Role of The Gas Flow Parameters on The Uniformity of Films Produced by PECVD Technique

1997 ◽  
Vol 467 ◽  
Author(s):  
R. Martins ◽  
A. Maçarico ◽  
I. Ferreira ◽  
E. Fortunato
Keyword(s):  
Gas Flow ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Discharge Process ◽  
Flow Parameters ◽  
Chemical Vapour Deposition Technique ◽  
Discharge Pressure ◽  
Plasma Enhancement ◽  
Do So

ABSTRACTThe aim of this work is to present an analytical model able to interpret the experimental data of the dependence of film's uniformity on the discharge pressure, gas flow and temperature used during the production of thin films by the plasma enhancement chemical vapour deposition technique, under optimised electrode's geometry and electric field distribution. To do so, the gas flow is considered to be quasi-incompressible and inviscous leading to the establishment of the electro-fluid-mechanics equations able to interpret the film's uniformity over the substrate area, when the discharge process takes place in the low power regime.

scholarly journals The effects of gas flow rate and annealing on the morphological properties of zinc oxide nanostructures thin film using chemical vapour deposition process

2017 ◽  
Vol 13 (1) ◽  
Author(s):  
W. H. Khoo ◽  
S. M. Sultan ◽  
M. Z. Sahdan
Keyword(s):  
Thin Film ◽  
Zinc Oxide ◽  
Chemical Vapour Deposition ◽  
Gas Flow ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Zinc Oxide Nanostructures ◽  
Glass Substrates ◽  
Oxide Nanostructures ◽  
Chemical Vapour Deposition Technique

Zinc Oxide nanostructures thin films have been deposited on glass substrates by using chemical vapour deposition technique at 1000°C assisted by gas blocker. Glass substrates was sputtered by ~5nm of gold to form a catalyst layer on top of glass. Different gas flow rates of 0.05, 0.10, 0.20, 0.40 L/min were used in the deposition. After the deposition, the layer was annealed at temperatures of 500°C for 1 hours under atmospheric pressure. The surface morphologies of ZnO thin film were investigated field emission scanning electron microscope (FESEM). X-ray diffraction (XRD) results confirm the presence of ZnO layer with high peak of (002) crystal orientation and shows improvement after annealing. The mechanism of ZnO nanostructures formation will be discussed in this paper

The Effect of Hydrogen Dilution on the Morphology of Carbon Nanowalls Decorated Carbon Nanotubes Deposited by Hot-Wire r.f. Plasma Enhanced Chemical Vapour Deposition

2016 ◽  
Vol 694 ◽  
pp. 203-207
Author(s):  
Nur Maisarah Abdul Rashid ◽  
Wee Siong Chiu ◽  
Noor Hamizah Khanis ◽  
Maisara Othman ◽  
Richard Ritikos ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hot Wire ◽  
Hydrogen Dilution ◽  
Chemical Vapour Deposition Technique ◽  
Carbon Nanowalls ◽  
Gas Dilution

An investigation on the effects of hydrogen (H2) gas dilution on the morphology and growth of carbon nanowalls (CNWs) decorated carbon nanotubes (CNTs) by hot-wire r.f. plasma enhanced chemical vapour deposition technique is presented. With the assistance of nickel nanoparticle catalyst, CNWs decorated CNTs formed only under the presence of 25% of H2 gas, relative to the methane (CH4) gas precursor. By varying the amount of H2 incorporated with CH4, the role of H2 dilution in the development of CNWs decorated CNTs was studied. Based on the FESEM and HRTEM results, it is hypothesized that H2 density and relative carbon radical concentration are the important parameters for the deposition of CNWs decorated CNTs. The effect of H2 dilution on the formation of CNWs decorated CNTs is presented.

scholarly journals The role of carbon precursor on carbon nanotube chirality in floating catalyst chemical vapour deposition

Nanoscale ◽  
2016 ◽  
Vol 8 (39) ◽  
pp. 17262-17270 ◽  
Author(s):  
J. S. Barnard ◽  
C. Paukner ◽  
K. K. Koziol
Keyword(s):  
Carbon Nanotubes ◽  
Gas Flow ◽  
Vapour Deposition ◽  
Flow Reactor ◽  
Chemical Vapour ◽  
Carbon Precursor ◽  
Chiral Angle ◽  
Gas Flow Reactor ◽  
Nanotube Chirality

We have studied the influence of different carbon precursors (methane, ethanol and toluene) on the type, diameter and chiral angle distributions of carbon nanotubes (CNTs) grown with the floating catalyst technique in a horizontal gas-flow reactor.

Rbs and Pixe Analysis Of Hg1-xCdxTe grown by MOCVD.

1990 ◽  
Vol 216 ◽  
Author(s):  
S.P. Russo ◽  
R.G. Elliman ◽  
P.N. Johnston ◽  
G.N. Pain
Keyword(s):  
Gas Flow ◽  
Vapour Deposition ◽  
Rutherford Backscattering Spectrometry ◽  
Chemical Vapour ◽  
Organic Chemical ◽  
Pixe Analysis ◽  
Mocvd Reactor ◽  
Metal Organic ◽  
Thickness Variations

ABSTRACTThe techniques, Particle Induced X-ray Emission (PIXE) and Rutherford Backscattering Spectrometry (RBS) have been used to investigate compositional and thickness uniformity of Hg1-xCdxTe (MCT) grown on GaAs substrates by Metal Organic Chemical Vapour Deposition (MOCVD). Composition and thickness variations are reported for orientations perpendicular and parallel to gas flow in the MOCVD reactor. Crystalline quality of the MCT layer was also determined by RBS channelling analysis.

Preparation and testing of silicon nanowires

2014 ◽  
Vol 92 (7/8) ◽  
pp. 819-821 ◽  
Author(s):  
Martin Müller ◽  
Jan Kočka ◽  
Hassan G. El Gohary ◽  
Jiri Stuchlik ◽  
Ha Stuchlikova ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Chemical Vapour Deposition ◽  
Silicon Nanowires ◽  
Vapour Deposition ◽  
Hydrogen Plasma ◽  
Chemical Vapour ◽  
Applied Potential ◽  
Gold Nanoislands

Here we present two ways of preparing lateral (in plane) silicon nanowires with the help of gold nanoislands catalysed plasma enhanced chemical vapour deposition. The role of the applied potential and eventual consecutive hydrogen plasma treatment is tested together with the thickness of the thin Au layer used for self-organised preparation of Au nanoislands.

Synthesis of Large Carbon Nanotubes from Ferrocene: The Chemical Vapour Deposition Technique

2011 ◽  
Vol 6 (11) ◽  
pp. 1270-1279 ◽  
Author(s):  
Clarence S. Yah ◽  
Geoffrey S. Simate ◽  
Kapil Moothi ◽  
Kwena S. Maphutha ◽  
Sunny E. Iyuke
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Deposition Technique ◽  
Chemical Vapour Deposition Technique
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