Ion Beam Mixing of Sb Schottky Contacts on n-Si

1989 ◽  
Vol 157 ◽  
Author(s):  
J. B. Malherbe ◽  
K. P. Weimer ◽  
L. J. Bredell ◽  
E. Friedland ◽  
G. Myburg
Keyword(s):  
Ideality Factor ◽  
Series Resistance ◽  
Ion Beam ◽  
Dose Dependence ◽  
Schottky Contacts ◽  
Interface Conditions ◽  
Saturation Current ◽  
Ion Beam Mixing

ABSTRACTThe I—V characteristics of as—deposited antimony Schottky contacts on silicon were extremely sensitive to interface conditions. This led to unpredictable results for the unimplanted contacts. After Si* implantation the contacts displayed more uniform I—V characteristics. Implantation led to higher values for the ideality constant, the series resistance and for the saturation current. The ideality factor seems to decrease at the higher implantation doses (ϕ ≥ 5×1014 Sb+cn−2), while no clear dose dependence patterns were observed for the saturation current and series resistance after implantation.

scholarly journals The effects of electron irradiation and thermal dependence measurements on 4H-Sic Schottky diode

2017 ◽  
Vol 51 (12) ◽  
pp. 1721
Author(s):  
Sabuhi Ganiyev ◽  
M. Azim Khairi ◽  
D. Ahmad Fauzi ◽  
Yusof Abdullah ◽  
N.F. Hasbullah
Keyword(s):  
Barrier Height ◽  
Ideality Factor ◽  
Elevated Temperatures ◽  
Series Resistance ◽  
Schottky Diodes ◽  
High Energy ◽  
Bias Current ◽  
N Saturation ◽  
Saturation Current ◽  
Current Voltage

In this paper the effects of high energy (3.0 MeV) electrons irradiation over a dose ranges from 6 to 15 MGy at elevated temperatures 298 to 448 K on the current-voltage characteristics of 4H-SiC Schottky diodes were investigated. The experiment results show that after irradiation with 3.0 MeV forward bias current of the tested diodes decreased, while reverse bias current increased. The degradation of ideality factor, n, saturation current, Is, and barrier height, Phib, were not noticeable after the irradiation. However, the series resistance, Rs, has increased significantly with increasing radiation dose. In addition, temperature dependence current-voltage measurements, were conducted for temperature in the range of 298 to 448 K. The Schottky barrier height, saturation current, and series resistance, are found to be temperature dependent, while ideality factor remained constant. DOI: 10.21883/FTP.2017.12.45193.8646

Extraction of the Parameters from I-V Data for Nonideal Photodetectors: A Comparative Study

2005 ◽  
Vol 494 ◽  
pp. 83-88
Author(s):  
A. Vasić ◽  
P. Osmokrović ◽  
B. Lončar ◽  
S. Stanković
Keyword(s):  
Comparative Study ◽  
Ideality Factor ◽  
Series Resistance ◽  
Semiconductor Devices ◽  
Saturation Current ◽  
Made In

Parameters that characterize semiconductor devices are often determined with difficulty, and their values very frequently depend on the method used for measurements and analysis. The extraction of diode parameters from the obtained I-V measurements could be complicated by their dependence on the voltage and the presence of series resistance. Therefore, an interpretation of the experimental I-V data must be very carefully made. In this paper, some methods for obtaining diode parameters such as saturation current, ideality factor and series resistance are presented. An evaluation of these methods based on their application for the extraction of the relevant parameters of photodiodes is also performed. Some of the methods that produce reliable and reproducible results are evaluated based on the experimentally obtained results, and in the view of the complexity of the used methods and their limitations.

Temperature dependence of current-voltage characteristics in μc-Si:H and pm-Si:H PIN structures

2012 ◽  
Vol 1426 ◽  
pp. 365-370
Author(s):  
Francisco Temoltzi Avila ◽  
Andrey Kosarev ◽  
Ismael Cosme ◽  
Mario Moreno ◽  
P. Roca y Cabarrocas
Keyword(s):  
Temperature Dependence ◽  
Temperature Change ◽  
Ideality Factor ◽  
Dark Current ◽  
Series Resistance ◽  
Equivalent Circuit Model ◽  
Saturation Current ◽  
Current Voltage ◽  
Current Voltage Characteristics

