Microstructure and Tribological Properties OF Co-Cr thin Films Deposited by Facing Targets Sputtering and Magnetron Sputtering Methods

1991 ◽  
Vol 239 ◽  
Author(s):  
Sadao Kadokura ◽  
Masahiko Naoe
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Tribological Properties ◽  
Columnar Structure ◽  
Plastic Substrate ◽  
Homogeneous Distribution ◽  
Columnar Microstructure ◽  
Tribological Test ◽  
Surface Profiles ◽  
Facing Target Sputtering

ABSTRACTThe tribological properties and the slid surface profiles of Co-Cr thin films deposited by Facing Targets sputtering and Magnetron sputtering methods were investigated in regard to the durability of flexible disks. Co-Cr thin films with columnless microstructure and homogeneously packed particles were much tougher than ones with columnar microstructure for tribological test. The Co-Cr films deposited by conventional Magnetron sputtering method revealed typically columnar structure, while ones deposited by Facing Target sputtering method did columnless microstructure. This indicates probably homogeneous distribution of strong bonding forces between grain boundaries throughout the films, because no brittle fracture was observed even after the delamination between a plastic substrate and the CoOx/ Co-Cr / Ni-Fe triple layers took place by application of excess stresses. It was found that difference in morphology of Co-Cr thin film between Facing Target sputtering and conventional Magnetron sputtering methods was much significant.

Tribological properties of amorphous carbon thin films grown by magnetron sputtering method

2004 ◽  
Vol 180-181 ◽  
pp. 218-221 ◽  
Author(s):  
Yong Seob Park ◽  
Hyun Sik Myung ◽  
Jeon Geon Han ◽  
Byungyou Hong
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Amorphous Carbon ◽  
Tribological Properties ◽  
Carbon Thin Films

scholarly journals CrN coatings deposited by magnetron sputtering: mechanical and tribological properties

DYNA ◽  
2015 ◽  
Vol 82 (191) ◽  
pp. 147-155 ◽  
Author(s):  
Alexander Ruden-Muñoz ◽  
Elisabeth Restrepo-Para ◽  
Federico Sequeda
Keyword(s):  
Magnetron Sputtering ◽  
Tribological Properties ◽  
Surface Damage ◽  
Adherence Behavior ◽  
Tribological Test ◽  
Aisi 304 ◽  
Mechanical And Tribological Properties ◽  
Aisi 4140 ◽  
Steel Substrates ◽  
Crn Coatings

Mechanical and tribological properties of CrN coatings grown on steel substrates AISI 304 and AISI 4140 using the magnetron sputtering technique were analyzed. Coatings were grown at two pressures of work, 0.4 and 4.0 Pa. The films grown on AISI 304 at a pressure of work of 0.4 showed the highest hardness because it presented a larger grain size and lower roughness. For CrN synthesized at 0.4 Pa, the surface damage was lower during the tribological test. Adherence studies were also carried out, obtaining <em>Lc</em>1 and <em>Lc</em>2 for coatings produced at both pressures and on both substrates. Better adherence behavior was observed for films grown at a low pressure because these films were thicker (~890 nm).

Structural, mechanical and tribological properties of ZrC thin films deposited by magnetron sputtering

Vacuum ◽  
2019 ◽  
Vol 169 ◽  
pp. 108909 ◽  
Author(s):  
Adam Gilewicz ◽  
Katarzyna Mydłowska ◽  
Jerzy Ratajski ◽  
Łukasz Szparaga ◽  
Przemysław Bartosik ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Tribological Properties ◽  
Mechanical And Tribological Properties

scholarly journals Influence of the structural and surface properties on photocatalytic activity of TiO2:Nd thin films

2015 ◽  
Vol 17 (2) ◽  
pp. 103-111 ◽  
Author(s):  
Damian Wojcieszak ◽  
Michał Mazur ◽  
Danuta Kaczmarek ◽  
Jerzy Morgiel ◽  
Agata Poniedziałek ◽  
...  
Keyword(s):  
Thin Films ◽  
Photocatalytic Activity ◽  
Magnetron Sputtering ◽  
Anatase Phase ◽  
High Energy ◽  
Columnar Structure ◽  
Photoluminescence Intensity ◽  
Rutile Structure ◽  
Phenol Decomposition ◽  
Titanium Dioxide Thin Films

