Simultaneous Relaxation of Network and Defects in Silicon-Implanted a-Si:H

1995 ◽  
Vol 377 ◽  
Author(s):  
J. Nakata ◽  
S. Sherman ◽  
S. Wagner ◽  
P. A. Stolk ◽  
J. M. Poate
Keyword(s):  
Electronic Transport ◽  
Annealing Temperature ◽  
Urbach Energy ◽  
Defect Density ◽  
Dark Conductivity ◽  
Equilibrium Theory ◽  
Hopping Conduction ◽  
Dangling Bond ◽  
Bond Density ◽  
Additional Illumination

ABSTRACTWe report extensive optical and electronic transport data on silicon-implanted a-Si:H, annealed in steps in the dark or with additional illumination. All measured properties relax gradually with increasing annealing temperature. The dark conductivity of the as-implanted film is dominated by hopping conduction via midgap defects. This channel is pinched off during the initial stages of annealing. The midgap defect density and the Urbach energy follow an annealing path that agrees qualitatively with the trajectory postulated by the equilibrium theory of the dangling-bond density. Therefore, the silicon network and the defect density equilibrate continuously during network relaxation.

scholarly journals The effect of annealing temperature on the structural, optical, and electrical properties of CdS films

2010 ◽  
Vol 25 (1) ◽  
pp. 189-196 ◽  
Author(s):  
Hulya Metin ◽  
Mehmet Ari ◽  
Selma Erat ◽  
Semra Durmuş ◽  
Mehmet Bozoklu ◽  
...  
Keyword(s):  
Activation Energy ◽  
Phase Transformation ◽  
Electrical Properties ◽  
Electronic Transport ◽  
Annealing Temperature ◽  
Optical Band Gap ◽  
Urbach Energy ◽  
Band Gap Energy ◽  
Optical And Electrical Properties ◽  
Gap Energy

Cadmium sulfide (CdS) photocatalyst films were grown on glass by chemical bath deposition (pH 9.4, 70 °C) and then annealed in nitrogen from 423 K to 823 K in steps of 100 K. The XRD crystallite size increases in a sigmoidal manner from 60 nm to 100 nm while the optical band gap energy decreases from 2.42 eV to 2.28 eV. This trend is paralleled by the decreasing Urbach energy, but only up to 623 K, where it increases again. This is the temperature where the Cd effectively surpasses the phase transformation from cubic to hexagonal, and the activation energy for electronic transport drops by a factor of nearly two.

Correlation Between Freeze-In Temperature of Defect Density and Hydrogen Concentration in a-Si:H

1991 ◽  
Vol 219 ◽  
Author(s):  
X. Xu ◽  
M. Isomura ◽  
J. H. Yoon ◽  
S. Wagner ◽  
J. R. Abelson
Keyword(s):  
Hydrogen Concentration ◽  
Defect Density ◽  
Dangling Bond ◽  
Bond Density ◽  
Higher Temperature ◽  
Defect Densities

ABSTRACTWe measured the freeze-in temperature of the dangling-bond density in a-Si:H in nine samples with hydrogen concentrations ranging from 7.0 to 31 at.%. The measurements were made by determining the defect density of samples quenched from successively higher temperature. We determined the defect densities with the constant photoconductivity method. The freeze-in temperature is 211±10 °C, and is independent of hydrogen concentration.

scholarly journals Material Parameters in a Thick Hydrogenated Amorphous Silicon Detector and their Effect on Signal Collection

1989 ◽  
Vol 149 ◽  
Author(s):  
S. Qureshi ◽  
V. Perez-Mendez ◽  
S. N. Kaplan ◽  
I. Fujieda ◽  
G. Cho
Keyword(s):  
Amorphous Silicon ◽  
Defect Density ◽  
Hydrogenated Amorphous Silicon ◽  
Silicon Detector ◽  
Dangling Bond ◽  
Material Parameters ◽  
Bond Density ◽  
Transient Photoconductivity ◽  
Signal Collection ◽  
Hydrogenated Amorphous

ABSTRACTTransient photoconductivity and ESR measurements were done to relate the ionized dangling bond density and the spin density of thick hydrogenated amorphous silicon (a-Si:H) detectors. We found that only a fraction (∼30–35%) of the total defect density as measured by ESR is ionized when the detector is biased into deep depletion. The measurements on annealed samples also show that this fraction is about 0.3. An explanation based on the shift of the Fermi energy is given. The measurements show that the time dependence of relaxation is a stretched exponential.

