Effects of Arsenic Deactivation on Arsenic-Implant Induced Enhanced Diffusion in Silicon
Keyword(s):
Type V
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AbstractThe enhanced diffusion of boron due to high dose arsenic implantation into silicon is studied as a function of arsenic dose. The behavior of both the type-V and end-of-range loops is investigated by transmission electron microscopy (TEM). The role of arsenic deactivation induced interstitials and type-V loops on enhanced diffusion is assessed. Reduction of the boron diffusivity is observed with increasing arsenic dose at three different temperatures. The possible explanations for this reduction are discussed.
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Transmission Electron Microscopy studies of texture of Cr underlayer of magnetic recording hard disk
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