Abstract Titanium dioxide thin films doped with the same amount of neodymium were prepared using two different magnetron sputtering methods. Thin films of anatase structure were deposited with the aid of Low Pressure Hot Target Magnetron Sputtering, while rutile coatings were manufactured using High Energy Reactive Magnetron Sputtering process. The thin films composition was determined by energy dispersive spectroscopy and the amount of the dopant was equal to 1 at. %. Structural properties were evaluated using transmission electron microscopy and revealed that anatase films had fibrous structure, while rutile had densely packed columnar structure. Atomic force microscopy investigations showed that the surface of both films was homogenous and consisted of nanocrystalline grains. Photocatalytic activity was assessed based on the phenol decomposition. Results showed that both thin films were photocatalytically active, however coating with anatase phase decomposed higher amount of phenol. The transparency of both thin films was high and equal to ca. 80% in the visible wavelength range. The photoluminescence intensity was much higher in case of the coating with rutile structure.

Microstructure, Mechanical, and Tribological Properties of CN x Thin Films Prepared by Reactive Magnetron Sputtering

2014 ◽  
Vol 27 (1) ◽  
pp. 31-36 ◽  
Author(s):  
Xiangyang Chen ◽  
Jin Zhang ◽  
Shengli Ma ◽  
Haixia Hu ◽  
Zhebo Zhou
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Tribological Properties ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Mechanical And Tribological Properties

scholarly journals Low-Temperature Growth of ZnO Nanowires from Gravure-Printed ZnO Nanoparticle Seed Layers for Flexible Piezoelectric Devices

Nanomaterials ◽  
2021 ◽  
Vol 11 (6) ◽  
pp. 1430
Author(s):  
Andrés Jenaro Lopez Garcia ◽  
Giuliano Sico ◽  
Maria Montanino ◽  
Viktor Defoor ◽  
Manojit Pusty ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Zno Nanowires ◽  
Plastic Substrate ◽  
Homogeneous Distribution ◽  
Zno Nanoparticle ◽  
Gravure Printing ◽  
High Quality ◽  
Piezoelectric Devices ◽  
Seed Layers

Zinc oxide (ZnO) nanowires (NWs) are excellent candidates for the fabrication of energy harvesters, mechanical sensors, and piezotronic and piezophototronic devices. In order to integrate ZnO NWs into flexible devices, low-temperature fabrication methods are required that do not damage the plastic substrate. To date, the deposition of patterned ceramic thin films on flexible substrates is a difficult task to perform under vacuum-free conditions. Printing methods to deposit functional thin films offer many advantages, such as a low cost, low temperature, high throughput, and patterning at the same stage of deposition. Among printing techniques, gravure-based techniques are among the most attractive due to their ability to produce high quality results at high speeds and perform deposition over a large area. In this paper, we explore gravure printing as a cost-effective high-quality method to deposit thin ZnO seed layers on flexible polymer substrates. For the first time, we show that by following a chemical bath deposition (CBD) process, ZnO nanowires may be grown over gravure-printed ZnO nanoparticle seed layers. Piezo-response force microscopy (PFM) reveals the presence of a homogeneous distribution of Zn-polar domains in the NWs, and, by use of the data, the piezoelectric coefficient is estimated to be close to 4 pm/V. The overall results demonstrate that gravure printing is an appropriate method to deposit seed layers at a low temperature and to undertake the direct fabrication of flexible piezoelectric transducers that are based on ZnO nanowires. This work opens the possibility of manufacturing completely vacuum-free solution-based flexible piezoelectric devices.

Microstructure and tribological properties of TiN, TiC and Ti(C, N) thin films prepared by closed-field unbalanced magnetron sputtering ion plating

2009 ◽  
Vol 255 (21) ◽  
pp. 8788-8793 ◽  
Author(s):  
Guojun Zhang ◽  
Bin Li ◽  
Bailing Jiang ◽  
Fuxue Yan ◽  
Dichun Chen
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Tribological Properties ◽  
Closed Field ◽  
Ion Plating ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron
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