Recovery Kinetics of Phosphorus Ion-Implanted a-Si:H

1996 ◽  
Vol 420 ◽  
Author(s):  
J. Nakata ◽  
S. Wagner ◽  
H. Gleskova ◽  
P. A. Stolk ◽  
J. M. Poate
Keyword(s):  
Gas Phase ◽  
Thermal Activation ◽  
Urbach Energy ◽  
Defect Density ◽  
Strained Si ◽  
Effective Electron ◽  
Additional Illumination ◽  
Hydrogenated Amorphous ◽  
Kinetics Of ◽  
Strained Bonds

AbstractHydrogenated amorphous silicon was implanted with phosphorus ions to a uniform concentration of 3×1020 cm-3 and defect saturation. The implants were annealed isochronally up to 400°C in the dark or under additional illumination. This illumination had no effect on recovery. The Urbach energy remains higher than that of silicon-implants. The midgap defect density anneals to ˜ 1018 cm-3, typical of gas-phase doped samples. The dark conductvity remains lower and its thermal activation energy higher than in gas-phase doped samples. We surmise that the Si-Si network absorbs some of the donor electron-induced defect density by forming strained Si-Si bonds. These strained bonds widen the band tails, and thus reduce the effective electron mobility and pin the Fermi level.

Reduction of Neutral Dangling Bond Density by Light Soaking in Nanocrystalline Silicon

1998 ◽  
Vol 507 ◽  
Author(s):  
Takahiro Matsumoto ◽  
Yasuaki Masumoto ◽  
Michio Kondo
Keyword(s):  
Electron Spin Resonance ◽  
Defect Density ◽  
Light Exposure ◽  
Reduction Rate ◽  
Nanocrystalline Silicon ◽  
Dangling Bond ◽  
Bond Density ◽  
Spin Resonance ◽  
Neutral Defect ◽  
Nanocrystalline Si

ABSTRACTThe effects of light exposure on neutral defect density at the surface of nanocrystalline Si are investigated by electron-spin resonance (ESR) experiments. A decrease of the neutral dangling bond density by light soaking was observed in this nanostructure. The reduction rate of ESR signal intensity becomes large with increasing light exposure intensity, and the reduction occurs from the excitation energy higher than 2 eV in vacuum. The reduction of the defect density can be explained in terms of the conversion of neutral states to charged states by carrier trapping.

Defect Formation Mechanism During PECVD of a-Si:H

1997 ◽  
Vol 467 ◽  
Author(s):  
Keiji Maeda ◽  
Ikurou Umezu
Keyword(s):  
Formation Mechanism ◽  
Urbach Energy ◽  
Defect Formation ◽  
Defect Density ◽  
Reaction Energy ◽  
Mobility Edge ◽  
Weak Bond ◽  
Bond Density ◽  
Extra Energy ◽  
Staebler Wronski Effect

ABSTRACTDefect formation mechanism in a-Si:H during PECVD at substrate temperature below 250°C is considered to be breaking of weak bonds in the Urbach tail. To break weak bonds, an extra energy is necessary. This energy is supplied by the reaction energy of SiH3 precursor at the growing surface incorporating SiH2 into the network. The defect density is experimentally shown to be proportional to a product of the energy supply frequency, i.e., SiH2 density, and the weak bond density which is obtained by the Urbach energy. By analysis using the configurational coordinate diagram the energy level of the broken weak bond is determined to be 0.2 eV above the valence band mobility edge. There is similarity of the defect formation mechanism during deposition to that of the Staebler-Wronski effect.

CORRELATION BETWEEN OPTICAL DEFECT DENSITY AND SPIN DENSITY IN AMORPHOUS SILICON CARBIDE

1991 ◽  
Vol 05 (04) ◽  
pp. 285-292 ◽  
Author(s):  
F. DEMICHELIS ◽  
C.F. PIRRI ◽  
E. TRESSO
Keyword(s):  
Silicon Carbide ◽  
Absorption Coefficient ◽  
Amorphous Silicon ◽  
Defect Density ◽  
Dangling Bond ◽  
Amorphous Silicon Carbide ◽  
Bond Density ◽  
Spin Resonance ◽  
Excess Absorption ◽  
Deposition Conditions

Amorphous silicon carbide (a-SiC:H) films deposited by different techniques under different deposition conditions have been submitted to photo-thermal deflection and photoacoustic spectroscopy (PDS and PAS) and electron spin resonance (ESR) measurements in order to obtain, through the trend of low energy absorption coefficient and the density of spins, information on the nature, energy and number of defects. The results obtained from the two techniques are often in disagreement since the dangling bond density generally does not scale with the integrated defect density. In order to explain the discrepancy the absorption coefficient has been calculated, following the Tauc model, in the three regions of fundamental absorption, Urbach tail and excess absorption. An expression for the density of defects has been obtained which depends on the integrated excess absorption coefficient through a proportionality factor.

