Ale Growth of Transparent Conductors

1996 ◽  
Vol 426 ◽  
Author(s):  
Mikko Rit ◽  
Timo Asikainen ◽  
Markku Leskelä ◽  
Jarmo Skarp
Keyword(s):  
Thin Films ◽  
Scale Up ◽  
Atomic Layer ◽  
Transparent Conductors ◽  
Flat Panel Displays ◽  
Large Area ◽  
Flat Panel ◽  
Electrically Conducting ◽  
Transparent Conducting ◽  
Deposition Processes

AbstractOwing to its self-limiting growth mechanism the Atomic Layer Epitaxy (ALE) technique is capable of growing uniform high quality thin films on large area substrates. Therefore, ALE is an attractive choice for depositing transparent electrically conducting films for large area applications, such as solar cells and flat panel displays. In this paper studies on ALE growth of In2O3 and ZnO based transparent conducting thin films will be presented. In2O3, In2O3:Sn and In 2O3:F films were grown at 500 °C and their lowest resistivities were about 3 x 10-3, 2 x 10-3 and 6 x 10-4 Ωcm, respectively. Low temperature (120 - 350 °C) ALE deposition processes were developed for ZnO and ZnO:AI films, the latter having resistivities as low as 8 x 10-4 Ωcm. A straightforward scale-up of the ZnO process from 5 x 5 to 30 x 30 cm 2 substrate size was also demonstrated.

Thin films engineering of indium tin oxide: Large area flat panel displays application

2006 ◽  
Vol 200 (20-21) ◽  
pp. 5751-5759 ◽  
Author(s):  
U. Betz ◽  
M. Kharrazi Olsson ◽  
J. Marthy ◽  
M.F. Escolá ◽  
F. Atamny
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Flat Panel Displays ◽  
Large Area ◽  
Flat Panel

Microstructure and Electrical Properties of AZO Films Prepared by RF Magnetron Sputtering

2011 ◽  
Vol 264-265 ◽  
pp. 754-759 ◽  
Author(s):  
Bakri Jufriadi ◽  
Agus Geter E. Sutjipto ◽  
R. Othman ◽  
R. Muhida
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Time ◽  
Transparent Conducting Oxide ◽  
Rf Magnetron Sputtering ◽  
Flat Panel Displays ◽  
Emi Shielding ◽  
Transparent Conducting ◽  
Deposition Processes ◽  
Electro Magnetic ◽  
Static Discharge

AZO is an ideal replacement transparent conducting oxide (TCO) for ITO to all corresponding applications. The typical applications include: transparent electrodes for solar cells, flat panel displays, LCD electrodes, electro-magnetic compatibility (RF-EMI shielding) coatings, touch panel transparent contacts, static discharge dissipation. The production of useful and commercially attractive thin films using different deposition processes is very important parameter to investigate. A systematic study of the sputtering condition and their influenced on electrical and structural were studied. In this work, AZO films were deposited by RF magnetron sputtering at 200 °C. The result shows that the deposited time has influenced the characteristic of deposited AZO films. For a longer deposition time, thin film shows a uniform grain growth. The resistivity found minimum at the deposition time of 45 minutes. It can be considered that by reducing of the grain boundaries which enable the electron carries to conduct smoothly.

Inkjet Printing of Electrically Conducting Micron-Wide Lines and Transparent Conducting Films by Edge-Enhanced Twin-Deposition

2012 ◽  
Vol 1529 ◽  
Author(s):  
Vadim Bromberg ◽  
Siyuan Ma ◽  
Timothy J. Singler
Keyword(s):  
Substrate Surface ◽  
Scale Up ◽  
Deposition Process ◽  
Functional Material ◽  
Electrically Conducting ◽  
Silver Ink ◽  
Roll To Roll ◽  
Transparent Conducting Films ◽  
Transparent Conducting ◽  
Free Region

ABSTRACTRoll-to-roll manufacturing holds the potential to rapidly and cheaply produce electronic devices in a flexible format as well as to effectively scale up production of emerging nanotechnologies. Developing scalable techniques for the efficient and effective use of solution-processed functional material is a significant factor in realizing the potential of roll-to-roll manufacturing. We present a novel inkjet deposition process developed to rapidly deposit arrays of micron-wide lines of silver nanoparticles for use as an optically transparent and electrically conducting film. The technique involves jetting a controlled number of space-overlapped drops of a dilute nanoparticle silver ink onto a substrate to form a long stable ink rivulet with two parallel and pinned edges. Subsequently, nanoparticles deposit preferentially at the two parallel rivulet edges due to edge-enhanced evaporation of the solvent. The final result is a twin-deposit of parallel continuous nanoparticle lines, each with a characteristic width less than 5μm and height less than 300 nm. The twin lines are separated by a predominantly particle-free region with the spacing between the lines ranging from 100 μm to 600 μm, where the spacing is a function of ink, substrate, and printing conditions. The effect of substrate surface and jetting parameters on nanoparticle line morphology is presented. Arrays of such lines have been printed and evaluated as potential transparent conducting films, showing an effective sheet resistance of ∼5 Ω/□. This edge-enhanced twin-deposition technique has the potential for rapid, material-efficient, and lithography-free patterned deposition of functional material for use in roll-to-roll manufacturing.

Highly conductive SnO[sub 2] thin films for flat-panel displays

2007 ◽  
Vol 15 (2) ◽  
pp. 161 ◽  
Author(s):  
Takamitsu Isono ◽  
Takeshi Fukuda ◽  
Kouji Nakagawa ◽  
Reo Usui ◽  
Ryohei Satoh ◽  
...  
Keyword(s):  
Thin Films ◽  
Flat Panel Displays ◽  
Flat Panel

Heat-Resistant Black Insulative Thin Films for Flat-Panel Displays in Al-Doped Ag–Fe–O Systems

2021 ◽  
Author(s):  
Mina Yamaguchi ◽  
Akihiro Ishii ◽  
Itaru Oikawa ◽  
Yusuke Yamazaki ◽  
Masaaki Imura ◽  
...  
Keyword(s):  
Thin Films ◽  
Flat Panel Displays ◽  
Flat Panel ◽  
Heat Resistant

Scale-up of oCVD: large-area conductive polymer thin films for next-generation electronics

2015 ◽  
Vol 2 (2) ◽  
pp. 221-227 ◽  
Author(s):  
Peter Kovacik ◽  
Gabriella del Hierro ◽  
William Livernois ◽  
Karen K. Gleason
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Polymer Films ◽  
Vapor Deposition ◽  
Low Cost ◽  
Scale Up ◽  
Conductive Polymer ◽  
Chemical Vapor ◽  
Next Generation ◽  
Large Area

We demonstrate large-area conductive polymer films using oxidative chemical vapor deposition and apply them to low-cost and durable conductive textiles.

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