The Effect of Hydrogen on the Molecular-Beam-Epitaxy Growth of GaN on Sapphire Under Ga-Rich Conditions

1996 ◽  
Vol 449 ◽  
Author(s):  
S. L. Buczkowski ◽  
Zhonghai Yu ◽  
M. Richards-Babb ◽  
N. C. Giles ◽  
L. T. Romano ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Growth Kinetics ◽  
Atomic Hydrogen ◽  
Molecular Beam ◽  
Plasma Source ◽  
Nucleation And Growth ◽  
Rf Plasma ◽  
Molecular Beam Epitaxy Growth ◽  
Dramatic Effect ◽  
Inversion Domain

ABSTRACTNucleation and growth of GaN under Ga-rich conditions by molecular beam epitaxy using a nitrogen rf plasma source is shown to result in both a smoother GaN surface and a reduced inversion domain content. In addition, preliminary results of the dramatic effect of atomic hydrogen on growth kinetics for Ga-rich growth are presented.

Effects of Stress-relieving AlN Interlayers in GaN-on-Si Grown by Plasma-assisted Molecular Beam Epitaxy

2008 ◽  
Vol 1068 ◽  
Author(s):  
Adam Adikimenakis ◽  
Suman-Lata Sahonta ◽  
George Dimitrakopulos ◽  
Jaroslav Domagala ◽  
Philomela Komninou ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Plasma Source ◽  
Rf Plasma ◽  
X Ray Diffraction ◽  
Inversion Domain ◽  
Transmission Electron ◽  
Stress Relieving ◽  
Gan On Si ◽  
Inversion Domain Boundaries

ABSTRACTThe insertion of an AlN interlayer for tensile strain relief in GaN thin films grown on Si (111) on-axis and vicinal substrates by nitrogen rf plasma source molecular beam epitaxy has been investigated. The 15 nm AlN interlayer was inserted between the bottom 0.5 micron GaN layer and the top 1.0 micron GaN layer. The interlayer was very effective to reduce the tensile stress in the overall 1.5 micron GaN/Si film to the level required for complete avoidance of microcracks, which were present in high densities in GaN/Si heterostructures grown without an AlN interlayer. The strain of the AlN interlayer, as well as the strain in all the layers of the entire GaN/Si heterostructure was analyzed by x-ray diffraction (XRD) and transmission electron microscopy (TEM) measurements. Reciprocal space map in XRD indicated that the 15 nm AlN interlayer was coherently strained with the GaN films. However TEM observations revealed that the AlN interlayer was partially relaxed in local regions. The AlN interlayer was also observed to interfere with the GaN growth process. In particular, above morphological features such as V-defects, GaN was overgrown with a large density of threading dislocations and inversion domain boundaries.

Temperature-modulated Si(001):As gas-source molecular beam epitaxy: Growth kinetics and As incorporation

2001 ◽  
Vol 79 (20) ◽  
pp. 3263-3265 ◽  
Author(s):  
H. Kim ◽  
G. Glass ◽  
J. A. N. T. Soares ◽  
Y. L. Foo ◽  
P. Desjardins ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Growth Kinetics ◽  
Molecular Beam ◽  
Molecular Beam Epitaxy Growth ◽  
Gas Source

Compositional control in molecular beam epitaxy growth of GaNyAs1−y on GaAs (001) using an Ar/N2 RF plasma

2002 ◽  
Vol 242 (1-2) ◽  
pp. 141-154 ◽  
Author(s):  
J.A Gupta ◽  
Z.R Wasilewski ◽  
B.J Riel ◽  
J Ramsey ◽  
G.C Aers ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Rf Plasma ◽  
Molecular Beam Epitaxy Growth ◽  
Compositional Control

Si(011)16×2 gas-source molecular beam epitaxy: Growth kinetics

2000 ◽  
Vol 76 (20) ◽  
pp. 2853-2855 ◽  
Author(s):  
N. Taylor ◽  
H. Kim ◽  
P. Desjardins ◽  
Y. L. Foo ◽  
J. E. Greene
Keyword(s):  
Molecular Beam Epitaxy ◽  
Growth Kinetics ◽  
Molecular Beam ◽  
Molecular Beam Epitaxy Growth ◽  
Gas Source

scholarly journals Molecular beam epitaxy of free-standing bulk wurtzite AlxGa1-xN layers using a highly efficient RF plasma source

2016 ◽  
Vol 13 (5-6) ◽  
pp. 217-220 ◽  
Author(s):  
S. V. Novikov ◽  
C. R. Staddon ◽  
S.-L. Sahonta ◽  
R. A. Oliver ◽  
C. J. Humphreys ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Plasma Source ◽  
Rf Plasma ◽  
Free Standing ◽  
Highly Efficient
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