ABSTRACTThe dark current-voltage characteristics of PIN structures are studied and analyzed for PV samples as for integral device without taking account the performance of the different elements typically used in equivalent circuit model such as diode n-factor, shunt and series resistances. The contribution of all these elements is very important in the development of devices because they determine the performance characteristics. In this work we have studied and compared the temperature dependence of current-voltage characteristics in μc-Si:H and pm-Si:H p-i-n structures having approximately the same efficiencies with emphasis on their different electronic characteristics such as shunt (Rsh) and series (Rs) resistance, ideality factor (n), and the saturation current (Is), which give us some ideas on role of these elements. In the pm-Si:H cell it was observed that the Rs increases with the increase of the temperature in contrast to the μc-Si:H structures, where the series resistance reduces with temperature change from T = 300 up to 480K. In both the pm-Si:H and μc-Si:H samples Rshreduces with temperature change from 300 up to 480 K. The ideality factor in the pm-Si:H structure shows an increase, and in μc-Si:H a reduction, when temperature increases. Saturation current in both cases increases with temperature as it was expected. From the saturation current it was obtained the build-in potential. Analysis behavior of both saturation current and n-factor with temperature shows that build-in potential increases with temperature in the pm-Si:H, but reduces in μc-Si:H structure.

Temperature Dependent Current-Voltage Characteristics of n-Type β-FeSi2/Intrinsic Si/p-Type Si Heterojunctions

2015 ◽  
Vol 1120-1121 ◽  
pp. 435-439
Author(s):  
Nathaporn Promros ◽  
Dalin Prajakkan ◽  
Nantharat Hongsa ◽  
Nattanee Suthayanan ◽  
Phongsaphak Sittimart ◽  
...  
Keyword(s):  
Current Density ◽  
Ideality Factor ◽  
Series Resistance ◽  
Linear Part ◽  
Thermionic Emission ◽  
Saturation Current ◽  
Current Voltage ◽  
Saturation Current Density ◽  
Current Voltage Characteristics ◽  
P Type

In this work, n-type β-FeSi2/intrinsic Si/p-type Si heterojunctions were prepared by facing-targets direct-current sputtering. We measured their current-voltage characteristics at low temperatures ranging from 300 K down to 50 K and investigated their ideality factor, saturation current and series resistance using thermionic emission theory and Cheung’s method. From thermionic emission theory, the ideality factor and saturation current density were calculated from the slope of the linear part from the forward lnJ-V and the straight line intercept of lnJ-V at zero voltage, respectively. When the temperature decreased from 300 K down to 50 K, the ideality factor increased from 1.12 to 11.13, whereas the saturation current density decreased from 2.09 × 10-6 A/cm2 to 1.06 × 10-9 A/cm2. Using Cheung’s method, we plotted the relations of dV/d(lnJ)-J and H(J)-J in order to estimate the series resistance from the slope of both plots. In addition, we estimated the ideality factor from a y-axis intercept of the dV/d(lnJ)-J plot. The series resistances from both plots were consistent with each other and increased with the decreasing temperature. The ideality factor estimated by Cheung’s method was in agreement with that obtained from estimation by thermionic emission theory.

Linear dose dependence of ion beam mixing of metals on Si

1985 ◽  
Vol 57 (4) ◽  
pp. 1414-1416 ◽  
Author(s):  
D. B. Poker ◽  
B. R. Appleton
Keyword(s):  
Ion Beam ◽  
Dose Dependence ◽  
Ion Beam Mixing ◽  
Linear Dose

Ion beam mixing of U-based bilayers

1991 ◽  
Vol 6 (6) ◽  
pp. 1175-1187 ◽  
Author(s):  
François Rossi ◽  
M. Nastasi ◽  
M. Cohen ◽  
C. Olsen ◽  
J.R. Tesmer ◽  
...  
Keyword(s):  
Transition Temperature ◽  
Ion Beam ◽  
Dose Dependence ◽  
Mixing Efficiency ◽  
Thermal Spike ◽  
Ion Beam Mixing ◽  
Linear Dose ◽  
Mixing Regime ◽  
Biased Diffusion ◽  
Thermodynamical Model

Bilayer samples of U/Al, U/Ti, U/Si, and U/C have been ion beam mixed with 400 keV Ar and U/Al with Xe ions at doses from 2 × 1015 to 1 × 1017 ions/cm2. Mixing experiments were performed at various temperatures between 77 and 420 K. The amount of interfacial mixing, 4Dt, follows a linear dose dependence below a critical temperature, depending on the system studied. Below this temperature, the mixing efficiency, defined as ∂(4Dt)Φ where 4Dt is the mixing and Φ is the dose, is temperature independent. Its value, as well as the value of the transition temperature, agrees well with the thermodynamical model of chemically biased diffusion in a thermal spike for the four systems tested. The transition between the thermal spike regime and the temperature enhanced mixing regime was interpreted on the basis of an intracascade mechanism. The formation of an intermetallic compound in the U/Al system was detected and interpreted on a qualitative basis by crystallographic considerations.