The Effect of Post-Deuteration on Metastability in a-Si:H

1993 ◽  
Vol 297 ◽  
Author(s):  
N.H. Nickel ◽  
W.B. Jackson ◽  
C.C. Tsai
Keyword(s):  
Defect Formation ◽  
Chemical Potential ◽  
Defect Density ◽  
Hydrogenated Amorphous Silicon ◽  
Dangling Bond ◽  
Deuterium Plasma ◽  
Bond Density ◽  
Intense Light ◽  
Hydrogenated Amorphous ◽  
Metastable Defect

Hydrogenated amorphous silicon films were deuterated through a sequence of 1h exposures to a remote deuterium plasma at 350°C. The concentration profiles of hydrogen and deuterium were determined by SIMS at various times during the exposure sequence. The defect density in state A, after deuteration and after illumination with white light were determined using CPM measurements following each 1h exposure sequence. We find that post-deuteration does not alter the defect density in state A, change the Urbach edge, nor significantly alter metastable defect formation. Intense light soaking increases the defect density by about 5 × 10l6cm−3 independent of the total H + D concentration. These results suggest that D always enters the sample in pairs pinning the hydrogen chemical potential which supports the idea of a negative U system for hydrogen and deuterium. Despite an increase of Si-H bonds by as much as 3 × 1021cm−3, the annealed dangling bond density and the weak Si-Si bond density did not change.This suggests that the density of weak Si-Si bonds as well as the dangling bond density is determined by equilibration with strong Si-Si bonds through the interchange of H. The implications of these results for H bonding will be discussed.

Boron and Phosphorus Ion Implantation In a-SixC1−x:H Thin Films

1994 ◽  
Vol 336 ◽  
Author(s):  
R. Rizzoli ◽  
R. Galloni ◽  
C. Summonte ◽  
F. Demichelis ◽  
C.F. Pirrp ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Implantation ◽  
Ir Spectra ◽  
Structural Properties ◽  
Annealing Temperature ◽  
Urbach Energy ◽  
Energy Gap ◽  
Defect Density ◽  
Electrical Characteristics ◽  
Optimum Annealing Temperature

ABSTRACTIn this paper we report results on the optoelectronic and structural properties of device-quality a-SixC1−x:H intrinsic films with energy gap of 1.94 eV and Urbach energy of 70 MeV, grown by PECVD of SiH4+CH4 Mixture, which have been doped by means of boron or phosphorus ion implantation. Doping levels varied in the range 1018 to 5×1020 atoms/cm3. The behaviour of electrical characteristics, as well as energy gap and defect density, Measured on samples annealed in the range 150–400°C, showed that the optimum annealing temperature for the recovery of radiation damage is in the range 250–270°C independent of the implanted dose. Our results also show that after ion implantation and annealing, an increase of the SiH bonds concentration is detected, which is associated to a decrease of the contribution of SiH2, SiCH3, and SiCH vibrations in IR spectra.

Electronic Transport Properties of a-Si:H,F/a-Si,Ge:H,F Superlattices

1987 ◽  
Vol 95 ◽  
Author(s):  
J. P. Conde ◽  
S. Aljishi ◽  
D. S. Shen ◽  
V. Chu ◽  
Z E. Smith ◽  
...  
Keyword(s):  
Barrier Layer ◽  
Electronic Transport ◽  
Thermal Emission ◽  
Parallel Transport ◽  
Dark Conductivity ◽  
Alloy Layer ◽  
Conductivity Activation Energy ◽  
Superlattice Structures ◽  
Deposition Conditions ◽  
Extract Information

AbstractWe study the dark conductivity σd, dark conductivity activation energy Ea and photoconductivity σph of a-Si:H,F/a-Si,Ge:H,F superlattices both perpendicular and parallel to the plane of the layers. In parallel transport, both the σph and σd are dominated by the alloy layer characteristics with the superposition of carrier confinement quantum effects. In perpendicular transport, the σd shows an interplay of quantum mechanical tunneling through the barriers and of classical thermal emission over the barrier layer and the σph is controlled by the decreasing absorption by the silicon barrier layer as the optical gap Eopt of the structure decreases.We also found that the multilayer structure allows to grow lower gap a-Si,Ge:H,F alloys than achievable under the same deposition conditions for bulk materials. This stabilizing effect allowed us to study low-gap superlattice structures and extract information about these very low gap (<1.2 eV) a- Si,Ge:H,F alloys.

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