Excimer Laser Induced Crystallization of Amorphous Silicon Near Threshold

1989 ◽  
Vol 157 ◽  
Author(s):  
R.Z. Bachrach ◽  
K. Winer ◽  
J.B. Boyce ◽  
F.A. Ponce ◽  
S.E. Ready ◽  
...  
Keyword(s):  
Energy Density ◽  
Laser Beam ◽  
Amorphous Silicon ◽  
Excimer Laser ◽  
Laser Energy ◽  
Laser Energy Density ◽  
Square Root ◽  
Threshold Behavior ◽  
Sharp Threshold ◽  
Induced Crystallization

ABSTRACTUsing a suitably homogenized excimer laser beam, we have shown that the threshold for crystallization of amorphous silicon is well defined and exhibits a square root dependence on the laser energy density above threshold. This sharp threshold behavior can be exploited in a number of ways.

Excimer Laser Crystallized Amorphous Silicon Films: Effects of Shot Density and Substrate Temperature

1991 ◽  
Vol 219 ◽  
Author(s):  
R. I. Johnson ◽  
G. B. Anderson ◽  
S. E. Ready ◽  
J. B. Boyce
Keyword(s):  
Energy Density ◽  
Substrate Temperature ◽  
Amorphous Silicon ◽  
Laser Energy ◽  
Silicon Films ◽  
Laser Energy Density ◽  
Laser Crystallization ◽  
Average Grain Size ◽  
Substrate Temperatures

ABSTRACTLaser crystallization of a-Si thin films has been shown to produce materials with enhanced electrical properties and devices that are faster and capable of carrying higher currents. The quality of these polycrystalline films depends on a number of parameters such as laser energy density, shot density, substrate temperature, and the quality of the starting material. We find that the average grain size and transport properties of laser crystallized amorphous silicon films increase substantially with laser energy density, increase only slightly with laser shot density, and are unaffected by substrate temperatures of up to 400°C. The best films are those processed in vacuum but films of fair quality can also be obtained in air and nitrogen atmospheres.

Fast-Pulse Excimer-Laser-Induced Processes in a-Si:H

1989 ◽  
Vol 164 ◽  
Author(s):  
K. Winer ◽  
R.Z. Bachrach ◽  
R.I. Johnson ◽  
S.E. Ready ◽  
G.B. Anderson ◽  
...  
Keyword(s):  
Energy Density ◽  
Excimer Laser ◽  
Impurity Concentration ◽  
Laser Annealing ◽  
Laser Energy ◽  
Laser Energy Density ◽  
Excimer Laser Annealing ◽  
Near Surface ◽  
Pulse Excimer Laser ◽  
Fast Pulse

AbstractThe effects of fast-pulse excimer laser annealing of a-Si:H were investigated by measurements of electronic transport properties and impurity concentration depth profiles as a function of incident laser energy density. The dc dark conductivity of laser-annealed, highly-doped a-Si:H increases by a factor of ∼350 above a sharp laser energy density threshold whose magnitude increases with decreasing impurity concentration and which correlates with the onset of hydrogen evolution from and crystallization of the near-surface layer. The similarities between the preparation and properties of laser-crystallized a-Si:H and pc-Si:H are discussed.

Effect of Excimer Laser Annealing on Optical Properties of GaN Films Deposited by R.F. Magnetron Sputtering

2001 ◽  
Vol 693 ◽  
Author(s):  
Man Young Sung ◽  
Woong-Je Sung ◽  
Yong-Il Lee ◽  
Chun-Il Park ◽  
Woo-Boem Choi ◽  
...  
Keyword(s):  
Thin Films ◽  
Energy Density ◽  
Magnetron Sputtering ◽  
Buffer Layer ◽  
Excimer Laser ◽  
Laser Annealing ◽  
Laser Energy ◽  
Laser Energy Density ◽  
Excimer Laser Annealing ◽  
Zno Buffer Layer

Abstract:GaN thin films on sapphire were grown by RF magnetron sputtering with ZnO buffer layer. The tremendous mismatch between the lattices of GaN and sapphire can be partly overcome by the use of thin buffer layer of ZnO. The dependence of GaN film quality on ZnO buffer layer was investigated by X-ray diffraction(XRD). The properties of the sputtered GaN are strongly dependent on ZnO buffer layer thickness. The optimum thickness of ZnO buffer layer is around 30nm. Using XRD analysis, we have found the optimal substrate temperature which can grow high quality GaN thin film. In addition, the effect of excimer laser annealing(ELA) on structural and electrical properties of GaN thin films was investigated. The surface roughness and images according to the laser energy density were investigated by atomic force microscopy(AFM) and it was confirmed that the crystallization was improved by increasing laser energy density.

Excimer Laser-Induced Shallow Diffusion of Boron

1986 ◽  
Vol 71 ◽  
Author(s):  
S. Kato ◽  
T. Nagahori ◽  
S. Matsumoto ◽  
T. Fujioka
Keyword(s):  
Energy Density ◽  
Sheet Resistance ◽  
Excimer Laser ◽  
Silicon Substrate ◽  
Laser Energy ◽  
Gas Pressure ◽  
Laser Energy Density ◽  
Junction Depth ◽  
Arf Excimer Laser ◽  
Probe Measurements

AbstractThe very shallow junction of boron has been formed by the irradiation of ArF excimer laser on silicon substrate set in BF3 ambient. The sheet resistance decreases with the increase of the number of pulses and saturates above 150 pulses. It also decreases with increasing both gas pressure and laser energy density. The junction depth increases with increasing the number of pulses, ranging from about 400 Å to 2000 Å. It is confirmed from SIMS and four-point probe measurements that boron atoms diffused are electrically activated up to the concentration of about 1020cm−3.

Fundamentals of radiation heat transfer in AlSi10Mg powder bed during selective laser melting

2019 ◽  
Vol 25 (9) ◽  
pp. 1506-1515 ◽  
Author(s):  
Pei Wei ◽  
Zhengying Wei ◽  
Zhne Chen ◽  
Jun Du ◽  
Yuyang He ◽  
...  
Keyword(s):  
Heat Transfer ◽  
Energy Density ◽  
Negative Impact ◽  
Laser Energy ◽  
Melting Process ◽  
Laser Energy Density ◽  
Granular System ◽  
Laser Melting ◽  
Content Type ◽  
Powder Bed

Purpose This paper aims to study numerically the influence of the applied laser energy density and the porosity of the powder bed on the thermal behavior of the melt and the resultant instability of the liquid track. Design/methodology/approach A three-dimensional model was proposed to predict local powder melting process. The model accounts for heat transfer, melting, solidification and evaporation in granular system at particle scale. The proposed model has been proved to be a good approach for the simulation of the laser melting process. Findings The results shows that the applied laser energy density has a significantly influence on the shape of the molten pool and the local thermal properties. The relative low or high input laser energy density has the main negative impact on the stability of the scan track. Decreasing the porosity of the powder bed lowers the heat dissipation in the downward direction, resulting in a shallower melt pool, whereas pushing results in improvement in liquid track quality. Originality/value The randomly packed powder bed is calculated using discrete element method. The powder particle information including particle size distribution and packing density is taken into account in placement of individual particles. The effect of volumetric shrinkage and evaporation is considered in numerical model.

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