Realization and Characterization of CH3NH3PbI3 /c-Si Heterojunction

2021 ◽  
Vol 406 ◽  
pp. 364-374
Author(s):  
Fatima Khelfaoui ◽  
Itidel Belaidi ◽  
Nadhir Attaf ◽  
Mohammed Salah Aida ◽  
Jamal Bougdira
Keyword(s):  
Ideality Factor ◽  
Series Resistance ◽  
Crystalline Silicon ◽  
Interface State ◽  
Angular Frequency ◽  
Single Crystalline Silicon ◽  
Saturation Current ◽  
Si Substrate ◽  
Conductance Method

In the present work we have reported the realization and characterization of CH3NH3PbI3/c-Si heterojunction. It was achieved by deposing CH3NH3PbI3 perovskite film on (P) doped single crystalline Silicon (c-Si) substrate by spin coating. The structural, optical and electrical properties of perovskite film were investigated. The electric characterization of the realized device was achieved through I-V and G-f measurements. The recorded I-V characteristic exhibits a rectifier behavior. This curve was used also to determine diode parameters; the ideality factor, the saturation current, the series resistance and the potential barrier. However, the conductance method was used to assess the interface state Nss via (G/ω) versus angular frequency ω curve. The results were used to justify the large values of the ideality factor and the series resistance.

scholarly journals Silicon carbide schottky diodes forward and reverse current properties upon fast electron radiation

2019 ◽  
Vol 8 (2) ◽  
pp. 428-437
Author(s):  
M. Azim Khairi ◽  
Rosminazuin Ab. Rahim ◽  
Norazlina Saidin ◽  
Yusof Abdullah ◽  
Nurul Fadzlin Hasbullah
Keyword(s):  
Silicon Carbide ◽  
Electron Irradiation ◽  
Ideality Factor ◽  
Reverse Bias ◽  
Series Resistance ◽  
Schottky Diodes ◽  
Forward Bias ◽  
Bias Current ◽  
Saturation Current ◽  
Order Of Magnitude

This paper investigates on the reaction of 10 and 15MGy, 3MeV electron irradiation upon off-the-shelves (commercial) Silicon Carbide Schottky diodes from Infineon Technologies (model: IDH08SG60C) and STMicroelectronics (model: STPSC806). Such irradiation reduces the forward-bias current. The reduction is mainly due to the significant increase of the series resistance (i.e. Infineon: 1.45Ω at before irradiation → 121×103 Ω at 15MGy); STMicroelectronics: 1.44Ω at before irradiation → 2.1×109 Ω at 15MGy). This increase in series resistance gives 4.6 and 8.2 orders of magnitude reduction for the forward-bias current density of Infineon and STMicroelectronics respectively. It is also observed that the ideality factor and the saturation current of the diodes increases with increasing dose (i.e. ideality factor- Infineon: 1.01 at before irradiation → 1.05 at 15MGy; STMicroelectronics: 1.02 at before irradiation → 1.3 at 15MGy | saturation current- Infineon: 1.6×10-17A at before irradiation → 2.5×10-17A at 15MGy; STMicroelectronics: 2.4×10-15A at before irradiation → 8×10-15A at 15MGy). Reverse-bias leakage current density in model by Infineon increases by one order of magnitude after 15MGy irradiation, however, in model by STMicroelectronics decreases by one order of magnitude. Overall, for these particular samples studied, Infineon devices have shown to be better in quality and more radiation resistance toward electron irradiation in forward-bias operation while STMicroelectronics exhibit better characteristics in reverse-bias operation.

The effect of silicon ion beam mixing on the barrier height of Sb/n-Si Schottky contacts

1993 ◽  
Vol 70-71 ◽  
pp. 442-446 ◽  
Author(s):  
J.B. Malherbe ◽  
K.P. Weimer ◽  
E. Friedland ◽  
L.J. Bredell
Keyword(s):  
Barrier Height ◽  
Ion Beam ◽  
Schottky Contacts ◽  
Ion Beam Mixing
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