FAx(MA1-x)PbI3films on their optical, structural and morphological properties, determined through spectral transmittance, atomic force microscopy and X-ray diffraction measurements. Correlating parameters of synthesis with results of the study of properties performed, we were able to get conditions to grow FAx(MA1-x)PbI3films with improved optical gap, microstructure and morphology, what allows to think that this compound is suitable to be used as the active layer in hybrid solar cells.

Dynamical X-Ray Diffraction Analysis of Triple-Junction Solar Cells on Germanium (001) Substrates

2017 ◽  
Vol 26 (03) ◽  
pp. 1740011
Author(s):  
F. A. Althowibi ◽  
J. E. Ayers
Keyword(s):  
Solar Cells ◽  
Diffraction Analysis ◽  
Buffer Layer ◽  
Triple Junction ◽  
Lattice Mismatch ◽  
Buffer Layers ◽  
Threading Dislocation ◽  
X Ray Diffraction ◽  
X Ray ◽  
Threading Dislocation Density

We demonstrate the dynamical x-ray diffraction analysis of metamorphic triple-junction solar cells grown on Ge (001) substrates. The solar cells investigated involve an In0.67Ga0.33P top cell, an In0.17Ga0.83As middle cell, and a Ge bottom cell. A graded buffer layer is inserted between the bottom and middle cells for the purpose of accommodating the lattice mismatch. Linearly-graded, step-graded, and S-graded compositional profiles were considered for this buffer layer. The x-ray rocking curve analysis for a number of hkl reflections including 004, 113, 116, 044, 026, and 117 was conducted for the case of Cu Kα1 radiation. We show that the use of non-destructive x-ray analysis allows determination of the threading dislocation densities in the top two cells. In the cases of S-graded or step-graded buffer layers, the buffer threading dislocation density could also be estimated.

Ultra-Smooth ZnO Buffer Layers on (001) Sapphire

1997 ◽  
Vol 482 ◽  
Author(s):  
A. J. Drehman ◽  
S.-Q. Wang ◽  
P. W. Yip
Keyword(s):  
Buffer Layers ◽  
Zno Films ◽  
Potential Candidate ◽  
X Ray Diffraction ◽  
Rocking Curve ◽  
X Ray ◽  
Force Microscopy ◽  
Sapphire Substrates ◽  
Atomic Force ◽  
Electrical Resistivities

AbstractUsing off-axis reactive rf sputtering, we have grown extremely smooth, nearly epitaxial, (001) oriented ZnO films on c-axis sapphire substrates. Atomic Force Microscopy was used to determine that these films are extremely smooth, having an rms roughness of only a few tenths of a nanometer. Based on high resolution x-ray diffraction (HXRD), the ZnO is highly oriented, with a rocking curve width of less than 400 arc seconds for the (006) diffraction peak, and only somewhat larger for the (112) reflection. HXRD Phi scans show that the ZnO (112) reflection is rotated in the a-b plane by 30 degrees from the sapphire (113) direction. These two measurements indicate excellent in-plane orientation. We are investigating the use of these buffer layers for subsequent GaN growth. Electrical resistivities of the films exceeded 100 kΩ-cm making ZnO a potential candidate as an insulating buffer layer.

Investigation of the Effect of Uv-Assisted Oxidation and Nitridation of Hafnium Metal Films

2003 ◽  
Vol 780 ◽  
Author(s):  
C. Essary ◽  
V. Craciun ◽  
J. M. Howard ◽  
R. K. Singh
Keyword(s):  
Uv Radiation ◽  
Photoelectron Spectroscopy ◽  
Grazing Angle ◽  
X Ray Diffraction ◽  
Metal Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Si Substrates ◽  
Atomic Force ◽  
Silicon Interface

AbstractHf metal thin films were deposited on Si substrates using a pulsed laser deposition technique in vacuum and in ammonia ambients. The films were then oxidized at 400 °C in 300 Torr of O2. Half the samples were oxidized in the presence of ultraviolet (UV) radiation from a Hg lamp array. X-ray photoelectron spectroscopy, atomic force microscopy, and grazing angle X-ray diffraction were used to compare the crystallinity, roughness, and composition of the films. It has been found that UV radiation causes roughening of the films and also promotes crystallization at lower temperatures.Furthermore, increased silicon oxidation at the interface was noted with the UVirradiated samples and was shown to be in the form of a mixed layer using angle-resolved X-ray photoelectron spectroscopy. Incorporation of nitrogen into the film reduces the oxidation of the silicon interface.

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