Pulsed Electron Beam Processing of Silicon

1981 ◽  
Vol 4 ◽  
Author(s):  
Anton C. Greenwald ◽  
Roger G. Little ◽  
Mark B. Spitzer ◽  
Robert G. Wolfson
Keyword(s):  
Electron Beam ◽  
Solar Cells ◽  
Thermal Annealing ◽  
Polycrystalline Silicon ◽  
Silicon Films ◽  
Silicon Substrates ◽  
Dopant Activation ◽  
Pulsed Electron Beam ◽  
Silicon Material ◽  
Electron Beam Processing

ABSTRACTContinued study [1] of pulsed electron beam annealing (PEBA) of thin silicon films deposited by LPCVD on silicon substrates has shown that a thin SiO2 interface remains intact during melt. PEBA of ion-implant damage in silicon has been shown to correlate dopant activation with melt depth. Also, PEBA was superior to thermal annealing of ion-implant damage in processing solar cells in some types of polycrystalline silicon material.

Microcrystalline and polycrystalline silicon films for solar cells obtained by gas-jet electron-beam PECVD method

2003 ◽  
Vol 150 (4) ◽  
pp. 293 ◽  
Author(s):  
R. Bilyalov ◽  
J. Poortmans ◽  
R. Sharafutdinov ◽  
S. Khmel ◽  
V. Schukin ◽  
...  
Keyword(s):  
Electron Beam ◽  
Solar Cells ◽  
Polycrystalline Silicon ◽  
Silicon Films ◽  
Gas Jet ◽  
Polycrystalline Silicon Films

Effect of Thermal Annealing on Characteristics of Polycrystalline Silicon used for Solar Cells

2008 ◽  
Author(s):  
Gou XianFang ◽  
li xudong ◽  
xu ying ◽  
liang xinqing
Keyword(s):  
Solar Cells ◽  
Thermal Annealing ◽  
Polycrystalline Silicon

Soft Vacuum Pulsed Electron Beam Processing Of Tenon And Teflon-Like Films

1989 ◽  
Author(s):  
J. Krishnaswamy ◽  
G. J. Collins ◽  
H. Hiraoka
Keyword(s):  
Electron Beam ◽  
Pulsed Electron Beam ◽  
Electron Beam Processing

Processing of Polypropylene by Low-Energy Pulsed Electron Beam from Forevacuum Plasma Source

2016 ◽  
Vol 683 ◽  
pp. 95-99 ◽  
Author(s):  
Victor Burdovitsin ◽  
Andrey Kazakov ◽  
Alexandr Medovnik ◽  
Efim Oks ◽  
Irina Puhova ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Irradiation ◽  
Plasma Source ◽  
Beam Current ◽  
Beam Current Density ◽  
Pulsed Electron Beam ◽  
Force Microscopy ◽  
Electron Beam Processing ◽  
Atomic Force ◽  
Energy Flux Density

Influence of electron beam irradiation on the morphology and contact angle of polypropylene was investigated. Electron beam processing was carried out at 8 – 10 kV accelerating voltage and a pressure of 5 – 10 Pa. Beam current density was up to 4.5 A/cm2, and the pulse duration - from 150 to 300 μs. The morphology of irradiated polymer material was studied by scanning-electron and atomic-force microscopy methods. It was established formation of extended equally oriented “hills” divided by “valleys”. The height of hills increases with the growth of energy flux density per pulse.

High rate deposition and electron beam recrystallization of silicon films for solar cells

2001 ◽  
Vol 401 (1-2) ◽  
pp. 84-87 ◽  
Author(s):  
M Rostalsky ◽  
J Müller
Keyword(s):  
Electron Beam ◽  
Solar Cells ◽  
Silicon Films ◽  
High Rate

Temperature profile and crater formation induced in high-current pulsed electron beam processing

2003 ◽  
Vol 21 (6) ◽  
pp. 1934-1938 ◽  
Author(s):  
Ying Qin ◽  
Chuang Dong ◽  
Xiaogang Wang ◽  
Shengzhi Hao ◽  
Aimin Wu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Temperature Profile ◽  
Crater Formation ◽  
High Current ◽  
Pulsed Electron Beam ◽  
Electron Beam Processing
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